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The "Beneq TFS 500" is suitable for various applications in thin film deposition and is an ideal tool for multi-project environments. Equipped with a manual load lock, it enhances wafer processing capabilities. Different types of reaction chambers can be installed inside the vacuum chamber, allowing each reaction chamber to be optimized according to the customer's needs. Additionally, it can meet both the stringent requirements for industrial reliability and the need for flexibility in R&D operations. The process components ensure the availability of spare parts. 【Products and Services Offered】 ■ 3D and batch production ■ Research equipment ■ Coating services ■ Research and development services *For more details, please download the PDF or feel free to contact us.
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Free membership registrationThe "Beneq TFS 200" is a highly flexible ALD research platform suitable for academic research and corporate R&D. It is specially designed to minimize cross-contamination that can occur in multi-user research environments. Additionally, it provides technological solutions that enable high-quality film deposition on wafers, flat objects, particles, porous bulk materials, and complex three-dimensional objects characterized by very high aspect ratios. 【Products Offered (Partial)】 ■ 3D and batch production ■ Research equipment ■ Semiconductor devices ■ Spatial ALD devices *For more details, please download the PDF or feel free to contact us.
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