Semiconductor-related equipment "Wet Etching Equipment"

Clean room specifications with draft structure! Equipment for etching processing and resist removal.

The "wet etching device" is used in semiconductor-related processes, where each wafer is placed in a basket, and etching and resist removal operations are performed using an X-Y-Z robot. Exhaust can be managed in a way that separates generated gases and air as much as possible into chemical and organic solvent categories. Used chemicals (hydrofluoric acid, ferric chloride) and organic solvents (acetone) are discharged collectively into a dedicated tank. It features a draft structure that can be used in clean rooms. 【Features】 - Equipped with an N2 gas sparging system in the chemical and pure water tanks - Achieves high-level cleaning effects and mixing of each liquid through bubbling - All chemical tanks are installed on PVC trays - The acetone tank is equipped with a SUS tray to address liquid drips, overflow, and contamination of drainage with chemicals For more details, please contact us or download the catalog.

Etching Equipment