Electronic Components and Semiconductors

SPUTTERCORE CO.,LTD.

Establishment25/Dec/2025
capital1000Ten thousand
addressOsaka/Yodogawa-ku, Osaka-shi/Room 707, 2nd Shin-Osaka Building, 6-3-32 Nishi-Nakajima
phone06-6732-9818
last updated：

SPUTTERCORE CO.,LTD. List of Products and Services

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ITO (90:10; 95:5; 97:3...)Low-density ITO Target

Oxides that can be used as transparent electrodes and to control pixels without compromising the visual information of the screen!

■ Each Ratios (90:10; 95:5; 97:3) ■ Manufacturing method: Powder metallurgy *For more details, please download the PDF or feel free to contact us.

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SiO2 (quartz) ring

SiO2 (quartz) ring

■ Used for etching machine ■ Frosted finish ■ No Black spots on the surface

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Aluminum oxide (Al2O3) target

For the manufacturing of insulating films in chip production, as well as the production of other high-performance electronic components, sensors, solar panels, and surface modification of optical devices such as displays!

■ Purity > 99.9% ■ Density (3.95 g/cm³) ■ Manufacturing method: Powder metallurgy *For more details, please download the PDF or feel free to contact us.

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Titanium dioxide (TiO2) target

Titanium oxide used in semiconductor manufacturing processes, recording media such as HDDs, and thin film formation for flat panel displays!

■ Purity > 99.9% ■ Density (4.49 g/cm³) ■ Manufacturing Method: HIP *For more details, please download the PDF or feel free to contact us.*

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V2O5 Vapor deposition materials, thin film electronic materials, Universities and research institutes develop materials

Vanadium oxide materials available for use in the RF sputtering process essential for the manufacturing of microelectronics components!

■ Purity > 99.9% ■ Density (4.26 g/cm³) ■ HP Process *For more details, please download the PDF or feel free to contact us.*

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Niobium oxide (Nb2O5) target

Niobium oxide (Nb2O5) target

For more details, please download the PDF or feel free to contact us.

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