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Lithography - メーカー・企業4社の業務用製品ランキング | イプロスものづくり

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Lithographyのメーカー・企業ランキング

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  1. イノックス Aichi//Other manufacturing
  2. Tohoku Techno Arch Co., Ltd. Miyagi//Educational and Research Institutions
  3. M.T.C Kanagawa//Other manufacturing
  4. 4 null/null
  5. 5 オプトニクス精密 Tochigi//others
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Lithographyの製品ランキング

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  1. Tohoku Univ. Technology：Optical nanoimprinting method that enables a uniform residual layer without burr generation at mold edge: T19-159 Tohoku Techno Arch Co., Ltd.
  2. Standard Mosai Mold Explanation Part 2 イノックス
  3. Contracted Processing Service: Photolithography M.T.C
  4. 4 What is lithography?
  5. 4 Interference lithography イノックス

Lithographyの製品一覧

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Standard Mosai Mold Explanation Part 2

Standard Mosai Mold Explanation Part 2

Introducing the explanation of the Standard Moss Eye mold part 2 in blog format!

This is the second installment of the explanation of the specs for the moth-eye mold. In interference lithography, only linear structures can be drawn with the interference wave. However, by performing double exposure, it is possible to create a moth-eye structure. In the diagram, the green dotted line indicates the lines drawn by the interference wave. There are two types of parallel dotted lines in the diagram that intersect with each other. *For more detailed information, please refer to the related links. Feel free to contact us for further inquiries.*

  • Other contract services
  • Lithography

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X-ray lithography capable of producing ultra-fine, ultra-precise, and special-shaped structures.

X-ray lithography capable of producing ultra-fine, ultra-precise, and special-shaped structures.

From X-ray mask production to submicron precision formation, it is possible to create new shapes that have never been made before.

It is possible to form special patterns such as high aspect ratio pattern formation, corner cube shapes, pile shapes, and taper shapes, as well as their mold formation. 【Features】 ■ Special shapes can be produced ■ Precision formation on the sub-micron order is possible ■ High aspect ratio pattern formation is easy *For more details, please download the materials or contact us.

  • Analytical Equipment and Devices
  • Lithography

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Tohoku Univ. Technology：Optical nanoimprinting method that enables a uniform residual layer without burr generation at mold edge: T19-159

Tohoku Univ. Technology：Optical nanoimprinting method that enables a uniform residual layer without burr generation at mold edge: T19-159

Precise manufacture of complicated structure with sparse/dense micro/nano-patterns!

Ultraviolet nanoimprint lithography (UV-NIL) have attracted attention as an industrially acceptable nanofabrication technology from views of cost and throughput; However, the use of spincoated films of photo-curable resin on substrates causes the problems of burr generation arising from mold edges and unleveled residual layers arising from site-selective differences in pattern densities of mold surfaces. The problems make subsequent lithography processes impossible. This optical nanoimprinting method consists of micro-scale laser-drilled screen printing and nano-scale molding. High-viscosity photo-curable resins with 1-300 Pa･s can be placed by screen printing using a polyimide sheet having through poles which are fabricated by laser drilling using a picosecond pulsed laser. The minimum volume of a printed droplet is 5 fL (10-15L). The resist patterns and resultant silicon patterns with 45-nm-linewidths are fabricated.

  • others
  • Lithography

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Interference lithography

Interference lithography

Patterns are recorded in photosensitive materials! There is no need for masks or scanning processes.

"Interference Lithography" is a method that can form microstructures over a wide area through a parallel process (interference between two laser beams). The UV laser split by a splitter is magnified and exposed to form interference fringes. Additionally, by rotating the substrate to adjust the interference of the laser, it is possible to change the shape of the desired pattern, eliminating the need for masks or scanning processes. [Features] - Forms microstructures over a wide area through a parallel process - Magnifies and exposes the UV laser split by a splitter to form interference fringes - Patterns are recorded on photosensitive materials *For more details, please refer to the related links or feel free to contact us.

  • Other contract services
  • Lithography

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Contracted Processing Service: Photolithography

Contracted Processing Service: Photolithography

Leave contact aligners, steppers, and EB exposure to us!

We would like to introduce the processing contract services offered by M.T.C Corporation. With the extensive knowledge and experience gained from semiconductor processing, we provide MEMS contract processing services, including photolithography using contact aligners, steppers, and EB lithography. Additionally, we also perform pre-treatment, film formation, etching, electroplating, and bonding. Please feel free to contact us if you have any requests. 【Processing Details】 ■ Pre-treatment ■ Film formation ■ Photolithography ■ Etching ■ Electroplating ■ Bonding *For more details, please download the PDF or feel free to contact us.

  • 企業：M.T.C
  • 価格：Other
  • Processing Contract
  • Lithography

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