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Thin Film - メーカー・企業22社の業務用製品ランキング | イプロスものづくり

更新日: 集計期間:Sep 02, 2026~Sep 29, 2026
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Thin Filmのメーカー・企業ランキング

更新日: 集計期間:Sep 02, 2026~Sep 29, 2026
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  1. フロロテクノロジー Aichi//Chemical
  2. 京浜光膜工業 Kanagawa//Optical Instruments
  3. TOMOEGAWA CORPORATION Tokyo//Electronic Components and Semiconductors
  4. 4 AndTech Kanagawa//Service Industry
  5. 4 null/null

Thin Filmの製品ランキング

更新日: 集計期間:Sep 02, 2026~Sep 29, 2026
※当サイトの各ページの閲覧回数を元に算出したランキングです。

  1. Acid-resistant coating agent that works just by applying it, free of regulated substances, transparent thin film. フロロテクノロジー
  2. Soft Material, Thin Film, Coating Evaluation System STEP Series
  3. Enable to Provide in Thin Films (Min. 5μm) "Thermo-setting Electrical Insulation Film SJ41" TOMOEGAWA CORPORATION
  4. Digital temperature and humidity sensor, filter thin film 'SHT35-DIS-F' センシリオン
  5. Fundamentals of Aerosol Deposition (AD) Method, Film Formation Characteristics, and Device Applications AndTech

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Surface modification of films and improvement of thin film adhesion in sputtering.

This explains the application of sputtering to currently popular touch panel-related materials, focusing on the basics and troubleshooting!

**Lecturer** Professor Akira Iwamori, Department of Mechanical Engineering, Faculty of Engineering, Tokai University **Target Audience**: Engineers, researchers, personnel, and beginners interested in sputtering and plastic film formation **Venue**: Tokyo Chuo Ward Industrial Hall, 4th Floor, Meeting Room 4 [Tokyo, Nihonbashi] 5 minutes from B4 exit via underground passage from Bakuroyokoyama Station on the Toei Shinjuku Line (Directions 2) 5 minutes from C1 exit via East ticket gate from Bakurocho Station on the JR Sobu Rapid Line (Directions 3) and others **Date and Time**: October 26, 2011 (Wednesday) 13:30-16:30 **Capacity**: 30 people *Registration will close once full. Please apply early. **Participation Fee**: **[Early Bird Discount Price]** 46,200 yen (tax included, including text costs) for up to 2 people from one company *Limited to Tech-Zone members who apply by October 12. Membership registration is free. *After October 12, the **[Regular Price]** will be 49,350 yen (tax included, including text costs) for up to 2 people from one company.

  • 企業:AndTech
  • 価格:10,000 yen-100,000 yen
  • Technical Seminar
  • Thin Film

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Fundamentals of Aerosol Deposition (AD) Method, Film Formation Characteristics, and Device Applications

Introducing the latest information on the fundamentals such as film formation principles and process parameters, as well as the development of applications for energy devices.

**Lecture Summary** The new film formation technology utilizing the phenomenon of particle collision solidification, which forms a ceramic film on a substrate by dispersing and mixing ceramic microparticles in gas and then injecting them at high speed from a nozzle to collide with the substrate, has characteristics such as the ability to form thick films relatively easily at room temperature, resulting in dense structures composed of nanometer-level crystallite sizes. Due to its dense quality, the film exhibits high hardness, excellent adhesion to the substrate, and superior electrical insulation properties. This method allows for the film formation of various materials, including oxides such as alumina, titanium oxide, barium titanate, lead zirconate titanate (PZT), and yttria, as well as non-oxide materials like silicon carbide, and it also enables the composite of different materials. Additionally, since the film formation occurs at room temperature, it can be applied to low melting point materials such as resins and metals. In this presentation, I will discuss the characteristics of this film formation technology, compare it with conventional film formation methods, explore the relationships of various parameters affecting film formation, and discuss the application developments of this film material.

  • 企業:AndTech
  • 価格:10,000 yen-100,000 yen
  • Technical Seminar
  • Thin Film

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Extremely thin with large functionality - thin film -

What functions does a thin film have? How is it different from plating? What can it be used for? We will carefully support you in addressing these simple questions and the significant differences in functionality.

There are two main types of thin films. One is thin films with optical properties. Common examples include anti-reflective coatings on glasses and camera lenses. In the case of lenses without anti-reflective coatings, about 90% of the light passing through the lens cannot reach the eye or sensor. However, by applying an anti-reflective (AR) coating, it becomes possible to transmit nearly 100% of the light while also reducing the reflection from the lens. Optical properties are not limited to the control of visible light. Anti-reflective coatings targeting near-infrared light are also used on the end faces of optical fibers in high-speed communication networks. This is necessary to transmit infrared information with minimal loss and at high speeds. The other type is functional thin films. For example, to address the issue of water droplets adhering to camera lenses when it rains, there are functional thin film technologies such as hydrophobic and hydrophilic coatings. Some transparent thin films have functional properties, while others can impart color. The thickness of surface treatment technologies like plating ranges from 5 to 10 μm, whereas thin films are overwhelmingly thinner, ranging from several tens of nanometers to several hundred nanometers. Additionally, thin films created through deposition possess a luxurious gloss that is not found in plating.

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