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Glove box Product List and Ranking from 74 Manufacturers, Suppliers and Companies | IPROS GMS

Last Updated： Aggregation Period:Jun 03, 2026～Jun 30, 2026
This ranking is based on the number of page views on our site.

Glove box Manufacturer, Suppliers and Company Rankings

Last Updated： Aggregation Period:Jun 03, 2026～Jun 30, 2026
This ranking is based on the number of page views on our site.

  1. 神港精機 東京支店 Tokyo//Industrial Machinery
  2. アイビック・リサーチ Ibaraki//Testing, Analysis and Measurement
  3. 万善工機 Tokyo//Testing, Analysis and Measurement
  4. 4 エイエルエステクノロジー Kanagawa//Testing, Analysis and Measurement
  5. 5 UNICO 　　つくばフロンティア・ラボ Ibaraki//Testing, Analysis and Measurement
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Glove box Product ranking

Last Updated： Aggregation Period:Jun 03, 2026～Jun 30, 2026
This ranking is based on the number of page views on our site.

  1. Conveyor Furnace "SBC Series" 三共
  2. Powder Artificial Gastric Juice Artificial Intestinal Juice BioWise アイビック・リサーチ
  3. The glove box "Sagami" that has achieved low prices. エイエルエステクノロジー
  4. Contract film deposition service for experimental and research development purposes: "ALD (Atomic Layer Deposition) Equipment" ワッティー
  5. 4 Multi-purpose sputtering device 神港精機 東京支店

Glove box Product List

121～150 item / All 222 items

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Compound semiconductor deposition device (AAMF-C1650SPB type)

Compound semiconductor deposition device (AAMF-C1650SPB type)

A dedicated deposition device optimal for advanced optical devices. Achieves a smooth film surface with low-temperature, low-damage film formation. High-quality electrode films realized by hardware compatible with ultra-high vacuum.

A large-diameter cryopump has been adopted in a more compact chamber than conventional types, and ultra-high vacuum compatibility has been implemented in each mechanism of the chamber, enabling a clean high-vacuum environment. The evaporation source uses an electron gun with a water-cooled reflective electron trap, achieving low-damage film formation that prevents electron bombardment on the substrate. The well-established six-gun electron gun is compatible with the formation of multilayer film electrodes that include high-melting-point metals. It features stable deposition, eliminating substrate damage from micro-arcs and abnormalities on the film surface caused by droplets. It can also accommodate lift-off deposition according to the process and production volume. During lift-off deposition, a water-cooling mechanism from the back of the substrate compatible with thick-film electrodes allows for the formation of precious metal thick-film electrodes.

  • Evaporation Equipment
  • Glove box

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Hydrogen atmosphere conveyor furnace (reduction atmosphere continuous heat treatment device)

Hydrogen atmosphere conveyor furnace (reduction atmosphere continuous heat treatment device)

A bestselling type with a wealth of achievements, supporting high-temperature soldering, paste sintering, and metal particle sintering processes with reliable software and highly dependable hardware.

Replacement of the atmosphere in the furnace with hydrogen reduction. Achieving low oxygen concentration and reduction atmosphere treatment that cannot be realized with an inert atmosphere using N2 through continuous processing in a conveyor furnace. Utilizing the reduction effect of the hydrogen atmosphere, it supports high-temperature soldering and continuous reduction atmosphere heat treatment that require high reliability, which cannot be addressed by conventional reflow. There is also a wealth of experience in firing various pastes. The system covers the reflow process for wafer bumps of system LSI with a CtC type compatible with 300 mm wafers. In addition to conventional soldering, brazing, and paste firing processes, it also has a proven track record in sintering bonding for next-generation bonding materials (metal nano-paste). A demonstration machine is permanently available to reliably support initial tests for various applications through to mass production.

  • Reflow Equipment
  • Annealing furnace
  • Electric furnace
  • Glove box

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R&D Multi-Chamber Sputtering Device

R&D Multi-Chamber Sputtering Device

Specialized for responding to R&D and niche processes, a new type of multi-chamber sputtering device for small-scale production and prototyping/research and development, which is difficult with mass production equipment.

A low-cost multi-chamber sputtering system dedicated to the development of advanced thin film processes and small-scale production. It accommodates a wide range of fields with a high-efficiency cathode that excels in film thickness control and a variety of optional mechanisms. Proven in various processes, not only for Si semiconductor electrodes and wiring films but also for magnetic films, insulating films, and protective films for micro-magnetic devices and MEMS. It features the ability to equip different process chambers such as evaporation, annealing, and CVD, allowing for full custom-made production that freely connects each process chamber to a proven mainframe (transport system).

  • Sputtering Equipment
  • Plasma surface treatment equipment
  • Glove box

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Multi-purpose sputtering device for surface treatment, model STV6301.

Multi-purpose sputtering device for surface treatment, model STV6301.

A multipurpose sputtering device specialized for surface treatment of three-dimensional shaped parts, the entire outer surface, both sides of flat substrates, and film formation on three-dimensional shapes. It is also suitable for film formation on the inner surface of tumblers.

This is a dry surface treatment device that efficiently performs various coatings on three-dimensional shaped parts and molded products made of resin, glass, metal, etc. It can form thin films of various materials such as metals and ceramics over the entire surface. Features: ◎ Full surface film formation on three-dimensional shaped parts ◎ Coating of the inner surfaces of cups and tumblers using a special mechanism ◎ Naturally derived dry hydrophilic coating (plasma lava coating) ◎ Compatible with a wide range of applications from electronic substrates to resin decorations

  • Sputtering Equipment
  • Glass
  • fiber
  • Glove box

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Conveyor-type transport bar far-infrared conveyor furnace

Conveyor-type transport bar far-infrared conveyor furnace

Place the workpiece on the bar that is laid horizontally and transport it while irradiating with far infrared rays.

This is the optimal method when you want to minimize the contact area between the workpiece and the transport device.

  • Drying Equipment
  • Electric furnace
  • Glove box

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Conveyor-type belt hot air circulation conveyor furnace

Conveyor-type belt hot air circulation conveyor furnace

It is a conveyor that dries workpieces with hot air.

The transportation method will be designed according to your needs, including mesh belts (SUS/plastic), chain bar transport, takt feeding, and multi-row options.

  • Drying Equipment
  • Electric furnace
  • Glove box

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Conveyor-type automatic shutter takt conveyor furnace

Conveyor-type automatic shutter takt conveyor furnace

Equipped with insulated shutters at the entrance and exit of the conveyor.

This method is ideal when you want to minimize hot air or when the processing time of the work is long.

  • Drying Equipment
  • Electric furnace
  • Glove box

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ICP etching equipment for compound semiconductor processes

ICP etching equipment for compound semiconductor processes

ICP etching equipment for compound semiconductor processes

The RIE-330iPC is a multi-wafer processing etching device for compound semiconductor processes that employs an inductively coupled plasma (ICP) discharge method. 【Features】 ○ Compatible with large trays of Φ330mm Up to 27 pieces for Φ2-inch wafers, 17 pieces for Φ2.5-inch wafers, 12 pieces for Φ3-inch wafers, 7 pieces for Φ4-inch wafers, and 3 pieces for Φ6-inch wafers can be processed simultaneously. ○ By adopting the new SSTC (Symmetrical Shielded Tornado Coil) electrode as the ICP source, it enables high selectivity and excellent uniformity in etching over large areas. ○ Allows for low-damage processes at low bias (below -100V). ○ Stable etching conditions can be achieved through temperature control of the substrate stage and the inner walls of the reaction chamber. ○ A turbo molecular pump is also used in the load lock chamber, providing a more stable process.

  • Etching Equipment
  • Wafer processing/polishing equipment
  • Glove box

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ICP etching equipment RIE-800iPC/RIE-400iPC

ICP etching equipment RIE-800iPC/RIE-400iPC

Introducing a full-scale production device equipped with a vacuum cassette chamber, offering excellent process reproducibility and stability.

The "RIE-800iPC/RIE-400iPC" is an ICP etching device that boasts stability for continuous processing of 25 SiC trench-shaped wafers. It can efficiently and stably apply high RF power (over 2 kW), achieving good uniformity. Additionally, by adopting an exhaust system directly connected to the reaction chamber, it realizes a wide process window from low flow and low pressure to high flow and high pressure. 【Features】 <RIE-800iPC> ■ Supports maximum Φ8” wafers ■ Uses inductively coupled plasma for discharge ■ Equipped with a vacuum cassette chamber, excelling in process reproducibility and stability ■ Optimizes the distance between the wafer and plasma to ensure good in-plane uniformity ■ Integrates TMP (Turbo Molecular Pump) and high-frequency power supply for easy replacement *For more details, please refer to the PDF document or feel free to contact us.

  • Etching Equipment
  • Glove box

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Experimental sputtering device

Experimental sputtering device

Equipped with a simple yet φ3-inch target magnetron cathode and a wide-range turbo molecular pump with a capacity of 200 L/s.

● Price: 5 million yen (including tax) ● φ3 inch target, 1 molybdenum cathode ● RF 300W power supply, with automatic matching box ● Gas system: 1 system (up to 3 systems available as an option), adjustable via mass flow controller ● Capable of sputtering insulators such as oxides. ● Option to install a substrate heater available. ● Simple structure that is easy to use while eliminating unnecessary components. ● Space-saving dimensions: 800W × 600L × 900H.

  • Company：ヤシマ
  • Price：1 million yen-5 million yen
  • Plasma surface treatment equipment
  • Organic EL
  • Sputtering Equipment
  • Glove box

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Mobile Lab Space

Mobile Lab Space

Highly acclaimed! Introducing the foldable simple glove box.

A lightweight and portable folding glove box. The front fully opens for easy access, and putting on and taking off gloves is simple. Basic gas replacement is also possible.

  • Other powder equipment
  • Glove box

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Vacuum glove box with gas circulation purification system

Vacuum glove box with gas circulation purification system

Achieve an environment with oxygen and moisture concentration below 1 ppm!

By connecting to the gas circulation purification device, it can be used in an environment with both oxygen and moisture concentrations below 1 ppm. After evacuating the main body of the glove box, it is possible to replace the gas, allowing for the creation of a high-purity gas atmosphere in a short time. The pass box can also be vacuum gas replaced, enabling the transfer of items while maintaining the internal atmosphere. Additionally, it is equipped with a sliding table, making it easy to handle items. A power outlet is standardly equipped inside, allowing for easy integration of equipment such as balances. There is ample space without waste, making it easy to introduce equipment into the interior.

  • Other laboratory equipment and containers
  • Glove box
  • Glove box

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Vacuum glove box with gas circulation purification system

Vacuum glove box with gas circulation purification system

Achieve an environment with oxygen and moisture concentration below 1 ppm!

By connecting to the gas circulation purification device, both oxygen and moisture concentrations can be maintained below 1 ppm. After evacuating the main body of the glove box, it is possible to replace the gas, allowing for the creation of a high-purity gas atmosphere in a short time. The pass box can also be vacuum gas replaced, enabling the transfer of items while maintaining the internal atmosphere. Additionally, it is equipped with a sliding table, making it easy to handle items. A standard outlet is provided inside, allowing for the easy integration of equipment such as balances. There is ample space without waste, making it easy to introduce equipment into the interior.

  • Other laboratory equipment and containers
  • Glove box
  • Glove box

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Purge-type glove box with gas circulation purification system

Purge-type glove box with gas circulation purification system

Achieve an environment with oxygen and moisture concentration below 1 ppm!

By connecting to a gas circulation purification device, it can be used in an environment with both oxygen and moisture concentrations below 1 ppm. Since the pass box can be vacuum gas replaced, items can be taken in and out while maintaining the internal atmosphere. Additionally, it is equipped with a slide table, making it easy to handle items. There is a standard outlet inside, allowing for easy integration of equipment such as balances. There is ample space without waste, making it easy to introduce equipment into the interior.

  • Other laboratory equipment and containers
  • Glove box
  • Glove box

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Glove box with microscope

Glove box with microscope

Possible to perform from sampling to measurement within the atmosphere.

The oxygen and moisture concentration in the measurement environment can always be maintained below 1 ppm, allowing for speedy and stable observations. In addition to the microscope, you can also use AFM (Atomic Force Microscope), TG (Thermogravimetric Analyzer), and gas chromatography.

  • Optical Measuring Instruments
  • Glove box
  • Glove box

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Hazardous material handling glove box

Hazardous material handling glove box

It is possible to safely handle hazardous substances.

We will propose something that meets your requirements, not just a shape like the one in the image.

  • Hazardous material processing
  • Glove box
  • Glove box

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Standard equipment: Glove box / Gas circulation purification device

Standard equipment: Glove box / Gas circulation purification device

Leave it to us for glove boxes and gas circulation purification systems.

Remove oxygen and moisture in a short time to create an optimal working environment. 【Features】 <Glove Box> ○ Compact & economical type ○ Compatible with vacuum type / gas replacement type ○ Supports multiple glove types / face-to-face operation type ○ Automatic pressure regulation function makes glove work easy <Gas Circulation Purification Device> ○ Compact & economical type ○ Capable of gas purification in a short time (moisture, oxygen) ○ Selection of precious metal catalyst and Ni catalyst is possible ○ Compatible with manufacturing equipment for continuous use (double column type) *For more details, please download the PDF or contact us.

  • Vacuum Equipment
  • Glove box

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Low Dew Point Air Glove Box "Desi-Cube mini"

Low Dew Point Air Glove Box "Desi-Cube mini"

Perfect for creating a dry room environment! We pursue convenience and offer it at a reasonable price.

The "Desi-Cube mini" is a glove box that creates a dry room environment using a desiccant dehumidifier that utilizes a dehumidification rotor, without the use of inert gases such as nitrogen or argon. To meet the needs of customers who want to conduct experiments in a dry room environment, which has traditionally been perceived as expensive, we have compactly integrated our unique dehumidification technology into a product. 【Features】 ○ Easy installation without the need for construction work. ○ No complicated settings required. ○ Can be easily used without special knowledge. ○ Equipped with various adjustment functions such as dew point temperature control and anti-static measures. For more details, please contact us or download the catalog.

  • Other environmental equipment
  • Drying Equipment
  • Glove box

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Custom Glove Box, K-Brush Co., Ltd.

Custom Glove Box, K-Brush Co., Ltd.

We also offer consultations for custom models suitable for your application, along with standard models.

It is mainly used for the following experimental and manufacturing purposes: ● Inkjet printing ● Lithium battery manufacturing ● OLED/PLED thin film deposition ● Medical devices ● Pharmaceuticals and compounding ● Specialty chemicals ● Chemical research ● Lamps

  • Organic Natural Materials
  • Lithium-ion battery
  • Glove box
  • Glove box

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Glove box - For pharmaceuticals, drug development, and compounding.

Glove box - For pharmaceuticals, drug development, and compounding.

The innovative technology glove box is available for use in the fields of dispensing and pharmaceuticals.

Features ■ The system is manufactured in the United States ■ Easy operation with a user-friendly interface ■ A wide range of accessories for the equipment, supplying systems in various sizes ■ Maintains an inert gas atmosphere with oxygen and moisture levels below 1 ppm ■ Automatically regenerates the purification column ■ Special designs tailored to specific applications ■ Proven track record of supplying glove boxes since 1981 ■ High-quality gas and vacuum components ■ Can be equipped with solvent purification devices ■ Mobile stands equipped with gas purification devices are also available

  • Organic Natural Materials
  • Other metal materials
  • Lithium-ion battery
  • Glove box

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Glove Box - For Laser Welding and TIG Welding - Kevlar Co.

Glove Box - For Laser Welding and TIG Welding - Kevlar Co.

Lithium battery, lithium-ion battery, OLED, organic EL, PLED, thin film, deposition, next-generation lighting, sealing, packing.

Features ■ The system is manufactured in the United States ■ Easy operation with the user interface ■ A wide variety of accessories for the equipment, supplying systems in various sizes ■ Maintains an inert gas atmosphere with oxygen and moisture levels below 1 ppm ■ Automatically regenerates the purification column ■ Special designs tailored to specific applications ■ Proven track record of supplying glove boxes since 1981 ■ High-quality gas and vacuum components ■ Can be equipped with solvent purification devices ■ Mobile stands equipped with gas purification devices are also available

  • Organic Natural Materials
  • Other metal materials
  • Lithium-ion battery
  • Glove box

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Thread Running Friction Coefficient Measurement Device Model ME-P

Thread Running Friction Coefficient Measurement Device Model ME-P

Friction coefficient calculation output

This is an introduction to the thread running friction coefficient measurement device handled by Eiko Sangyo Co., Ltd.

  • Testing Equipment and Devices
  • Glove box

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Ceramic coating equipment

Ceramic coating equipment

Equipped with a substrate driving mechanism, it is capable of rotating, swiveling, and moving the substrate horizontally! The heating heater uses carbon material.

The "Ceramic Coating Device" is a device that coats substrates with ceramic in a high vacuum state. It can raise the chamber temperature to nearly 1200°C. Additionally, a significant feature is that it is equipped with a substrate drive mechanism, allowing the substrate to rotate, pivot, and move horizontally. An electron gun (JEOL 16KW electron gun) is used as the evaporation source, and the crucible section can be controlled for elevation and rotation to accommodate ingot-shaped evaporation materials. For film formation control, it has a shutter mechanism, and it is also possible to set the opening and closing time and the number of repetitions for the motion. 【Features】 ■ Coats substrates with ceramic in a high vacuum state ■ Can raise the chamber temperature to nearly 1200°C ■ Equipped with a substrate drive mechanism, allowing for rotation, pivoting, and horizontal movement of the substrate ■ Uses an electron gun (JEOL 16KW electron gun) as the evaporation source ■ The crucible section can be controlled for elevation and rotation to accommodate ingot-shaped evaporation materials *For more details, please refer to the PDF document or feel free to contact us.

  • Other surface treatment equipment
  • Glove box

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Glove box with gas purification system for low humidity and low oxygen conditions *Exhibition model available

Glove box with gas purification system for low humidity and low oxygen conditions *Exhibition model available

A device capable of handling substances in special environments such as low oxygen and low humidity.

This is a device that can be used when handling raw materials, such as battery materials and semiconductor materials, whose properties are compromised when exposed to oxygen or moisture. By creating a low-oxygen or low-humidity environment within the glove box's work area, operations can be conducted while maintaining the characteristics of the materials. The low-oxygen or low-humidity environment is established by replacing the air in the work area with nitrogen or dry air. As standard performance, both oxygen concentration and moisture levels are achieved at below 1 ppm. <Examples of using a glove box with a gas purification device> - Weighing processes for raw materials that are sensitive to oxygen and moisture - Processing steps such as grinding of the above raw materials (docking powder processing machinery in the work area), etc. *You can see the actual device at our Shizuoka Techno Park (Fujieda City, Shizuoka Prefecture). *For more details, please download the PDF (catalog) or contact Dalton.

  • Glove box
  • Glove box

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Exhaust-type glove box

Exhaust-type glove box

A sealed exhaust device capable of creating containment spaces in environments other than pharmaceuticals.

- It is a device that maintains the workspace in a negative pressure state to prevent the exposure of substances inside the chamber to the outside environment. - It ensures the safety of operators and the external environment, and prevents contamination of handled materials. - It can be introduced in environments where pharmaceutical-grade standards are not required. <Examples of using an exhaust-type glove box> - Weighing of chemical raw materials - Handling of radioactive materials (equipped with lead shielding), etc. *For more details, please contact Dalton.

  • Glove box
  • Glove box

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[Information] Vacuum Plasma Nano Coating

[Information] Vacuum Plasma Nano Coating

Non-woven fabrics and technical textiles! A clear introduction to production equipment and environmental advantages.

This document introduces the "Vacuum Plasma Nano Coating" manufactured by Europlasma, which we handle. The main applications of Europlasma are "NW (non-woven fabric)" and "TT (technical textiles)." Compared to wet chemical treatments, "Plasma Nano Coating" has impressive environmental advantages. [Contents] ■ Europlasma ■ Plasma Process ■ Non-woven Fabric and Technical Textiles ■ Production Equipment ■ Environmental Advantages ■ Conclusion *For more details, please refer to the PDF document or feel free to contact us.

  • Other contract services
  • Surface treatment contract service
  • Glove box

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Vacuum Glove Box FTGB-500 Series

Vacuum Glove Box FTGB-500 Series

A workspace that is resistant to acids for all SUS use has been realized, even in the presence of highly toxic substances, solids, and powders in the air!

【Features】 - Easily achievable at a low price! - Strong acid resistance due to the use of all stainless steel, creating a workspace for handling highly toxic substances, solids, and powders in the air! - The front glass can be easily removed, making it easy to load and unload large items! Various options can be attached to achieve all kinds of processing! 【Standard Equipment】 Bourdon tube vacuum gauge: 1 on the main unit, 1 on the pass box.

  • Vacuum Equipment
  • Glove box

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Simple glove box

Simple glove box

◆Easily portable simple glove box◆

A simple glove box is a basic sealed box designed to allow only hands to enter, enabling work to be performed in a situation isolated from outside air. The rubber gloves (gloves) attached to the box are directly connected, allowing for work that is shielded from outside air and protecting the operator. ■ The main body size, number of gloves, glove positions, etc., can be fully customized. ■ It comes with casters. When moving, the resin shutter is raised.

  • Protective Equipment
  • Glove box

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Extreme Ultra High Vacuum Chamber

Extreme Ultra High Vacuum Chamber

We manufacture various vacuum chambers tailored to the diverse research applications of our customers, ranging from high vacuum and ultra-high vacuum to extreme high vacuum.

At Kitano Seiki, we manufacture various vacuum chambers tailored to the diverse research applications of our customers, ranging from high vacuum to ultra-high vacuum and even extreme high vacuum. The shape of the vacuum chamber and the type of stainless steel used can be selected from a wide variety to best suit the specifics of the experiment. You can also specify the number, angle, and position of ports for branching equipment and measurement devices in great detail. Furthermore, we respond accurately to any requests that require special processing, with a comprehensive system that covers everything from design and machining to surface treatment, packaging, cleaning, assembly, leak testing, and vacuum startup.

  • Analytical Equipment and Devices
  • Microscope
  • Glassware and containers
  • Glove box

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Beam Shutter Mechanism "KBS-01"

Beam Shutter Mechanism "KBS-01"

The shutter speed can be adjusted arbitrarily using the air pressure adjustment valve (standard accessory).

The beam shutter mechanism is equipped with an air cylinder controlled by an electromagnetic valve in the drive system, allowing for quick response in both the blocking and opening operations. This product is used in shutters and similar devices to shield and open atomic beam lines such as rubidium (Rb) and sodium (Na). 【Specifications】 ○ Shutter operation speed: 30–800 mm/s ○ Shutter operation stroke: 0–20 mm ○ Mounting flange: ICF-70 (through hole) ○ Baking temperature: 200°C (excluding air cylinder and electromagnetic valve) ○ Shutter operation direction: All-direction compatible For more details, please contact us or download the catalog.

  • Vacuum Equipment
  • Glove box

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