Is that polishing machine part still unusable? It can remove stubborn dirt and be made usable. It also offers about a 50% cost reduction compared to replacing it with a new one!
The "dirt" on parts of polishing machines and CMP devices (such as cooling pipes in polishing material tanks, polishing material tanks, and flow meters) poses a risk of affecting product quality if left unattended, and can also be a cause of equipment failure. However, are you struggling with "adhered polishing materials that are hard to remove"? Additionally, have you been replacing items with new ones due to the presence of dirt?
At First Duck, we offer "contract cleaning" to remove adhered polishing materials and more. We can clean and regenerate polishing materials such as colloidal silica and cerium oxide. We clean stubborn dirt that has previously taken time and effort to remove, contributing to the stability of product quality. This results in nearly a 50% cost reduction compared to replacing with new items. We already have over three years of proven results. Please feel free to contact us for inquiries and consultations.
[Case Study Introduction]
<Cleaning Test of Adhered Polishing Material on Hose (Photo)>
- As a result of using cerium oxide, we were able to completely clean the polishing agent adhered inside the hose.
■ Polishing Agent Used ⇒ Cerium Oxide
(*The catalog introduces the cleaning test of adhered polishing materials on hoses.)
*For more details, please refer to the PDF document or feel free to contact us.
