Custom manufacturing of ozone water generation equipment for semiconductor processes.
Wide adaptability with a concentration of up to 100 ppm and a flow rate of approximately 60 L/min! Responds to a variety of diverse demands.
We manufacture custom-made ozone water generation systems for semiconductor processes. These systems are effective for cleaning applications in the manufacturing processes of semiconductors and FPDs. The ozone water generation system can be customized according to specific applications. It is suitable for cleaning and resist stripping applications and is also ideal for single-wafer cleaning systems. 【Features】 ■ Adopts a swirling flow dissolution method ■ Clean ozone water without metal contamination ■ Responds to a wide range of requirements ■ Customization welcomed *For more details, please refer to the related links or feel free to contact us.
- Company:エコデザイン
- Price:Other