Mist CVD Mistic
Optimal high corrosion resistance and high conductivity oxide film for metal separators for fuel cells.
<Features> A simple and highly functional CVD coating that can form a film in the atmosphere.
- Company：アイテック
- Price：Other
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PlasmaMAX Hollow Cathode Plasma CVD
It is designed to optimize the mass production process by maximizing the substrate width and film deposition speed while maintaining the highest quality.
This technology allows for the optimization of the manufacturing of barrier films, optical multilayer film products, functional fibers, displays, and a series of related custom applications. The PlasmaMAX hollow cathode can be customized in shape, making it easy to integrate into horizontal inline vacuum deposition systems, vertical inline vacuum deposition systems, and roll-to-roll web coating processes. With an easily customizable design platform and stable processes across a wide range of pressure levels, it can be used with most existing CVD and PVD equipment, enabling performance optimization at a low cost.
- Company：マツボー
- Price：Other
High-productivity Continuous Atmospheric Pressure CVD (APCVD) System (AMAX1200)
Mass production / NSG(SiO2)/PSG/BPSG deposition High-productivity / Continuous atmospheric pressure CVD (APCVD) system (for 12-inch wafers)
The AMAX series is a continuous atmospheric pressure CVD system (APCVD system) for silicon oxide (SiO2) deposition, such as an interlayer insulator deposition, passivation deposition (protective deposition), and back seal (for epitaxial wafers). 【Features】 ・High productivity of up to 56 wafers/h (wafer size: up to 12 inches) ・No vacuum or plasma is required (thermal CVD) ・SiC trays are used to prevent heavy metal contamination. ・Simple maintenance. ・Low CoO (low running cost) 【Applications】 ・Back seal for epitaxial wafers (NSG) ・Passivation deposition (protective deposition, insulating deposition) (NSG) *For more details, please contact us or download the catalog to view.
- Company：M.WATANABE & CO.,LTD.
- Price：Other
High-productivity Continuous Atmospheric Pressure CVD (APCVD) System (AMAX800V)
Mass Production / NSG(SiO2)/PSG/BPSG deposition High-productivity/Continuous atmospheric pressure CVD (APCVD) system (for up to 8-inch wafers)
The AMAX series is a continuous atmospheric pressure CVD system (APCVD system) for silicon oxide (SiO2) deposition, such as interlayer insulator deposition, passivation deposition (protective deposition), and back seal (for epitaxial wafers). 【Features】 ・High productivity of up to 100 wafers/hr. (wafer size: up to 8 inches) ・No vacuum or plasma is required (thermal CVD) ・SiC trays are used to prevent heavy metal contamination. ・Simple maintenance. ・Low CoO (low running cost) 【Applications】 ・Back seal for epitaxial wafers (NSG) ・Interlayer insulator deposition for power semiconductors (NSG/PSG/BPSG) ・Hard mask for diffusion/Ion implantation, Sacrificial deposition (NSG) ・Passivation deposition (protective deposition, insulating deposition) (NSG) *For more details, please contact us or download the catalog for further information.
- Company：M.WATANABE & CO.,LTD.
- Price：Other
