Last Updated： Aggregation Period:Sep 24, 2025～Oct 21, 2025
This ranking is based on the number of page views on our site.
Last Updated： Aggregation Period:Sep 24, 2025～Oct 21, 2025
This ranking is based on the number of page views on our site.
Last Updated： Aggregation Period:Sep 24, 2025～Oct 21, 2025
This ranking is based on the number of page views on our site.
31～45 item / All 79 items
For output/simulation of analog signals (1CH). High-precision analog output with arbitrary values/patterns. Two-way operation with PC connection and standalone drive.
● High-precision output of analog signals (voltage/current) ● Output arbitrary voltage or current from a PC application ● Output voltage or current using patterns pre-recorded on an SD card ● Loop power for current output supports internal/external power sources
For output/simulation of analog signals (1CH). Capable of high voltage output of ±32V. High-precision analog output with arbitrary values/patterns.
● Built-in high-precision 16-bit DAC, outputs analog signals (voltage and current) ● Supports high voltage output (±32V) ● Allows control of analog output based on changes in digital input terminals ● Outputs arbitrary voltage or current from a PC application ● Outputs voltage or current based on patterns pre-recorded on an SD card ● Analog output and USB are high-voltage insulated ● Control commands are open for application in inspection systems, etc.
Ideal for R&D equipment using MWPECVD! MW-SURFATRONS are compatible with atmospheric pressure or reduced pressure.
The "MIRENIQUE series" is a microwave plasma source. It is suitable for PECVD, diamond, DLC, CNT, and plasma-assisted polymerization, with reactors and plasma sources ideal for MWPECVD R&D equipment. MW-SURFATRONS can operate at atmospheric pressure or reduced pressure. 【Features】 ■ Suitable for PECVD, diamond, DLC, CNT, and plasma-assisted polymerization ■ Reactors and plasma sources suitable for MWPECVD R&D equipment ■ MW-SURFATRONS can operate at atmospheric pressure or reduced pressure *For more details, please refer to the PDF materials or feel free to contact us.
Low-pressure operation ECR type atom source
It generates an atom flux from ECR-excited plasma. This atom source, based on the ECR method, has excellent low-pressure operating characteristics. This filamentless structure of the atom source can produce atom flux from gas species such as nitrogen, hydrogen, and oxygen.
It is possible to remove the magnet while maintaining the spatter source in ultra-high vacuum.
The "Ultra High Vacuum Compatible Magnetron RF Sputter Source" is a general-purpose compact magnetron sputter source compatible with ultra high vacuum. Since the entire body is bakeable, it enables film deposition with minimal impurities even with highly reactive targets. 【Features】 - Ultra high vacuum type that does not use O-rings - The magnet can be removed while maintaining the sputter source in ultra high vacuum - Baking up to 300°C is possible by removing the magnet - Target fixation is done with a retainer, allowing for quick target replacement - The gas inlet is integrated with the mounting flange, eliminating the need for a separate flange for gas introduction For more details, please contact us or download the catalog.
By removing the magnet, baking up to 300°C is possible.
This sputter source is a general-purpose compact magnetron sputter source compatible with ultra-high vacuum. Since the entire body is bakeable, it allows for film deposition with minimal impurities even with highly reactive targets. 【Features】 - Ultra-high vacuum type without O-rings - The magnet can be removed while maintaining the sputter source in ultra-high vacuum - Baking up to 300°C is possible by removing the magnet - The target is fixed with a retainer, allowing for quick replacement of the target - The gas inlet is integrated with the mounting flange, so a separate flange for gas introduction is unnecessary For more details, please contact us or download the catalog.
Wideband, high power compatible. Made by Noisecom, USA.
White Gaussian Noise - Noise source with output of -17 to +13 dBm Frequency range: 10 Hz to 100 MHz (+13 dBm for each model), 1 GHz to 10 GHz (-17 to +10 dBm for each model) Operating temperature range: -35 to +100°C, standard input voltage +28 VDC (<1.5 GHz), +15 VDC (>1.5 GHz) Applications include secure communication, jamming, CATV/HDTV, 10GE, PCI Express, etc. *For more details, please refer to the PDF document or feel free to contact us.
Designed with improved return loss for more reliable and accurate noise figure measurements!
The "WR-06 Noise Source" is a product that provides 15dB ENR across a frequency range of 110 to 170GHz. The RF port is equipped with a WR-06 UG-387/U-M anti-choke flange, and the DC port has a BNC connector, making it easy to connect to standard noise figure meters and noise figure analysis interfaces. The noise source is designed with improved return loss for more reliable and accurate noise figure measurements. 【Features】 ■ Provides 15dB ENR across a frequency range of 110 to 170GHz ■ Equipped with a BNC connector on the DC port ■ Easy to connect to standard noise figure meters and noise figure analysis interfaces ■ Designed with improved return loss for more reliable and accurate noise figure measurements ■ Operates in CW mode or pulse AM mode with a maximum of 1kHz *For more details, please refer to the PDF document or feel free to contact us.
Cafmangridless ion source set
For more details, please contact us or download the catalog. *This catalog is in English.
The KRI grid ion source is available in DC type and RF type.
Kaufman-type gridded ion gun RFICP ion source grid sizes: 4cm, 10cm, 14cm, 22cm, 36cm DC ion source grid sizes: 1cm, 4cm, 8cm, 10cm, 16cm The versatile gridded series of broad beam ion sources are available in different sizes which cover both R&D and high yield production requirements. Large ion beam sources meet critical output performance for uniform coverage over wide process zones. For more details, please contact us or download the catalog. *This catalog is in English.
Generation of a neutral beam with no charge. Manufactured by Oxford Alraid Research, UK.
By neutralizing the beam, it is also optimal for irradiation and etching processes of dielectrics and semiconductors, where charged particles have been a concern until now. ≪Applications≫ ■ Substrate cleaning before film formation ■ Sample cleaning and surface activation before room temperature bonding ■ Etching of semiconductor substrates, etc. ■ Microfabrication ■ Reactive atom beam etching ≪Features≫ ■ Unlike impacts from charged ions, there is no charge damage to insulating or semiconductor samples ■ Since the beam is charge-free, it travels straight without bending even in electric or magnetic fields.
Multi-purpose vacuum deposition device HEX system RF & DC sputtering source
This is a sputtering source for the multi-purpose vacuum deposition device HEX/HEX-L. It can be used in DC mode when the target is a conductor and in RF mode when the target is an insulator. With a gas hood as standard equipment, it is possible to increase the pressure near the target surface while keeping the chamber pressure low during film formation. Quick-release connectors are used for the connections of cooling water piping and gas piping, allowing for easy installation and removal of the piping without the need for tools. The Fission source can be fixed to the chamber with four butterfly nuts, eliminating the need for tools during installation and removal. It also supports reactive sputtering, enabling the deposition of oxides and nitrides. Up to three deposition sources can be installed on the HEX and up to six on the HEX-L, allowing for the deposition of multilayer films and compound films.
We recommend this for those looking for alternatives to discontinued or long-lead-time products.
Our company, Aquas, handles various electronic components as a major domestic distributor for JSCJ. We can also provide diodes and transistors that have ended production domestically! We welcome sample requests, so please feel free to contact us. 【Triac/SCR lineup】 ■ Various Triacs/SCRs 【About JSCJ】 Jiangsu Changjing Technology Co., Ltd. (JSCJ) was established as a semiconductor manufacturing subcontractor (OSAT) for the back-end processes (packaging and testing) and was spun off from Jiangsu Changdian Technology Co., Ltd. (JCET), which is the third largest discrete semiconductor manufacturer in the world (2017). *If you are looking for alternatives, please feel free to inquire.
We recommend this for those looking for manufacturers that provide a stable supply of standard ICs!
Our company, Aquas, handles various electronic components as a major domestic distributor for JSCJ. We can also provide diodes and transistors that are no longer produced domestically! We welcome sample requests, so please feel free to contact us. 【Analog IC Lineup】 ■ LDO Regulator IC ■ Three-Terminal Voltage Regulator ■ Reference Voltage IC ■ DC/DC Converter IC ■ Amplifier IC ■ Hall IC ■ Darlington Array ■ Lithium-Ion Battery Charging IC ■ Lithium Battery Protection IC 【About JSCJ】 Jiangsu Changjing Technology Co., Ltd. (JSCJ) was established as a semiconductor manufacturing subcontractor (OSAT) for back-end processes (packaging and testing) and was spun off from Jiangsu Changjiang Electronics Technology Co., Ltd. (JCET), the world's third-largest discrete semiconductor manufacturer (as of 2017). *If you are looking for alternatives, please feel free to contact us.
Second source products of Renesas transistors.
Our company, Aquas, handles various electronic components as a major domestic distributor for JSCJ. We have many alternatives for discrete items such as transistors and MOSFETs. Please feel free to contact us. Model number: 2SC1623 (SOT-23 package) 【About JSCJ】 Jiangsu Changjing Technology Co., Ltd. (JSCJ) was established as a semiconductor manufacturing backend (packaging and testing) outsourcing company (OSAT) and was spun off from Jiangsu Changjiang Electronics Technology Co., Ltd. (JCET), which is the third largest in the world (2017) in discrete semiconductor manufacturing. *We can request the latest datasheet from the manufacturer, so please feel free to make a request.
