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This is a K-cell type evaporation source developed for organic materials (organic EL, high vapor pressure materials) for thin films.
Precise control can operate extremely stably. The direct heating method provides excellent temperature responsiveness and stability in low-temperature ranges.
Metal vapor deposition cell
【Features】 Compact/space-saving design with ICF-70 Standard equipped with shutter mechanism Temperature setting possible with ±0.1℃ ●Applicable materials - Si (Silicon) - As (Arsenic) - Ga (Gallium) - Al (Aluminum) - In (Indium) - P (Phosphorus) etc. *Custom strokes, shapes, etc. can be accommodated according to specifications.
Successful Improvement Case Study Case 1 Organic Vapor Deposition Cell KOD-cell
◆◇◆Background◆◇◆ Until now, we have been using large organic vapor deposition cells from other companies. However, due to the large crucible capacity unique to these large cells, we have been struggling with very poor temperature stability and material efficiency. In the case of organic materials, there are instances where the cost of materials can reach tens of thousands of yen per gram. Therefore, using a large deposition source with poor material efficiency requires filling as much as 10 grams of material for a single deposition. We would like to address this issue by using our company's organic vapor deposition cells.
Successful Improvement Case Study 2: Metal Vapor Deposition Cell KMDW-Cell
◆◇◆Background◆◇◆ The conventional metal deposition method uses a boat system, applying a large current of over 100A when depositing the metal film. While the boat system allows even beginners to easily perform deposition, the use of high currents is considered a factor that negatively affects the quality of the film. Additionally, the amount of scattering during deposition is significant, requiring frequent maintenance of the chamber, making it difficult to use in a clean environment.
