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sauce Product List and Ranking from 27 Manufacturers, Suppliers and Companies

Last Updated： Aggregation Period:Jul 23, 2025～Aug 19, 2025
This ranking is based on the number of page views on our site.

sauce Manufacturer, Suppliers and Company Rankings

Last Updated： Aggregation Period:Jul 23, 2025～Aug 19, 2025
This ranking is based on the number of page views on our site.

  1. null/null
  2. アールエムテック Tokyo//Optical Instruments
  3. エーエムアール Tokyo//others 本社・ラボセンター
  4. 4 null/null
  5. 5 null/null
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sauce Product ranking

Last Updated： Aggregation Period:Jul 23, 2025～Aug 19, 2025
This ranking is based on the number of page views on our site.

  1. 2SC1623 Bipolar Transistor | Second Source
  2. Imaging mass spectrometry ion source for mass analysis devices
  3. Kaufman Gridless (End-Hole Type) Ion Source アールエムテック
  4. Atmospheric Pressure Ion Source "SICRIT" エーエムアール 本社・ラボセンター
  5. MBraun Vacuum Thin Film Deposition Evaporation Source

sauce Product List

1～15 item / All 75 items

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Intelligent Remote Plasma Source "Paragon®"

Intelligent Remote Plasma Source "Paragon®"

NF3 maximum flow rate 8 slm, improved process performance and lifespan with unique PEO plasma block design!

"Paragon (R)" has achieved more suitable data transfer and control for next-generation nano process development and manufacturing, based on the characteristics of the MKS low magnetic field toroidal plasma source with a proven track record in mass production. It supports CVD and ALD/ALE process chamber cleaning, achieving high analytical efficiency (>98%) even under conditions of 8 slm NF gas flow and a maximum pressure of 10 Torr. 【Features】 ■ Maximum NF flow rate of 8 slm, compact design reduces cleaning time ■ Unique plasma block design with PEO coating improves process performance and lifespan ■ RoHS compliant, CE, S2, F47 *For more details, please refer to the PDF document or feel free to contact us.

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『R*evolution V』

『R*evolution V』

Intelligent process control for on-wafer processing

"R*evolution V" is a product that integrates proven low magnetic field toroidal plasma technology, advanced communication capabilities, and high-precision power control functions. The remote plasma source in this series is suitable for oxygen radical-based applications such as photoresist stripping and various surface treatments. Additionally, the EtherCAT communication protocol enables near real-time information provision of critical plasma source operating parameters to process tools and factory networks. This product can circulate information to process tools and factory databases to support monitoring and modification of process parameters and operational diagnostics (APC/FDC) applications, ensuring high operational rates of process tools. [Features] - Function-integrated unit that can be directly installed in the chamber - Quartz applicator for high-density oxygen-based plasma - Output up to 6kW - High output reproducibility - High precision output control <1% *For more details, please refer to the PDF document or feel free to contact us.

  • Other measurement, recording and measuring instruments

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Noise source 10MHz to a maximum of 50GHz (depending on the model)

Noise source 10MHz to a maximum of 50GHz (depending on the model)

The output voltage standing wave ratio (VSWR) is low, and it excels in the flatness of the output excess noise ratio.

A noise source is a device that can generate a random continuous spectrum signal. A properly functioning noise source must have stable output noise power and a uniform power spectral density within the specified frequency band. We offer various solid-state coaxial noise sources in the frequency range of 10 MHz to 50 GHz. This includes the Smart Series and Standard Series, which have the advantage of a wide frequency range. They exhibit low output voltage standing wave ratio (VSWR) and excellent flatness of output excess noise ratio, among other features. The Smart Noise Source employs I2C bus technology to enable automatic downloads and improve measurement speed. Equipped with a digital temperature sensor, it allows the host to automatically monitor changes in ambient temperature, correcting the temperature for noise figure measurements and enhancing measurement accuracy. The standard noise source requires a pulse voltage drive of +28V. Together with a solid-state noise source and a noise figure analyzer, we provide a complete solution for measuring noise figures at microwave and millimeter-wave frequencies.

  • EMC Testing
  • Other electronic measuring instruments
  • Testing Equipment and Devices

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SPO2 (arterial blood oxygen saturation) to LED source

SPO2 (arterial blood oxygen saturation) to LED source

■Emitter onboard ■Chip on PCB ■Strong durability

This is an LED light source for measuring SPO2 (arterial blood oxygen saturation). It can be used as a light source for measurements using LEDs with wavelengths of 660nm, 905nm, and 940nm. These light sources are integrated into smartphones, smartwatches, and medical devices. 【Applications】 Medical sensors Oximeter probes Finger clamps ◆Dual Emitters LED Source (660nm & 905nm) ◆Dual Emitters LED Source (660nm & 940nm) ◆Triple Emitters LED Source (660nm & 905nm & 940nm)

  • Other optical parts
  • Other physicochemical equipment

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Plasma Source "PLUME Series"

Plasma Source "PLUME Series"

Introducing a plasma source compatible with multi-purpose applications: ICP, neutral atoms, and ion sources!

We would like to introduce the 'PLUME Series' that we handle. It is suitable for powder and inline treatment, remote plasma source / immersed plasma source. Please feel free to consult us when you need assistance. 【Features】 ■ ICP, neutral atom, and ion sources that can accommodate multiple purposes ■ For powder and inline treatment ■ Remote plasma source / immersed plasma source * For more details, please refer to the PDF document or feel free to contact us.

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Plasma Assist Source

Plasma Assist Source

We design and develop products that incorporate plasma functions and propose innovative process technologies.

The "Plasma Assist Source" is a plasma application product for semiconductor manufacturing processes. By adding plasma functionality, it is possible to enhance reactivity. Additionally, we design and develop products that add plasma functionality to existing process technologies, proposing innovative process technologies. 【Product Features】 ■ Plasma Cracking Cell - A cracking evaporation source for materials with high vapor pressure and poor directionality. - Activates sublimated materials and irradiates them onto the substrate through an orifice. ■ Plasma Source for ALD - Plasma source for ALD equipment, using oxygen or nitrogen. - Adjustable irradiation distance of 50 to 100 mm. - Excellent ON/OFF response speed and plasma stability. *For more details, please refer to the PDF document or feel free to contact us.

  • Other semiconductor manufacturing equipment

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Grid Ion Source Specification Details

Grid Ion Source Specification Details

We are publishing the specifications of various grid ion sources manufactured by Kaufman & Robinson.

At OSI Industry, we handle various grid ion sources manufactured by Kaufman & Robinson. We have detailed specifications for each type of grid ion source, so please take this opportunity to have a look. 【Contents Listed】 ● Discharge / Discharge Current / Discharge Power ● Grid ● Beam Type ● Gas Flow Rate ● Gas ● Pressure ● Ion Gun Height / Ion Gun Diameter ● Neutralizer For more details, please download the catalog or contact us.

  • Other semiconductor manufacturing equipment

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IONIX® Magnetron Sputter Source

IONIX® Magnetron Sputter Source

The unique cooling water pathway allows the entire magnetron to be cooled at a constant temperature at all times.

We handle the rectangular type 'IONIX® Magnetron Sputter Source'. It can be installed both internally and externally. Thanks to its unique cooling water pathway, the entire magnetron can be cooled to a constant temperature at all times. Additionally, it supports KF, ISO, and CF connections, and with its unique magnetic pole arrangement, it is compatible with the UMBS configuration. 【Features】 ■ Constant temperature cooling for the entire unit ■ Installable both internally and externally ■ Supports KF, ISO, and CF connections ■ Compatible with UMBS configuration due to unique magnetic pole arrangement ■ Cooling structure that does not put stress on the target, preventing deformation of the target *For more details, please refer to the PDF document or feel free to contact us.

  • Cooling system

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High-Power RF Ion Source "ISG-180"

High-Power RF Ion Source "ISG-180"

It is a high-output RF ion source that achieves a wide range and stable discharge.

It enables stable discharge over a wide range and can be used for various applications, from improving adhesion from non-shift films of optical filters to resin substrates. Our unique approach allows for reliable ignition and stable discharge performance. 【Features】 ○ High-output ion source with beam current of 1500mA / beam voltage of 1500V / ion current density of over 100μA/cm² ○ Achieves uniformity of ion current density distribution within ±10% (measured with the 1300 and 1550 devices) at high power → Measurement results from Sapio-1300, limited to specified conditions by Showa Vacuum Co., Ltd. ○ Adoption of an auto-matcher for the neutralizer to ensure reliable ignition performance and stabilization ○ The use of a newly developed collector electrode (patent pending) enables high output with an emission current of 2500mA → Prevents particle generation due to charge-up For more details, please contact us or download the catalog.

  • Ion implantation equipment

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AgilLOC Resilient Time Source

AgilLOC Resilient Time Source

Robust GNSS spoofing detection! Machine learning algorithms for enhanced timing holdover.

"AgilLOC Resilient Time Source" is a product that provides advanced resilience against new types of threats to GNSS, such as spoofing and jamming. With a short training time, it enables rapid system protection at power-on. Additionally, in monitoring mode, it enhances timing holdover when spoofing or signal interruptions are detected to ensure system continuity. 【Features】 ■ Robust GNSS spoofing detection ■ Machine learning algorithms for enhanced timing holdover ■ Short training time ■ Support for multiple GNSS constellations ■ Optional enhanced GPS output to third-party NTP servers *For more details, please refer to the PDF document or feel free to contact us.

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[Case Study] Precision Equipment Rental Company V Corporation

[Case Study] Precision Equipment Rental Company V Corporation

I was able to outsource detailed tasks and support with peace of mind!

We would like to introduce a case study of outsourcing the logistics of pocket Wi-Fi rental devices at Company V, a precision machinery rental company. Operations that were previously conducted in a downtown building were transferred to a warehouse near the airport. In addition to strict adherence to delivery deadlines, tasks requiring detailed parts and charging management were outsourced. Being close to the airport allows for rapid emergency responses, such as resending, even if issues arise. [Case Overview] ■Challenges - Since these are rental devices, it is preferable to have a location close to the airport for early returns and irregular responses. - Additional personnel beyond the usual amount is needed to handle peak periods during holidays. *For more details, please refer to the PDF document or feel free to contact us.

  • Other contract services

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