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Aerospace Tantalum (Ta) Target

Tantalum (Ta) target purity ≧ 5N

In the aerospace industry, the durability of components in high-temperature environments is crucial. Particularly for rocket and aircraft engine parts, materials with excellent heat resistance and corrosion resistance are required. Traditional materials have faced issues with degradation and corrosion in high-temperature environments. Our tantalum (Ta) target offers high heat resistance and excellent corrosion resistance, enhancing reliability in aerospace applications. 【Application Scenarios】 - Rocket engine parts - Aircraft engine parts - Components used in high-temperature environments 【Benefits of Implementation】 - Improved heat resistance - Enhanced corrosion resistance - Increased lifespan of components

  • Other metal materials

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Tantalum (Ta) target for automotive sensors

Tantalum (Ta) target purity ≧ 5N

In the automotive industry, sensor technology requires high precision and durability. Especially for sensors used in harsh environments, the reliability of materials significantly affects performance. Tantalum (Ta) targets have been developed to meet these demands. 【Application Scenarios】 - In-vehicle sensors - Autonomous driving systems - Safe driving assistance systems 【Benefits of Implementation】 - Realization of high-sensitivity sensors - Extension of sensor lifespan - Assurance of stable performance

  • Other metal materials

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Tantalum (Ta) target for communication purposes

Tantalum (Ta) target purity ≧ 5N

In the telecommunications industry, particularly for high-frequency applications, the transmission efficiency of signals and the durability of devices are important challenges. High-frequency devices are susceptible to high-temperature environments and the effects of electromagnetic waves, and the quality of the materials used greatly influences performance. Tantalum (Ta) targets possess high heat resistance, excellent corrosion resistance, and good conductivity, addressing these challenges. Our tantalum (Ta) targets enable the formation of high-quality thin films, contributing to the high performance of communication devices. 【Application Scenarios】 - High-frequency filters - High-frequency amplifiers - Communication satellite components - 5G base stations 【Benefits of Implementation】 - Improved high-frequency characteristics - Extended device lifespan - Enhanced stability of signal transmission - Increased thin film deposition efficiency

  • Other metal materials

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Tantalum (Ta) target for jewelry.

High-purity tantalum (Ta) target that enhances the beauty of jewelry.

In the jewelry industry, a beautiful appearance and high durability are essential in design. Particularly as design diversification progresses, the expressiveness of metallic luster and color significantly influences the appeal of products. Tantalum (Ta) targets are a crucial element in achieving both beauty and durability in surface treatment for jewelry due to their high corrosion resistance and high density. Our tantalum (Ta) targets enrich the design expression of jewelry by providing high-quality thin films to address these challenges. 【Usage Scenarios】 - Decorative items such as rings, necklaces, and bracelets - Decorative components for watches - High-design accessories 【Benefits of Implementation】 - Achieving beautiful metallic luster and color - Extending product lifespan through high corrosion resistance - Realizing design diversity

  • Other metal materials

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Zirconium (Zr) target for nuclear fuel

Zirconium (Zr) target, purity ≧ 3N5, Hf ≦ 0.2 wt%, currently shipping.

In the nuclear fuel industry, materials with high heat resistance and corrosion resistance are required. In particular, the quality of zirconium alloys is crucial for ensuring the safety of fuel in the harsh environment within a reactor. Zirconium (Zr) targets have been developed to meet these demands. 【Application Scenes】 - Fuel manufacturing for nuclear power plants - Production of zirconium alloys in research and development 【Effects of Introduction】 - Manufacturing of high-quality zirconium alloys - Improvement of fuel safety - Achievement of long-term stable operation

  • Other metal materials

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Zirconium (Zr) target for electronics

Shipping zirconium (Zr) targets with purity ≥ 3N5 and Hf ≤ 0.2 wt%.

In the electronics industry, high-quality thin film formation is required for sputtering applications. Particularly in the manufacturing of semiconductor devices and electronic components, the purity and uniformity of the target material significantly affect product performance. Zirconium (Zr) targets are utilized in the production of various electronic components due to their excellent corrosion resistance and heat resistance. Our zirconium (Zr) targets enable high-quality thin film formation and contribute to improving the reliability of our customers' products. 【Usage Scenarios】 - Semiconductor manufacturing - Electronic component manufacturing - Thin film formation 【Benefits of Implementation】 - High-quality thin film formation - Improved product reliability - Enhanced sputtering efficiency

  • Other metal materials

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Zirconium (Zr) target for display applications

Zirconium (Zr) target, purity ≧ 3N5, Hf ≦ 0.2 wt%, in shipment.

In the display industry, the film deposition process requires the formation of high-quality thin films. In particular, the uniformity and adhesion of thin films, which influence the display's performance, are crucial. Zirconium (Zr) targets are materials that meet these demands. 【Application Scenarios】 - Sputtering deposition in display manufacturing - Situations requiring high-quality thin film formation 【Benefits of Implementation】 - Improved display performance through high-quality thin film formation - Realization of a stable deposition process

  • Other metal materials

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Zirconium (Zr) target for automotive exhaust gases

Support for exhaust gas purification with zirconium (Zr) targets.

In the automotive industry, with the strengthening of exhaust gas regulations, there is a demand for improved exhaust gas purification performance. In particular, the reduction of harmful substance emissions is essential for reducing environmental impact. Zirconium (Zr) targets contribute to the manufacturing of exhaust gas purification catalysts and achieve high purification performance. Our zirconium (Zr) targets provide high quality and stable performance, supporting the development of our customers' exhaust gas purification technologies. 【Usage Scenarios】 - Manufacturing of exhaust gas purification catalysts - Research and development by automobile manufacturers - Quality improvement for catalyst manufacturers 【Effects of Implementation】 - Improved exhaust gas purification performance - Compliance with environmental regulations - Enhanced product reliability

  • Other metal materials

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Zirconium (Zr) target for energy storage

Zirconium (Zr) target, purity ≧ 3N5, Hf ≦ 0.2 wt%, currently shipping.

In the energy storage industry, there is a demand for the development of high-performance materials, and zirconium (Zr) targets may play a significant role in this. In particular, durability and reliability are crucial, and the quality of the target material affects the efficiency of film formation. Our zirconium (Zr) targets enable high-quality film formation and contribute to the performance enhancement of energy storage devices. 【Application Scenarios】 - High-performance batteries - Hydrogen storage 【Benefits of Implementation】 - Improved device performance through high-quality film formation - Assurance of long-term reliability

  • Other metal materials

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Nickel (Ni) target for medical devices

Nickel (Ni) target pursued for biocompatibility.

In the medical device industry, materials with excellent biocompatibility are required. Particularly for devices that come into direct contact with the human body, such as implants and biosensors, the safety and durability of the materials are crucial. Inappropriate materials can cause allergic reactions and adverse effects on tissues. Our nickel (Ni) targets enable thin film formation with consideration for biocompatibility due to their high purity and density. 【Application Scenarios】 - Implant Coating - Biosensors - Medical Devices 【Benefits of Implementation】 - High biocompatibility - Improved durability - Enhanced functionality through precise thin film formation

  • Other metal materials

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Nickel (Ni) target for electronic components

For the electrodes of electronic components. High purity nickel (Ni) target.

In the electronic components industry, the quality of electrode materials is a crucial factor that influences the performance and reliability of products. If the performance of the electrodes is low, it may lead to product malfunctions or a decrease in lifespan. Our nickel (Ni) targets provide high-purity and dense nickel materials, supporting the formation of high-quality electrodes. 【Application Scenarios】 - Electrodes for electronic components 【Benefits of Implementation】 - Improved product performance through high-quality thin film formation - Ensured high reliability

  • Other metal materials

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Nickel (Ni) target for semiconductor thin films

Nickel (Ni) target purity ≧ 4N5. Contributes to the improvement of thin film formation quality.

In the semiconductor industry, thin films are a crucial factor that influences device performance. The quality of thin films is greatly affected by the purity, density, and uniformity of the target material. Contamination by impurities and density variations can lead to a decline in device performance and a decrease in yield. Our nickel (Ni) targets are of high purity and excellent density, enabling the formation of high-quality thin films. 【Application Scenarios】 - Thin film formation in semiconductor manufacturing - Formation of metal films through sputtering - Formation of NiCr, NiTi, NiCu, and NiCuTi alloy thin films 【Benefits of Implementation】 - Achievement of high-quality thin films - Improvement in device performance - Enhancement of yield

  • Other metal materials

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Nickel (Ni) target for optical coating

Improving the quality of optical coatings with a nickel (Ni) target.

In the optical industry, coating technology requires high film quality and uniformity. Particularly in optical components such as lenses and filters, even slight irregularities or defects in the coating can significantly affect the product's performance. Our nickel (Ni) target achieves high-quality thin film deposition due to its high purity and dense characteristics, contributing to the enhancement of optical product performance. 【Application Scenarios】 - Lens coating - Anti-reflective coatings - Optical filters 【Benefits of Implementation】 - High-density and uniform film quality - Stabilization of optical properties - Improved product durability

  • Other metal materials

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Aerospace Nickel (Ni) Target

For high-temperature applications in the aerospace field. High-purity nickel target.

In the aerospace industry, the durability of components under high-temperature conditions is crucial. In particular, materials with excellent heat resistance and corrosion resistance are required for jet engine and rocket components. Nickel (Ni) targets have been developed to meet these demands. High-purity nickel is essential for the production of heat-resistant alloys and contributes to the performance enhancement of aerospace components through thin film deposition technology. 【Application Scenarios】 - Jet engine components - Rocket components - Sensors used in high-temperature environments 【Effects of Implementation】 - Improved heat resistance and corrosion resistance - Increased lifespan of components - Enhanced reliability

  • Other metal materials

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Tin (Sn) target for semiconductors

Tin (Sn) target purity ≧ 4N

In the semiconductor industry, there is a demand for finer and higher-quality wiring. To enhance the reliability of wiring, the purity and conductivity of materials are crucial. Inappropriate materials or manufacturing processes can lead to wire breakage or performance degradation. Our tin (Sn) target contributes to the high quality of semiconductor wiring due to its high purity and excellent conductivity. 【Application Scenarios】 - Wiring formation in semiconductor manufacturing - Production of ITO thin films 【Benefits of Implementation】 - Improved wiring reliability with high-purity materials - Enhanced performance due to excellent conductivity - Increased yield through uniform film formation

  • Other metal materials

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