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  4. Semiconductor Manufacturing Equipment
  5. Other semiconductor manufacturing equipment
  6. Ultra-pure water anti-static device MEGCON PRC2+ Rack type

Ultra-pure water anti-static device MEGCON PRC2+ Rack type

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last updated:Aug 29, 2025

NGKフィルテック
NGKフィルテック
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Automatically control the specific resistance of ultrapure water to solve static electricity issues in precision cleaning.

Regular precision cleaning involves washing with ultra-pure water that contains almost no ionic components, which can lead to product defects due to electrostatic interference, such as: - Circuit destruction (i.e., electrostatic destruction) - Surface charging of the cleaned items and re-adhesion of fine particles ⇒ MEGCON suppresses the generation of static electricity by dissolving carbon dioxide in ultra-pure water through a membrane, creating functional water with adjusted resistivity. Based on approximately 7,000 sales records, it contributes to reducing your company's product defects (improving yield). ■ Features Automatic and abundant control methods - Automatic batch resistance control during flow rate fluctuations allows connection to multiple die and cleaning machines. - Three types of control methods can be selected based on distance. Efficient gas supply - Gas consumption is minimized through gas quantity control according to flow rate. (Under conditions of 0.5 MΩ·cm, 9 L/min, gas consumption is 1.62 grams/hour.) - Capable of gas supply using a central system. - Gas dissolution through membrane methods minimizes the risk of fine particle contamination. Extensive lineup - Offers large flow types (up to 8,000 L/h) and small flow types (from 30 L/h). - Includes CE-marked series that can be exported to Europe.

    Other semiconductor manufacturing equipment
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Ultra-pure water anti-static device MEGCON PRC2+ Rack type

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basic information

■Liquid Contact Part Cell (Carbon Dioxide Introduction Part): PP ■Utility - Ultra-pure Water Pressure: Normal use 0.35 MPa or below (maximum 0.45 MPa) / Temperature: 5–35°C / Water Quality: 10 MΩ·cm or higher *The structure that does not allow pure water to pass through the hollow fiber membrane minimizes the pressure loss of ultra-pure water entering and exiting the device. - CO2 Gas Pressure: 0.1–0.2 MPa / Temperature: 5–35°C / Purity: 99.5% or higher - Power Supply AC 100-240V (50/60Hz) ■Dry Air (for Membrane Drying) - PRC Series: Built-in air pump, so not required - FRC Series: 0.1–0.2 MPa ■Standard Accessories - Instruction Manual - Inspection Certificate - 100-120V: Power Cord 2.8m (with plug) - 200-240V: No cord (please connect to terminal block) ■Options Many selections available besides the following: - PFA Piping - SECS I/F - External Air Supply

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Applications/Examples of results

■Usage - Cleaning in the dicing process - High-pressure jet cleaning - Scrubber cleaning - Cleaning of LCD panels - Cleaning of photomasks and reticles, etc.

Detailed information

  • 構造.jpg

    Cell structure

  • 制御NGK

    Three types of control methods

Line up(4)

Model number overview
1000AD Maximum flow rate: 1000L, control range: 0.2~2.0 MΩ·cm, dimensions: 480W × 355D × 200H mm, weight: 15kg, piping: PVC/blade hose, ultrapure water connection diameter: hose nozzle (ID φ19 for blade hose)
1200AD Maximum flow rate: 1000L, control range: 0.1~0.5 MΩ·cm, dimensions: 480W × 355D × 200H mm, weight: 15kg, piping: PVC/blade hose, ultrapure water connection diameter: hose nozzle (ID φ19 for blade hose)
2000AD Maximum flow rate: 2000L, control range: 0.2~2.0MΩ·cm, dimensions: 480W×355D×200H mm, weight: 15kg, piping: PVC/blade hose, ultrapure water connection diameter: nozzle for hose (IDφ19 for blade hose)
1220AD Maximum flow rate: 2000L, control range: 0.15~1.0MΩ·cm, dimensions: 480W×355D×200H mm, weight: 15kg, piping: PVC/blade hose, ultrapure water connection diameter: hose nozzle (IDφ19 for blade hose)

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NGKフィルテック

NGKフィルテック

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Our company designs and manufactures pharmaceutical water systems, ultrapure water production systems, membrane process systems, and their application equipment based on the advanced membrane technology we have cultivated over many years. We respond to user needs such as product development, quality enhancement, rationalization, energy conservation, resource saving, and environmental protection. Please feel free to contact us with your requests.

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