NGKフィルテック Product Lineup

Regular precision cleaning involves washing with ultra-pure water that contains almost no ionic components, which can lead to product defects due to electrostatic interference, such as: - Circuit destruction (i.e., electrostatic destruction) - Surface charging of the cleaned items and re-adhesion of fine particles ⇒ MEGCON suppresses the generation of static electricity by dissolving carbon dioxide in ultra-pure water through a membrane, creating functional water with adjusted resistivity. Based on approximately 7,000 sales records, it contributes to reducing your company's product defects (improving yield). ■ Features Automatic and abundant control methods - Automatic batch resistance control during flow rate fluctuations allows connection to multiple die and cleaning machines. - Three types of control methods can be selected based on distance. Efficient gas supply - Gas consumption is minimized through gas quantity control according to flow rate. (Under conditions of 0.5 MΩ·cm, 9 L/min, gas consumption is 1.62 grams/hour.) - Capable of gas supply using a central system. - Gas dissolution through membrane methods minimizes the risk of fine particle contamination. Extensive lineup - Offers large flow types (up to 8,000 L/h) and small flow types (from 30 L/h). - Includes CE-marked series that can be exported to Europe.

• Other semiconductor manufacturing equipment

Standard precision cleaning is performed using ultra-pure water with almost no ionic components, which can lead to product defects due to static electricity, such as: - Circuit destruction (static breakdown) - Surface charging of the cleaned objects and re-adhesion of fine particles ⇒ MEGCON suppresses static electricity generation by dissolving carbon dioxide in ultra-pure water through a membrane, creating functional water with adjusted resistivity. Based on approximately 7,000 sales records, it contributes to reducing your company's product defects (improving yield). ■ Features Automatic and abundant control methods - Automatic batch resistance control during flow rate fluctuations allows connection to multiple die and cleaning machines. - Three types of control methods can be selected based on distance. Efficient gas supply - Gas consumption is minimized with gas quantity control according to flow rate. (Under conditions of 0.5 MΩ·cm and 9 L/min, gas consumption is 1.62 grams/hour.) - Capable of gas supply in a central system - Gas dissolution through a membrane minimizes the risk of fine particle contamination Rich lineup - Available in large flow type (up to 8,000 L/h) and small flow type (from 30 L/h) - CE marking series available for export to Europe

• Other semiconductor manufacturing equipment

"Sephirot(R)" is a ceramic membrane filter that uses fine ceramics with excellent corrosion resistance and heat resistance, making it stable for use in areas and applications where organic membranes cannot be applied. It has received high acclaim across a wide range of fields, from wastewater treatment of ingot processing to active pharmaceutical ingredient processes such as enzymes and antibiotics, as well as in the processing of beverages and foods like mineral water and soy sauce. 【Features】 ■ High corrosion resistance ■ High heat resistance ■ High strength ■ High separation precision ■ Low elution *For more details, please download the PDF or feel free to contact us.

• Fine Ceramics