Automatic exposure device
A mask aligner that achieves a high throughput of 190 WPH.
This is a fully automatic exposure device compatible with a 2-inch wafer size. By replacing the conventional multi-joint robots used in wafer transport with three self-developed transport robots, we have achieved a high throughput of 190 pieces (2-inch wafers) per hour. In particular, the newly developed alignment image processing employs auto-alignment that performs composite searches with arbitrary coordinate specification and intelligent θ search. Additionally, to ensure stable visibility, the microscope's halogen lighting incorporates a new mechanism that feeds back illumination attenuation through image processing. The operator simply sets the photomask and wafer and selects a pre-stored exposure recipe, allowing for automatic wafer transport, alignment with the photomask, and exposure, enabling stable exposure with precision that does not depend on the operator or experience level.
- Company：Xebex Solutions, Inc.
- Price：Other
