シエンタ オミクロン List of Products and Services

Virtually unlimited thin film growth techniques. ●Combined UHV SPM / XPS / UPS / MBE system ●Hybrid (PLD) Laser-MBE System (based on a LAB10 MBE System) ●UHV PLD and MULTIPROBE Compact ●Charge & spin transport in graphene layers on 2 inch substrates ●III-V MBE system for film growth on 4 inch wafers ●III-N MBE system for 3 inch substrates with additional in situ VT SPM ●MBE & Catalysis ※For details on each device, please contact us.

○FZ Juelich Cluster -Installed at the HNF (Helmholtz Nanofabrication Facility) Juelich, Germany ○IQC Cluster Tool -Installed at the Institute for Quantum Computing at the University of Waterloo, Canada ○EIT+ Cluster Tool -Installed at the Wroclaw Research Centre EIT+, Wroclaw, Poland ○UTD Cluster Tool -Installed at the University of Texas at Dallas, USA ○FW Dresden Cluster ○Materials Innovation Platform ※For details on each device, please contact us.

Introducing a high-intensity ultraviolet light source (vacuum ultraviolet light source). 【Details】*In English The Scienta VUV5000 is a high intensity, narrow bandwidth extreme UV source. It provides radiation concentrated to He I (21 eV and 23 eV) and He II (41 eV). The flux density per unit wavelength interval is comparable to that obtainable from the best undulator beam lines. The photon flux emitted through a 2 mm aperture is about 500 times higher than that from conventional discharge VUV sources. *For more details, please contact us or download the PDF materials.

Introducing the ARPES analysis analyzer. 【Features】 ● 30° degrees full cone acceptance without sample rotation ● Spin-resolved MDC without sample rotation ● Patented (WO2013/133739) ● Improved ky accuracy (resolution better than 0.1º) ● Time saving (electronic deflection is faster than rotation) ● Matrix element effects are avoided by keeping sample fixed ● Manipulator requirements are reduced ● Ensures same spot for all k// For more details, please contact us or download the PDF materials.

The ARPES-Lab (ARPES photoelectron spectroscopy analysis system) is a device used for XPS observation and measurement. 【Purpose】 XPS observation and measurement using ARPES --- Below is an introduction in English. The ARPES-Lab brings together the world leading instrumentation for ARPES: ●Outstanding performance ARPES system with unchallenged energy and angular resolution ●Intelligent integration and automation ●Revolutionary DA30 deflection mode operation: - Improved ky accuracy - Matrix element effects are avoided by keeping the sample fixed - Ensures the same sample point for all k// *For more details, please contact us or download the PDF materials.

This is a next-generation XPS device that can analyze depths that conventional XPS has not been able to reach until now. It has become possible to use hard X-rays, which were previously only available at synchrotron facilities. High-resolution hard X-ray photoelectron spectroscopy has been achieved using a Ga Kα monochromatic X-ray source with 9.25 keV excitation. 【Applications】 XPS observation and measurement of samples in areas deeper than the surface. --- Below is an introduction in English. HAXPES-Lab is designed to allow hard X-ray photoelectron spectroscopy (HAXPES) measurements in standard lab environments. The instrument offers the unique possibility to investigate bulk properties of various materials, analyze buried interfaces, and access deep core levels. *For more details, please contact us.

The HiPP-Lab refers to an XPS analysis device that enables measurements at atmospheric pressure levels. By using a differential pumping system, it allows for sample measurements in an environment close to atmospheric pressure, making it a next-generation XPS device capable of measurements under environmental control that were previously unattainable. 【Applications】 XPS observation and measurement of samples under environmental control --- Below is an introduction in English. The HiPP-Lab brings together the world leading instrumentation for APPES: ●Outstanding performance APPES system with unchallenged energy, spatial and angular resolution ●Intelligent integration and automation ●State of the art HiPP-3 analyser: - Line mode imaging mode - Angular mode - Swift acceleration mode for increased intensity

LT STM (Low Temperature Scanning Tunneling Microscope) refers to a scanning tunneling microscope operating in a cryogenic environment. It is a device with a proven sales record, capable of STM measurements at temperatures below 5K. 【Applications】 STM observation and measurement in the nano region under low temperature conditions. 【Features】 ● Increased hold time to >65h at the same performance level ● High frequency wiring ● Increased spectroscopy resolution ● Record proven platform since 1996 with more than 200 devices installed ● Reliable design ensuring high up-time ● Independent tip and sample temperature ● Leading QPlus AFM technology

Since the dawn of photoelectron spectroscopy (PES), we have focused on its importance and developed many related devices as a top global brand, introducing them to the market. Additionally, we continue to provide an outstanding range of products, including scanning tunneling microscopes (STM) and atomic force microscopes (AFM) that utilize ultra-high vacuum technology. [Featured Products *Partial List] 1) HAXPES Lab Laboratory-type hard X-ray photoelectron spectroscopy analysis system (Hard X-ray photoelectron spectroscopy, previously only possible at synchrotron facilities, is now available in the lab!) 2) HiPP Lab Environmentally controlled X-ray photoelectron spectroscopy analysis system (XPS analysis device that enables measurements at atmospheric pressure levels) 3) ARPES Device used for XPS observation and measurement 4) MBE Systems Vacuum deposition equipment 5) STM/AFM Scanning tunneling microscope equipped with cooling and heating systems *For more details, please contact us or download the PDF.