We apply hard DLC (diamond-like carbon) through sputtering, suitable for medical supplies and automotive parts! *Demo tests are currently being conducted.
The RAM CATHODE dramatically improves the ionization rate by using a four-sided opposing target, allowing for the formation of DLC (ta-C) with a DC pulse power supply instead of a HIPIMS power supply.
【Conventional Sputtering Method】
Due to the low ionization rate of carbon, it was necessary to use a HIPIMS power supply to forcibly increase the ionization rate in order to obtain a hard ta-C region.
【RAM Cathode Developed by Our Company】
By arranging targets that face each other on four sides, the magnetic field between the targets enhances plasma confinement, resulting in the formation of high-density plasma. Within the confined plasma, electrons, rebounding argon, and Cflux repeatedly collide, promoting the ionization of Ar ions and Cflux, which facilitates the easy formation of C-C bonds in the DLC film.
As a result, we have achieved the formation of high-hardness and high-smoothness DLC without using a HIPIMS power supply. Additionally, since surface treatment is unnecessary, quality is improved, and time and labor costs can be reduced.
*For more details, please refer to the PDF document or feel free to contact us.