Wide adaptability with a concentration of up to 100 ppm and a flow rate of approximately 60 L/min! Responds to a variety of diverse demands.
We manufacture custom-made ozone water generation systems for semiconductor processes. These systems are effective for cleaning applications in the manufacturing processes of semiconductors and FPDs. The ozone water generation system can be customized according to specific applications. It is suitable for cleaning and resist stripping applications and is also ideal for single-wafer cleaning systems. 【Features】 ■ Adopts a swirling flow dissolution method ■ Clean ozone water without metal contamination ■ Responds to a wide range of requirements ■ Customization welcomed *For more details, please refer to the related links or feel free to contact us.
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basic information
【Other Features】 ■ Detailed response to your company's needs ■ High-precision ozone water concentration control ■ Individual use of generators and mixers available *For more details, please refer to the related links or feel free to contact us.
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Applications/Examples of results
【Applications】 ■ Semiconductor cleaning ■ LCD manufacturing process ■ Solar cell cleaning *For more details, please refer to the related links or feel free to contact us.
Company information
Building a circular industrial structure is the most important challenge for us, who are responsible for the science and technology of the 21st century. Our company is committed to supporting the development of new technologies to address this challenge. In particular, to enhance the technical foundation of ozone utilization technology, which is regarded as a key technology for this purpose, we will supply low-cost and high-performance ozone generators to the field of ozone utilization. We will also accumulate information on ozone utilization technology and support its dissemination and development in terms of information.
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