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Various targets, ceramics, equipment modification, coating contract services, etc.

Various targets, ceramics, equipment modification, coating contract services, etc.

You will gain price competitiveness. You will gain confidence in quality. We will consult on any matter.

We provide various inexpensive evaporation materials and materials in various shapes. We offer ceramic components at low prices that cannot compete domestically. We accept any shape. We provide inexpensive quartz glass materials in various shapes. We undertake the production of vacuum equipment (including electrical systems) and modifications. We accept sampling and contract processing through vacuum deposition, ion plating, and various types of sputtering. We also undertake sampling, contract processing, and complex machining for all types of plating.

  • Processing Contract
  • Vacuum Equipment

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Target Materials A-Z

Target Materials A-Z

We deliver high-quality and affordable crystals and materials from MTI Corporation in the United States.

We deliver high-quality and affordable crystals and materials from MTI Corporation, a top-class company in the industry. You can purchase from as little as one item. MTI's stock items can be delivered in as little as 1 to 2 weeks. For more details, please visit our website.

  • Secondary Cells/Batteries
  • Other metal materials

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High Purity Hafnium (Hf) Target for Semiconductors

High Purity Hafnium (Hf) Target for Semiconductors

For semiconductor thin film formation. High-quality thin films with high-purity Hf targets.

In the semiconductor industry, the quality of thin films is becoming increasingly important as devices become more high-performance. In particular, when forming thin films using Hf (hafnium) targets, the purity and uniformity of the target material significantly influence the properties of the thin films. Contamination by impurities and variations in crystal grain size can lead to a decrease in the reliability of the thin films. Our high-purity Hf targets support the formation of high-quality thin films. 【Application Scenarios】 - Thin film formation in semiconductor manufacturing - Production of Hf thin films through sputtering - Manufacturing of high-performance devices 【Benefits of Implementation】 - Achievement of high-quality thin films - Improvement in device performance - Enhancement of yield

  • Other metal materials

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Aerospace Hafnium (Hf) Target

Aerospace Hafnium (Hf) Target

High-purity Hf targets to improve heat resistance in the aerospace field.

In the aerospace industry, the durability of materials under high-temperature conditions is crucial. Particularly for rocket and aircraft engine components, heat resistance and stability are required. Hafnium (Hf) targets have been developed to meet these demands. 【Application Scenarios】 - Rocket nozzles - Aircraft engine components - Heat-resistant coatings 【Benefits of Introduction】 - Improved heat resistance - Stability of thin film deposition - Extended product lifespan

  • Other metal materials

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Medical-grade Hafnium (Hf) Target

Medical-grade Hafnium (Hf) Target

Support for improving the quality of contrast agents with high-purity Hf targets.

In the medical industry, the quality of contrast agents is directly linked to diagnostic accuracy and is a crucial factor that affects patient health. To maximize the performance of contrast agents, the selection of high-quality materials is essential. Our hafnium (Hf) targets achieve high purity and uniformity, contributing to quality improvement in the manufacturing process of contrast agents. [Application Scenarios] - Contrast agent manufacturing [Effects of Introduction] - Improvement in the quality of contrast agents - Enhancement of diagnostic accuracy

  • Other metal materials

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High Purity Hafnium (Hf) Target for Chemical Catalysts

High Purity Hafnium (Hf) Target for Chemical Catalysts

Supports the optimization of catalytic reactions with high-purity Hf targets.

In the chemical industry, the purity and uniformity of catalyst materials are crucial for enhancing reaction efficiency. In particular, high-purity Hf targets have the potential to improve the selectivity and activity of catalytic reactions. Our high-purity Hf targets achieve stability and reproducibility in catalytic reactions due to their high purity and uniformity. 【Application Scenarios】 - Research and development of catalyst materials - Manufacturing of high-performance catalysts - Optimization of chemical reaction processes 【Benefits of Implementation】 - Improved catalyst performance - Enhanced reaction efficiency - Stabilization of product quality

  • Other metal materials

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Hafnium (Hf) target for display applications

Hafnium (Hf) target for display applications

Contributing to the improvement of display quality with high-purity Hf targets.

In the display industry, thin film formation technology significantly influences product performance. In particular, high-quality thin film formation using sputtering technology requires high-purity Hf targets. The purity and uniformity of Hf targets greatly impact the display's visual performance and durability. Our products provide high-purity Hf targets, contributing to the quality enhancement of our customers' display products. 【Usage Scenarios】 - Sputtering process in display manufacturing - Thin Film Transistor (TFT) manufacturing - Touch panel manufacturing 【Effects of Implementation】 - Improved display performance through high-quality thin film formation - Enhanced product durability - Improved yield

  • Other metal materials

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Hafnium (Hf) target for measuring instruments

Hafnium (Hf) target for measuring instruments

Support for improving sensor performance with high-purity Hf targets.

In the measurement equipment industry, particularly in the sensor field, high precision measurements and stable performance are required. The performance of sensors is greatly influenced by the quality of the materials used, with the purity and uniformity of the target materials used for thin film formation being especially important. Contamination by impurities and non-uniformity in film thickness can lead to reduced sensitivity and malfunctions in sensors. Our high-purity Hf targets address these challenges and contribute to the improvement of sensor reliability. 【Application Scenarios】 - High-precision sensors - Environmental measurement equipment - Medical sensors 【Benefits of Implementation】 - Improved sensor performance with high-purity materials - Enhanced stability through uniform thin film formation - Elimination of internal defects through UT inspection

  • Other metal materials

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Hafnium (Hf) target for optical lenses

Hafnium (Hf) target for optical lenses

Support for improving the performance of optical lenses with high-purity Hf targets.

In the optical lens industry, high transmittance and durability are required. Particularly for lenses exposed to ultraviolet light and high-temperature environments, the purity and uniformity of the materials are essential for maintaining lens performance. Inappropriate materials or manufacturing processes can lead to degradation of lens performance and a decrease in lifespan. Our high-purity Hf target contributes to the improvement of optical lens performance due to its high purity and uniformity. 【Application Scenarios】 - Optical lens manufacturing - Coating - Sputtering 【Benefits of Implementation】 - Improved lens transmittance - Enhanced lens durability - Increased stability of film formation

  • Other metal materials

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Tungsten (W) target for display applications

Tungsten (W) target for display applications

Tungsten (W) target purity ≧ 5N

In the display industry, thin film formation technology is a crucial factor that influences product performance and quality. In particular, to enhance the display performance, the formation of uniform and high-quality thin films is essential. The use of inappropriate target materials can degrade the quality of the thin films and negatively impact the brightness and contrast of the display. Our tungsten (W) targets enable the formation of high-purity and uniform thin films, contributing to the high performance of displays. 【Application Scenarios】 - Thin film formation in display manufacturing - High-definition displays, organic EL displays, liquid crystal displays - Thin film formation through sputtering 【Benefits of Implementation】 - Improved display performance through high-quality thin film formation - Uniform film thickness and high adhesion - Increased yield and cost reduction

  • Other metal materials

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Aerospace Tungsten (W) Target

Aerospace Tungsten (W) Target

For high-temperature applications in the aerospace field. High-purity tungsten target.

In the aerospace industry, the durability of components under high-temperature conditions is essential. Particularly for heat-resistant components such as rocket engines and aircraft turbine blades, it is crucial to prevent material degradation and maintain performance over extended periods. Improper material selection can lead to component failure or performance deterioration. Our tungsten (W) targets are of high purity and possess excellent heat resistance. The sputtering technology enables uniform film formation, contributing to the manufacturing of heat-resistant components in the aerospace field. 【Application Scenarios】 - Rocket engine nozzles - Coatings for aircraft turbine blades - Heat shields for space exploration vehicles 【Benefits of Implementation】 - Increased lifespan of components in high-temperature environments - Achievement of high heat resistance and durability - Uniform film formation through sputtering

  • Other metal materials

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Tungsten (W) Target for the Energy Industry

Tungsten (W) Target for the Energy Industry

Tungsten (W) target purity ≧ 5N

In the energy industry, especially in applications that require corrosion resistance, the durability of materials is extremely important. Selecting materials that can withstand harsh environments is essential for ensuring the long-term reliability and safety of products. Tungsten (W) targets provide excellent corrosion resistance and contribute to the stable operation of energy-related equipment. 【Application Scenarios】 - Use in corrosive environments - Use in high-temperature environments - Applications requiring high durability 【Benefits of Implementation】 - Prolonged equipment lifespan - Reduced maintenance costs - Stable performance maintenance

  • Other metal materials

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[Tungsten (W) Target for Research Institutions]

[Tungsten (W) Target for Research Institutions]

Improving the reliability of experiments with high-purity tungsten (W) targets.

In experiments conducted at research institutions, obtaining high-precision data is crucial. Particularly in sputtering experiments, the quality of the target material significantly affects the experimental results. Contamination and lack of uniformity can compromise the reliability of the experimental data. Our tungsten (W) targets are of high purity (≧5N), contributing to enhanced reproducibility of experiments. 【Application Scenarios】 - Sputtering experiments - Thin film formation experiments - Material property evaluation 【Benefits of Implementation】 - Acquisition of reliable experimental data with high-purity materials - Improvement of experimental accuracy through uniform film thickness formation - Adaptability to various experiments with W alloy targets

  • Other metal materials

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Tungsten (W) target for electronic components

Tungsten (W) target for electronic components

Tungsten (W) target purity ≧ 5N

In the electronic components industry, the bonding process is a crucial factor that affects product reliability. Particularly for electronic components exposed to high temperatures and vibrations, the quality of the joints significantly influences product lifespan. Poor bonding can lead to decreased performance and early failure of the product. Our tungsten (W) targets achieve high-quality bonding and contribute to the improvement of electronic component reliability. 【Application Scenarios】 - Bonding of semiconductor devices - Bonding of electronic circuit boards - Electrode formation for electronic components 【Benefits of Implementation】 - High-quality bonding with high-purity tungsten - Improved reliability of joints through uniform film formation - Ability to meet diverse bonding needs with W alloy targets

  • Other metal materials

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Tungsten (W) target for precision instruments

Tungsten (W) target for precision instruments

For thin film formation of precision machinery. High purity tungsten (W) target.

In the precision machinery industry, the accuracy of thin film technology is becoming increasingly important due to the demand for higher performance and miniaturization of products. Particularly for precision components that require durability and reliability, the formation of high-quality thin films is essential. Low-quality thin films can lead to decreased product performance and shortened lifespan. Our tungsten (W) targets enable high-quality sputtering deposition, providing optimal materials for thin film formation in precision machinery. 【Application Scenarios】 - Sensors - MEMS devices - Optical components - Electronic components 【Benefits of Implementation】 - High-precision thin film formation - High durability - Uniform film thickness - Compatibility with various materials

  • Other metal materials

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