Mist CVD Mistic
Optimal high corrosion resistance and high conductivity oxide film for metal separators for fuel cells.
<Features> A simple and highly functional CVD coating that can form a film in the atmosphere.
- Company：アイテック
- Price：Other
CVD(金属) - List of Manufacturers, Suppliers, Companies and Products
CVD Product List
1～4 item / All 4 items
Displayed results
High-productivity Continuous Atmospheric Pressure CVD (APCVD) System (AMAX1200)
Mass production / NSG(SiO2)/PSG/BPSG deposition High-productivity / Continuous atmospheric pressure CVD (APCVD) system (for 12-inch wafers)
The AMAX series is a continuous atmospheric pressure CVD system (APCVD system) for silicon oxide (SiO2) deposition, such as an interlayer insulator deposition, passivation deposition (protective deposition), and back seal (for epitaxial wafers). 【Features】 ・High productivity of up to 56 wafers/h (wafer size: up to 12 inches) ・No vacuum or plasma is required (thermal CVD) ・SiC trays are used to prevent heavy metal contamination. ・Simple maintenance. ・Low CoO (low running cost) 【Applications】 ・Back seal for epitaxial wafers (NSG) ・Passivation deposition (protective deposition, insulating deposition) (NSG) *For more details, please contact us or download the catalog to view.
- Company：M.WATANABE & CO.,LTD.
- Price：Other
High-productivity Continuous Atmospheric Pressure CVD (APCVD) System (AMAX800V)
Mass Production / NSG(SiO2)/PSG/BPSG deposition High-productivity/Continuous atmospheric pressure CVD (APCVD) system (for up to 8-inch wafers)
The AMAX series is a continuous atmospheric pressure CVD system (APCVD system) for silicon oxide (SiO2) deposition, such as interlayer insulator deposition, passivation deposition (protective deposition), and back seal (for epitaxial wafers). 【Features】 ・High productivity of up to 100 wafers/hr. (wafer size: up to 8 inches) ・No vacuum or plasma is required (thermal CVD) ・SiC trays are used to prevent heavy metal contamination. ・Simple maintenance. ・Low CoO (low running cost) 【Applications】 ・Back seal for epitaxial wafers (NSG) ・Interlayer insulator deposition for power semiconductors (NSG/PSG/BPSG) ・Hard mask for diffusion/Ion implantation, Sacrificial deposition (NSG) ・Passivation deposition (protective deposition, insulating deposition) (NSG) *For more details, please contact us or download the catalog for further information.
- Company：M.WATANABE & CO.,LTD.
- Price：Other
CVD (three-layer) coating <Features>
Suitable for fields requiring corrosion resistance, high-temperature molds, and stainless steel press processing!
We would like to introduce the features of "CVD (three-layer) coating" conducted by Chūnihon Rōkōgyō Co., Ltd. It is suitable for fields that require resistance to seizure, wear, and corrosion, as well as for molds that operate at high temperatures and for stainless steel press processing. Additionally, in the case of TiC-coated products, it contributes to the improvement of the lifespan of cold forging and press molds that require high hardness and wear resistance. 【Inspection Equipment (Partial)】 ■ Micro Vickers hardness tester ■ Shore hardness tester Rockwell hardness tester ■ Inverted metallurgical microscope ■ Desktop microscope + Energy dispersive X-ray analyzer ■ Microscope *For more details, please refer to the related links or feel free to contact us.
- Company：中日本炉工業
- Price：Other
