Chemical

Hayashi Pure Chemical Ind., Ltd. Electronic Materials

capital10000Ten thousand
number of employees259
addressOsaka/Chuo-ku, Osaka-shi/3-2-12 Nairincho
phone06-6910-7336
last updated：
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Hayashi Pure Chemical Ind., Ltd. List of Products and Services

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Etching solutions for various metals Etching solutions for various metals
Developer / Stripping solution Developer / Stripping solution
Texture etching solution Texture etching solution
Roughening etching solution Roughening etching solution
Contract processing Contract processing
Low metal (UHP) grade chemicals Low metal (UHP) grade chemicals
Roughening

Roughening etching solution

This is an introduction to the product of rough surface etching solution.

Ni Etching Solution "Pure Etch NE series"

It etches the Ni film well.

The features of this product are as follows: - There is little side etching, allowing for the formation of fine patterns. - The etching speed and the in-plane uniformity of the etching shape are excellent. Keywords: Wet etching, nickel For roughening etching solution that processes the surface shape of Ni into a rough texture, please refer to the "Ni Roughening Etching Solution" page.

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AlGaInP roughening etching solution

The surface of the AlGaInP film can be effectively roughened through etching, which improves the light extraction efficiency.

The features of this product are as follows: - It is possible to form desired unevenness and improve light extraction efficiency. - Processing can be done at low temperatures and in a short time. - The in-plane uniformity of the uneven shape is good. Keywords: frost treatment, unevenness, LED, light-emitting diode, aluminum indium gallium phosphide.

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GaP roughening etching solution

The surface of the GaP film and the surfaces, slopes, and sides of the GaP substrate can be effectively roughened through etching, improving the light extraction efficiency.

The features of this product are as follows: - It is possible to form desired unevenness and improve light extraction efficiency. - Processing can be done at low temperatures and in a short time. - The in-plane uniformity of the uneven surface shape is good. Keywords: frost treatment, unevenness, LED, light-emitting diode, gallium phosphide, gallium nitride.

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AlGaAs/GaAs roughening etching solution

The surfaces of AlGaAs films, GaAs films, and GaAs substrates can be effectively roughened through etching, improving light extraction efficiency.

The features of this product are as follows: - It is possible to form desired unevenness and improve light extraction efficiency. - Processing can be done at low temperatures and in a short time. - The in-plane uniformity of the uneven surface shape is good. Keywords: frost treatment, unevenness, LED, light-emitting diode, aluminum gallium arsenide, gallium arsenide.

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SUS Roughening Etching Solution "PureEtch MF series"

The surface of SUS material is effectively roughened by etching without using any special techniques.

The features of this product are as follows: - It forms desired unevenness on the surface of various SUS materials. - The in-plane uniformity of the uneven surface shape is excellent. Keywords: chemical roughening, unevenness, stainless steel

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InP roughening etching solution

The surface of the InP film can be effectively roughened through etching, which can improve the light extraction efficiency.

The features of this product are as follows: - It is possible to form desired unevenness and improve light extraction efficiency. - Processing can be done at low temperatures and in a short time. - The in-plane uniformity of the uneven surface shape is excellent. Keywords: frost treatment, unevenness, LED, light-emitting diode, indium phosphide.

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