CCP simulation analysis software "Particle-PLUS"
"Particle-PLUS" is a plasma and rarefied fluid analysis software that excels in 2-frequency CCP analysis using the particle method.
"Particle-PLUS" is a simulation software suitable for research and development of devices using plasma, compatible with CCP. - Excels in plasma simulation for low-pressure gases where fluid modeling is challenging - Advanced physical model analysis including CCP and external circuit models - Supports 2D (two-dimensional) and 3D (three-dimensional) analysis, efficiently handling complex models - As a strength of our in-house developed software, it offers standard functions for CCP and magnetron sputtering calculations, as well as customization to fit customer devices ◆ Supports various cases ◆ - Magnetron sputtering - PVD, plasma CVD - Capacitively coupled plasma (CCP) - Dielectric barrier discharge (DBD), etc. ◆ Outputs various calculation results ◆ - Potential distribution - Density distribution/temperature distribution/generation distribution of electrons and ions - Particle flux and energy flux to the wall - Energy spectrum of electrons and ions at the wall - Density distribution/temperature distribution/velocity distribution of neutral gas, etc. *For more details, please feel free to contact us at information@wavefront.co.jp.
- Company:ウェーブフロント 本社
- Price:Other