PlasmaMAX Hollow Cathode Plasma CVD
It is designed to optimize the mass production process by maximizing the substrate width and film deposition speed while maintaining the highest quality.
This technology allows for the optimization of the manufacturing of barrier films, optical multilayer film products, functional fibers, displays, and a series of related custom applications. The PlasmaMAX hollow cathode can be customized in shape, making it easy to integrate into horizontal inline vacuum deposition systems, vertical inline vacuum deposition systems, and roll-to-roll web coating processes. With an easily customizable design platform and stable processes across a wide range of pressure levels, it can be used with most existing CVD and PVD equipment, enabling performance optimization at a low cost.
- 企業：マツボー
- 価格：Other
