オーエヌ総合電機 List of Products and Services

The "wet etching device" is used in semiconductor-related processes, where each wafer is placed in a basket, and etching and resist removal operations are performed using an X-Y-Z robot. Exhaust can be managed in a way that separates generated gases and air as much as possible into chemical and organic solvent categories. Used chemicals (hydrofluoric acid, ferric chloride) and organic solvents (acetone) are discharged collectively into a dedicated tank. It features a draft structure that can be used in clean rooms. 【Features】 - Equipped with an N2 gas sparging system in the chemical and pure water tanks - Achieves high-level cleaning effects and mixing of each liquid through bubbling - All chemical tanks are installed on PVC trays - The acetone tank is equipped with a SUS tray to address liquid drips, overflow, and contamination of drainage with chemicals For more details, please contact us or download the catalog.

The "resist liquid heating and application device" is a machine that sprays a chemical solution at room temperature or heated while rotating workpieces such as silicon wafers and glass substrates used in the semiconductor industry at any desired speed. We propose valuable products that pursue functionality, operability, and safety with our technical know-how and creativity to meet our customers' needs. 【Materials】 ○ Main body: Made of steel plate ○ Application part: Made of PVC For more details, please contact us or download the catalog.