List of Other semiconductor manufacturing equipment products
- classification：Other semiconductor manufacturing equipment
1～45 item / All 2030 items
We provide comprehensive support from design to manufacturing and maintenance!
- Contract manufacturing
It won't break even after 1 million repetitions! A mat switch with reliable operation, high durability, and low price. Suitable for options in machine tools as well. Please consult us about delivery t...
- Sensors
[Patent Obtained] Instant complete water removal of workpieces with air blow = complete drying!
- Other semiconductor manufacturing equipment
Revolutionary! No need for water washing! Particles are removed with just air blow.
- Other semiconductor manufacturing equipment
Are you making this mistake when draining water from your work?
- Other semiconductor manufacturing equipment
[Patent Obtained] Complete water removal in an instant with air blow = complete drying!
- Other semiconductor manufacturing equipment
If you see this, you'll understand everything! I created a PR flyer.
100% water removal with air blow! No water droplets left on the workpiece! We have summarized everything about the patented complete drying air nozzle, "Air Screw Nozzle," on a single A4 flyer. "What kind of nozzle is it?" "Can it really remove 100% of the water?" "Why is it so effective at removing water?" Just by looking at this, you can quickly understand everything about the Air Screw Nozzle. Please download it and take a look!
Are you making this mistake with the work's drainage?
- Other semiconductor manufacturing equipment
Are you making this mistake while draining water from the work?
[To those in charge who are struggling with workpiece water drainage] Are you making these mistakes with workpiece water drainage? ✓ Do you know the real reason why, even if you increase the air blow pressure, not all water droplets are blown away? ✓ Do you know the real reason why, even if you increase the number of air nozzles, water is not sufficiently drained? ✓ Do you know the real reason why, even if you change the shape of the air nozzle, it still does not drain water effectively? These mistakes are typical errors made by companies that use air blow for workpiece water drainage and droplet removal. However, these mistakes are not significant compared to a certain "fatal mistake." What is that "fatal mistake"? It is… We provide this information in a PDF file. Download it now to find out.
No more revolution! No need for washing; particles are removed with just air blowing.
- Other semiconductor manufacturing equipment
Just by looking at this, you'll understand everything! We created a PR flyer (dust removal version).
Thoroughly remove dust from workpieces with air blow! We have summarized everything about the patented complete dust removal air nozzle, "Air Screw Nozzle," on a single A4 flyer. "What kind of nozzle is it?" "Why can it remove dust so effectively?" "How can it remove dust even from complex-shaped workpieces?" Just by looking at this, you can quickly understand everything about the Air Screw Nozzle. Please download and take a look.
We are a manufacturer specializing in filter housings.
- Other semiconductor manufacturing equipment
- Other filters
- Filtration Equipment
It is a manufacturer specializing in filter housings.
- Other semiconductor manufacturing equipment
- Other filters
- Filtration Equipment
We are a manufacturer specializing in filter housings.
- Other semiconductor manufacturing equipment
- Other filters
- Filtration Equipment
We are a manufacturer specializing in filter housings.
- Other semiconductor manufacturing equipment
We are a manufacturer specializing in filter housings.
- Other semiconductor manufacturing equipment
- Other filters
- Filtration Equipment
It is a manufacturer specializing in filter housings.
- Other semiconductor manufacturing equipment
- Beverage Production Equipment
- Filtration Equipment
Options to prevent stoppage in the subsequent processes that cannot be halted.
- Other semiconductor manufacturing equipment
Are you having trouble with the delivery time for cast prototypes? "Casting prototype service!" for cast iron, aluminum castings, and stainless steel castings (lost wax casting)!
- Other semiconductor manufacturing equipment
Ideal for precise application of high-viscosity thermal conductive gel materials!
- Other semiconductor manufacturing equipment
- dispenser
CVD, PVD (evaporation, sputtering, etc.) high vacuum, ultra-high temperature plate heater for wafer and small chip heating with excellent uniformity and reproducibility.
- Other semiconductor manufacturing equipment
- Annealing furnace
- CVD Equipment
☆★☆【nanoETCH】Soft Etching Device☆★☆
<30W Low Power Control for Damage-Free Etching Achieves delicate etching processes with an output control precision of 10mW. A jointly developed product with the graphene research group at the University of Manchester, led by Nobel Prize winners who discovered graphene in 2010. 【Features】 • 2D (Transition Metal Chalcogenides, graphene delamination after material transfer): Surface modification cleaning • Removal of polymer resists such as PMMA and PPA • Surface modification and etching on substrates prone to damage, such as Teflon substrates • h-BN sidewall etching (*Option for "Fluorine Gas Supply Module," requires SF6 gas system) • SiO2 etching (*Option for "Fluorine Gas Supply Module," requires CHF3 gas system) 【Specifications】 ◉ Compatible substrates: Up to Φ6 inches ◉ Easy operation with a 7" touch panel and PLC automatic sequencing ◉ Automatic pressure control (APC) ◉ One Ar gas line (standard) + up to three additional lines for N2 and O2 ◉ Connects to a Windows PC with a USB port for automatic etching recipe creation and storage. Data logging on PC.
High-performance, cost-effective RF/DC magnetron sputtering system for research and development.
- Sputtering Equipment
- Evaporation Equipment
- Other semiconductor manufacturing equipment
☆★☆【nanoETCH】Soft Etching Device☆★☆
<30W Low Power Control for Damage-Free Etching Achieves delicate etching processes with an output control precision of 10mW. A jointly developed product with the graphene research group at the University of Manchester, led by Nobel Prize winners who discovered graphene in 2010. 【Features】 • 2D (Transition Metal Chalcogenides, graphene delamination after material transfer): Surface modification cleaning • Removal of polymer resists such as PMMA and PPA • Surface modification and etching on substrates prone to damage, such as Teflon substrates • h-BN sidewall etching (*Option for "Fluorine Gas Supply Module," requires SF6 gas system) • SiO2 etching (*Option for "Fluorine Gas Supply Module," requires CHF3 gas system) 【Specifications】 ◉ Compatible substrates: Up to Φ6 inches ◉ Easy operation with a 7" touch panel and PLC automatic sequencing ◉ Automatic pressure control (APC) ◉ One Ar gas line (standard) + up to three additional lines for N2 and O2 ◉ Connects to a Windows PC with a USB port for automatic etching recipe creation and storage. Data logging on PC.
Seventeen years since the publication of the '21st Century Edition Handbook on Film Fabrication Applications,' we are releasing a new edition that solidifies the fundamentals while enhancing new appli...
- Technical and Reference Books
- Other surface treatment equipment
- Other semiconductor manufacturing equipment
Next-generation megasonic technology can instantly clear wafers up to 300mm.
- Photomask
- Other semiconductor manufacturing equipment
- Ultrasonic Cleaner
The NHK program "The Wall of Truth" will feature a video of semiconductor wafer cleaning provided by our company.
We are pleased to announce that a video provided by Tick Corporation showcasing semiconductor wafer cleaning will be featured in the NHK program "The Wall of Truth." The theme for this episode is "The Truth of Water (tentative)." The program is scheduled to briefly introduce the process of cleaning wafers with pure water during semiconductor manufacturing. Our company offers cleaning and spraying technologies, including megasonic cleaning, for the semiconductor and electronic components sectors. We are truly honored that our footage will be utilized in the production of this NHK program. Broadcast schedule: September 12, 2026 (Saturday) from 8:30 PM to 8:59 PM (tentative). For more details about the program, please visit the official NHK "The Wall of Truth" page. https://www.nhk.jp/g/ts/N8JX1V6V69/ *Please note that the broadcast date and content may be subject to change.
The Digital Generator is a digital control generator compatible with megasonic cleaning systems for semiconductors, electronic components, and precision instruments.
- Photomask
- Other semiconductor manufacturing equipment
- Wafer
The NHK program "The Wall of Truth" will feature a video of semiconductor wafer cleaning provided by our company.
We are pleased to announce that a video provided by Tick Corporation showcasing semiconductor wafer cleaning will be featured in the NHK program "The Wall of Truth." The theme for this episode is "The Truth of Water (tentative)." The program is scheduled to briefly introduce the process of cleaning wafers with pure water during semiconductor manufacturing. Our company offers cleaning and spraying technologies, including megasonic cleaning, for the semiconductor and electronic components sectors. We are truly honored that our footage will be utilized in the production of this NHK program. Broadcast schedule: September 12, 2026 (Saturday) from 8:30 PM to 8:59 PM (tentative). For more details about the program, please visit the official NHK "The Wall of Truth" page. https://www.nhk.jp/g/ts/N8JX1V6V69/ *Please note that the broadcast date and content may be subject to change.
Total solution provided from equipment development stage to line operation! Operates stably in a light noise environment.
- Other semiconductor manufacturing equipment
I will explain in detail the differences between Teflon and fluoropolymer, which are often confused.
- Other semiconductor manufacturing equipment
[Presentation of Materials] We will introduce the differences in features between Teflon fluoropolymer "PTFE" and "PFA" resins and coatings.
- Other semiconductor manufacturing equipment
I will explain the differences between fluororesin and Teflon.
- Other semiconductor manufacturing equipment
Control metal ion contamination at the ppb level. Protect high-purity processes with fluororesin.
- Other semiconductor manufacturing equipment
Eliminate particle and ESD defects caused by static electricity. Unique coating that achieves both static prevention and non-stick properties.
- others
- Other semiconductor manufacturing equipment
From preventing scratches and chips on the transport handle to measures against corrosion of the structure. Coatings that enhance the reliability of wafer transport.
- Other semiconductor manufacturing equipment
Corrosion prevention, prevention of metal ion leaching, and prevention of wafer scratches. Summarizing and solving the challenges of cleaning equipment.
- Other semiconductor manufacturing equipment
Easily removes contaminants with low surface energy. A coating that significantly improves maintainability.
- Other semiconductor manufacturing equipment
Resistant to strong acids, strong alkalis, and organic solvents. A chemical-resistant coating compatible with all processes in semiconductor manufacturing.
- Other semiconductor manufacturing equipment
Prevent damage, adhesion, and metal powder generation on wafers, and maintain a clean environment in the inspection process.
- Other semiconductor manufacturing equipment
Chemical stability that withstands various chemical environments. An optimal fluororesin coating for corrosion prevention in semiconductor manufacturing equipment.
- Other semiconductor manufacturing equipment
Combining excellent electrical insulation and static prevention functions. A coating that prevents static electricity troubles in semiconductor manufacturing.
- Other semiconductor manufacturing equipment
Suppresses metal ion leaching to an extremely low level. Suitable for semiconductor manufacturing processes that require high purity.
- Other semiconductor manufacturing equipment
From transportation, cleaning, etching, CMP, plating, to inspection. Coating that supports a wide range of processes in semiconductor manufacturing.
- Other semiconductor manufacturing equipment
Leave the precise resin cutting and processing of automotive interior parts to us.
- Other semiconductor manufacturing equipment
- Processing Contract
Precision machining that meets the needs for lightweight structural materials in the aerospace field.
- Other semiconductor manufacturing equipment
- Processing Contract
Leave the palm-sized machining of lens substrates for optical devices to us.
- Other semiconductor manufacturing equipment
- Processing Contract