Gas Monitor - 企業ランキング(全11社)
更新日： 集計期間:Jul 16, 2025〜Aug 12, 2025
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| 会社名 | 代表製品 | ||
|---|---|---|---|
| 製品画像・製品名・価格帯 | 概要 | 用途/実績例 | |
| 【Features】 ○ Optimal for sputtering devices → Ideal for process monitoring of various sputtering devices ○ No differential pumping system required → No differential pumping system needed for process monitoring (measurable below 1 Pa, space-saving) ○ Integrated display design → Can measure without a PC ○ Easy operation → One Click function (simple for anyone, no complex operations required) ○ Baking compatible → High-temperature baking up to 120°C possible when connecting the sensor unit (separated sensor unit state: 250°C) ○ Equipped with degassing function → Adoption of electronic impact desorption method ○ Enhanced preventive maintenance features → Preventive maintenance for ion sources and secondary electron multipliers Traceability function for analysis tubes (Patent No. 5016031) ○ Enhanced leak test functions → Capable of helium leak tests, air leak tests, and build-up tests ○ Total pressure measurement → Total pressure measurement possible (ionization vacuum gauge function) ○ Compatible with Qulee QCS → Software standard equipped (compatible with Windows XP/7) ○ Compliance standards → CE standard compliant ● For more details, please contact us or download the catalog. | 【Applications】 ○ Process monitoring for various manufacturing equipment such as solar cells, FPDs, and semiconductors (sputtering equipment) ○ Residual gas analysis of sputtering equipment ○ Management of residual moisture in roll-to-roll sputtering equipment ○ Management of impurities (H2O) in sputtering equipment ○ Leak testing for various vacuum devices ● For more details, please contact us or download the catalog. | ||
| 【Features】 ○ Excellent cost performance → Ideal for RGA applications ○ Integrated display design → Measurement possible without a PC ○ Easy operation → One Click function (simple for anyone, no complex operations required) ○ Baking support → High-temperature baking up to 120℃ possible when connected to the sensor unit (Separated sensor unit state: 250℃) ○ Degassing function included → Adoption of electronic shock desorption method ○ Enhanced preventive maintenance features → Preventive maintenance for ion source and secondary electron multiplier Traceability function for analysis tube included (Patent No. 5016031) ○ Enhanced leak test features → Helium leak test, air leak test, and build-up test possible ○ Total pressure measurement → Total pressure measurement possible (ionization vacuum gauge function) ○ Compatible with Qulee QCS → Software standard included (compatible with Windows XP/7) ○ Option for QIP (Quick Install Package system) available → Automatic measurement start/stop/data saving function ○ Compliance standards → CE standard compliant ● For more details, please contact us or download the catalog. | 【Applications】 ○ Residual gas analysis of various manufacturing equipment such as solar cells, FPDs, and semiconductors ○ Residual gas analysis of film deposition equipment such as PVD systems and vacuum deposition systems ○ Residual gas analysis of roll-to-roll deposition equipment ○ Residual gas analysis of organic EL equipment ○ Residual gas analysis of high vacuum exhaust systems ○ Residual gas analysis of freeze-drying equipment ○ Various gas analyses for research and development ● For more details, please contact us or download the catalog. | ||
| **Features** - Ideal for various research and development applications → Achieves the highest sensitivity as a high-end feature: 2.5×10^-6 A/Pa - Integrated display design → Measurement possible without a PC - Easy operation → One Click function (simple for anyone, no complex operations required) - Baking compatible → High-temperature baking up to 250°C possible when the sensor unit is connected (300°C when the sensor unit is separated) - Equipped with degassing function → Adoption of electronic impact desorption method - Maintenance → Easy replacement of filament, ion source, and secondary electron multiplier - Enhanced preventive maintenance features → Preventive maintenance for ion source and secondary electron multiplier → Traceability function for analysis tube (patent pending) - Enhanced leak test functions → Capable of helium leak tests, air leak tests, and build-up tests - Total pressure measurement → Total pressure measurement possible (ionization vacuum gauge function) - Compatible with Qulee QCS → Software standard equipped (compatible with Windows XP/7) - Compliance standards → CE standard compliant ● For more details, please contact us or download the catalog. | 【Applications】 ○ Various research and development such as temperature rise desorption gas analysis ○ Residual gas analysis for ultra-high and extreme high vacuum pumping systems ○ Measurement of trace impurities in gases ○ Research and development related to solar cells ○ Organic analysis ○ Environmental measurement ● For more details, please contact us or download the catalog. | ||
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アルバック／ULVAC, Inc.
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- 代表製品
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Compact Process Gas Monitor Qulee CGM Series
- 概要
- 【Features】 ○ Optimal for sputtering devices → Ideal for process monitoring of various sputtering devices ○ No differential pumping system required → No differential pumping system needed for process monitoring (measurable below 1 Pa, space-saving) ○ Integrated display design → Can measure without a PC ○ Easy operation → One Click function (simple for anyone, no complex operations required) ○ Baking compatible → High-temperature baking up to 120°C possible when connecting the sensor unit (separated sensor unit state: 250°C) ○ Equipped with degassing function → Adoption of electronic impact desorption method ○ Enhanced preventive maintenance features → Preventive maintenance for ion sources and secondary electron multipliers Traceability function for analysis tubes (Patent No. 5016031) ○ Enhanced leak test functions → Capable of helium leak tests, air leak tests, and build-up tests ○ Total pressure measurement → Total pressure measurement possible (ionization vacuum gauge function) ○ Compatible with Qulee QCS → Software standard equipped (compatible with Windows XP/7) ○ Compliance standards → CE standard compliant ● For more details, please contact us or download the catalog.
- 用途/実績例
- 【Applications】 ○ Process monitoring for various manufacturing equipment such as solar cells, FPDs, and semiconductors (sputtering equipment) ○ Residual gas analysis of sputtering equipment ○ Management of residual moisture in roll-to-roll sputtering equipment ○ Management of impurities (H2O) in sputtering equipment ○ Leak testing for various vacuum devices ● For more details, please contact us or download the catalog.
Basic Process Gas Monitor Qulee BGM Series
- 概要
- 【Features】 ○ Excellent cost performance → Ideal for RGA applications ○ Integrated display design → Measurement possible without a PC ○ Easy operation → One Click function (simple for anyone, no complex operations required) ○ Baking support → High-temperature baking up to 120℃ possible when connected to the sensor unit (Separated sensor unit state: 250℃) ○ Degassing function included → Adoption of electronic shock desorption method ○ Enhanced preventive maintenance features → Preventive maintenance for ion source and secondary electron multiplier Traceability function for analysis tube included (Patent No. 5016031) ○ Enhanced leak test features → Helium leak test, air leak test, and build-up test possible ○ Total pressure measurement → Total pressure measurement possible (ionization vacuum gauge function) ○ Compatible with Qulee QCS → Software standard included (compatible with Windows XP/7) ○ Option for QIP (Quick Install Package system) available → Automatic measurement start/stop/data saving function ○ Compliance standards → CE standard compliant ● For more details, please contact us or download the catalog.
- 用途/実績例
- 【Applications】 ○ Residual gas analysis of various manufacturing equipment such as solar cells, FPDs, and semiconductors ○ Residual gas analysis of film deposition equipment such as PVD systems and vacuum deposition systems ○ Residual gas analysis of roll-to-roll deposition equipment ○ Residual gas analysis of organic EL equipment ○ Residual gas analysis of high vacuum exhaust systems ○ Residual gas analysis of freeze-drying equipment ○ Various gas analyses for research and development ● For more details, please contact us or download the catalog.
High Performance Process Gas Monitor Qulee HGM Series
- 概要
- **Features** - Ideal for various research and development applications → Achieves the highest sensitivity as a high-end feature: 2.5×10^-6 A/Pa - Integrated display design → Measurement possible without a PC - Easy operation → One Click function (simple for anyone, no complex operations required) - Baking compatible → High-temperature baking up to 250°C possible when the sensor unit is connected (300°C when the sensor unit is separated) - Equipped with degassing function → Adoption of electronic impact desorption method - Maintenance → Easy replacement of filament, ion source, and secondary electron multiplier - Enhanced preventive maintenance features → Preventive maintenance for ion source and secondary electron multiplier → Traceability function for analysis tube (patent pending) - Enhanced leak test functions → Capable of helium leak tests, air leak tests, and build-up tests - Total pressure measurement → Total pressure measurement possible (ionization vacuum gauge function) - Compatible with Qulee QCS → Software standard equipped (compatible with Windows XP/7) - Compliance standards → CE standard compliant ● For more details, please contact us or download the catalog.
- 用途/実績例
- 【Applications】 ○ Various research and development such as temperature rise desorption gas analysis ○ Residual gas analysis for ultra-high and extreme high vacuum pumping systems ○ Measurement of trace impurities in gases ○ Research and development related to solar cells ○ Organic analysis ○ Environmental measurement ● For more details, please contact us or download the catalog.
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アルバック／ULVAC, Inc.
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