Mist CVD Mistic
Optimal high corrosion resistance and high conductivity oxide film for metal separators for fuel cells.
<Features> A simple and highly functional CVD coating that can form a film in the atmosphere.
- Company：アイテック
- Price：Other
CVD Product List and Ranking from 7 Manufacturers, Suppliers and Companies
Last Updated： Aggregation Period:Aug 13, 2025～Sep 09, 2025
This ranking is based on the number of page views on our site.
CVD Manufacturer, Suppliers and Company Rankings
Last Updated： Aggregation Period:Aug 13, 2025～Sep 09, 2025
This ranking is based on the number of page views on our site.
- M.WATANABE & CO.,LTD. Tokyo//Electronic Components and Semiconductors
- 中日本炉工業 Aichi//others
- マツボー Tokyo//Trading company/Wholesale
- 4 ハイテック・システムズ Kanagawa//Industrial Machinery
- 4 アイテック Fukui//Manufacturing and processing contract
CVD Product ranking
Last Updated： Aggregation Period:Aug 13, 2025～Sep 09, 2025
This ranking is based on the number of page views on our site.
- High-performance Single-wafer Processing Atmospheric Pressure CVD (APCVD) System (A200V) M.WATANABE & CO.,LTD.
- High-productivity Continuous Atmospheric Pressure CVD (APCVD) System (AMAX1200) M.WATANABE & CO.,LTD.
- Atmospheric Pressure CVD (APCVD) System for Small-scale Production and Development (D501) M.WATANABE & CO.,LTD.
- 4 High-productivity Continuous Atmospheric Pressure CVD (APCVD) System (AMAX800V) M.WATANABE & CO.,LTD.
- 4 CVD (three-layer) coating <Features> 中日本炉工業
CVD Product List
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Electronic grade CVD
The horizontal tolerance is +0.2/0-0mm, and the thickness tolerance is +/-0.05mm! Let me introduce the electronic grade CVD.
The remarkable progress in the CVD method for diamond synthesis has made it possible to consistently produce diamonds with properties suitable for radiation detection. Continuous improvements in the CVD method are expected to lead to exciting advancements in the future, providing large-area homoepitaxial grown single crystal diamond plates/films. The promising results shown by CVD diamonds have led to many applications in the RF diode, BJT, FET, MEMS, and electronics industries. Ongoing technological innovation and continuous efforts will continue to guide the medical field, such as dosimeters for radiation therapy. 【Specifications and Tolerances】 ■ Lateral tolerance: +0.2/0-0mm ■ Crystal orientation (miscut): +/-3° ■ Crystallography: Typically 100% single sector {100} ■ Edge: Laser cut *For more details, please refer to the PDF document or feel free to contact us.
- Company：SUPERHARD JAPAN
- Price：Other
Atmospheric Pressure CVD (APCVD) System for Small-scale Production and Development (D501)
For prototyping, development, and small lot production For deposition of NSG(SiO2)/BSG/PSG/BPSG Batch processing (simultaneous processing of multiple substrates) APCVD system
The D501 is a batch processing (multiple-unit simultaneous processing) atmospheric pressure CVD system (APCVD system) for small-volume production/testing and silicon oxide deposition (SiO2 deposition) on irregularly shaped substrates. 【Features】 ・Simultaneous processing of substrates of different shapes and sizes ・High deposition speed ・Simple maintenance ・Small footprint ・Low CoO (low running cost) 【Applications】 ・Interlayer insulating (NSG/PSG/BPSG) ・Hard mask for diffusion/ion implantation, Sacrificial deposition (NSG) ・Passivation deposition (protective deposition, insulating deposition) (NSG) ・Source films for solid phase diffusion for solar cells (BSG, PSG)/Cap deposition (NSG) *For more details, please contact us or download the catalog for further information.
- Company：M.WATANABE & CO.,LTD.
- Price：Other
High-performance Single-wafer Processing Atmospheric Pressure CVD (APCVD) System (A200V)
Small quantities and wide varieties. NSG(SiO2)/PSG/BPSG deposition. Single-wafer processing atmospheric pressure CVD (APCVD) system (Compatible with 8-inch SiC wafers)
A200V is a single-wafer processing atmospheric pressure CVD system (APCVD system) for silicon oxide (SiO2) deposition, such as interlayer insulating deposition, passivation deposition (protective deposition), and sacrificial deposition. 【Features】 ・Ideal for insulating depositions and diffusion/plasma mask depositions. ・Low particle film deposition by single-wafer face-down deposition. ・High safety and deposition stability by using a sealed chamber. ・Wafer warp correction function (patented) for SiC wafers. ・Low-load, long-cycle maintenance. ・Compact cabinet and adjacent installation to the mirror type for space saving. ・Low CoO (low running cost) 【Applications】 ・Interlayer dielectric deposition for power semiconductors (NSG/PSG/BPSG) ・Hard mask for diffusion/ion implantation, Sacrificial depositions (NSG) ・Passivation depositions (protective depositions, insulating depositions) (NSG) ・Optical Waveguide (NSG/BPSG) *For more details, please contact us or download the catalog for further information.
- Company：M.WATANABE & CO.,LTD.
- Price：Other
High-productivity Continuous Atmospheric Pressure CVD (APCVD) System (AMAX800V)
Mass Production / NSG(SiO2)/PSG/BPSG deposition High-productivity/Continuous atmospheric pressure CVD (APCVD) system (for up to 8-inch wafers)
The AMAX series is a continuous atmospheric pressure CVD system (APCVD system) for silicon oxide (SiO2) deposition, such as interlayer insulator deposition, passivation deposition (protective deposition), and back seal (for epitaxial wafers). 【Features】 ・High productivity of up to 100 wafers/hr. (wafer size: up to 8 inches) ・No vacuum or plasma is required (thermal CVD) ・SiC trays are used to prevent heavy metal contamination. ・Simple maintenance. ・Low CoO (low running cost) 【Applications】 ・Back seal for epitaxial wafers (NSG) ・Interlayer insulator deposition for power semiconductors (NSG/PSG/BPSG) ・Hard mask for diffusion/Ion implantation, Sacrificial deposition (NSG) ・Passivation deposition (protective deposition, insulating deposition) (NSG) *For more details, please contact us or download the catalog for further information.
- Company：M.WATANABE & CO.,LTD.
- Price：Other
High-productivity Continuous Atmospheric Pressure CVD (APCVD) System (AMAX1200)
Mass production / NSG(SiO2)/PSG/BPSG deposition High-productivity / Continuous atmospheric pressure CVD (APCVD) system (for 12-inch wafers)
The AMAX series is a continuous atmospheric pressure CVD system (APCVD system) for silicon oxide (SiO2) deposition, such as an interlayer insulator deposition, passivation deposition (protective deposition), and back seal (for epitaxial wafers). 【Features】 ・High productivity of up to 56 wafers/h (wafer size: up to 12 inches) ・No vacuum or plasma is required (thermal CVD) ・SiC trays are used to prevent heavy metal contamination. ・Simple maintenance. ・Low CoO (low running cost) 【Applications】 ・Back seal for epitaxial wafers (NSG) ・Passivation deposition (protective deposition, insulating deposition) (NSG) *For more details, please contact us or download the catalog to view.
- Company：M.WATANABE & CO.,LTD.
- Price：Other
PlasmaMAX Hollow Cathode Plasma CVD
It is designed to optimize the mass production process by maximizing the substrate width and film deposition speed while maintaining the highest quality.
This technology allows for the optimization of the manufacturing of barrier films, optical multilayer film products, functional fibers, displays, and a series of related custom applications. The PlasmaMAX hollow cathode can be customized in shape, making it easy to integrate into horizontal inline vacuum deposition systems, vertical inline vacuum deposition systems, and roll-to-roll web coating processes. With an easily customizable design platform and stable processes across a wide range of pressure levels, it can be used with most existing CVD and PVD equipment, enabling performance optimization at a low cost.
- Company：マツボー
- Price：Other
CVD, PECVD horizontal furnace device "EVAD series"
Equipped with a flow management system! Processing of powders at high temperatures using CVD/PECVD is possible.
The "EVAD Series" is a CVD and PECVD horizontal furnace device capable of synthesizing and forming films from gas, vapor, liquid, and solid raw materials. It controls temperature distribution through single-zone and multi-zone configurations, and allows for high-temperature CVD/PECVD processing of powders using a high-quality stainless steel chamber with a rotation mechanism. The PLASMICON control system supports fully automated processes and data storage. 【Features】 ■ Equipped with the FLOCON series flow management system ■ Capable of incorporating the ICP plasma source from the PLUME series ■ Capable of synthesizing and forming films from gas, vapor, liquid, and solid raw materials ■ Temperature distribution control through single-zone and multi-zone configurations *For more details, please refer to the PDF document or feel free to contact us.
- Company：ハイテック・システムズ
- Price：Other
CVD Zinc Sulfide(R)・Cleartran(R)
Applicable to various defense applications required in harsh environments!
We handle zinc sulfide 'CVD Zinc Sulfide(R)' and 'Cleartran(R)' manufactured by CVD Ceramics using chemical vapor deposition (CVD) method. These materials are chemically inert, non-hygroscopic, and have high density, which gives them excellent machinability, making it easy to process into shapes such as circular, rectangular lenses, prisms, and domes. 【Features】 ■ Excellent mechanical strength and environmental resistance ■ Cleartran is transparent in the visible range (0.35nm and above) ■ Low scattering ■ Chemically inert ■ Non-hygroscopic ■ Easy machinability *For more details, please download the PDF or contact us.
- Company：Hellma Materials Japan
- Price：Other
CVD (three-layer) coating <Features>
Suitable for fields requiring corrosion resistance, high-temperature molds, and stainless steel press processing!
We would like to introduce the features of "CVD (three-layer) coating" conducted by Chūnihon Rōkōgyō Co., Ltd. It is suitable for fields that require resistance to seizure, wear, and corrosion, as well as for molds that operate at high temperatures and for stainless steel press processing. Additionally, in the case of TiC-coated products, it contributes to the improvement of the lifespan of cold forging and press molds that require high hardness and wear resistance. 【Inspection Equipment (Partial)】 ■ Micro Vickers hardness tester ■ Shore hardness tester Rockwell hardness tester ■ Inverted metallurgical microscope ■ Desktop microscope + Energy dispersive X-ray analyzer ■ Microscope *For more details, please refer to the related links or feel free to contact us.
- Company：中日本炉工業
- Price：Other
