CVD Equipment - Company Ranking(21 companies in total)
Last Updated: Aggregation Period:Sep 24, 2025〜Oct 21, 2025
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Company Name | Featured Products | ||
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Product Image, Product Name, Price Range | overview | Application/Performance example | |
The PD-270STP is a low-temperature, high-speed plasma CVD device for forming silicon oxide films (SiO2) using liquid source TEOS. The high s... | ● Manufacturing of optical components such as optical waveguides ● Mask formation for micromachines ● Formation of protective films for pl... | ||
For more details, please refer to the PDF document or feel free to contact us. | For more details, please refer to the PDF document or feel free to contact us. | ||
For more details, please refer to the PDF document or feel free to contact us. | For more details, please refer to the PDF document or feel free to contact us. | ||
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- Featured Products
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Plasma CVD equipment for thick film formation of SiO2
- overview
- The PD-270STP is a low-temperature, high-speed plasma CVD device for forming silicon oxide films (SiO2) using liquid source TEOS. The high s...
- Application/Performance example
- ● Manufacturing of optical components such as optical waveguides ● Mask formation for micromachines ● Formation of protective films for pl...
[Data] Silicon processing data using the non-bosch process
- overview
- For more details, please refer to the PDF document or feel free to contact us.
- Application/Performance example
- For more details, please refer to the PDF document or feel free to contact us.
[Data] - Example of ICP Etching Process for MicroLEDs
- overview
- For more details, please refer to the PDF document or feel free to contact us.
- Application/Performance example
- For more details, please refer to the PDF document or feel free to contact us.
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