Open Clean System - 企業ランキング(全4社)
更新日： 集計期間:Jul 16, 2025〜Aug 12, 2025
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企業情報を表示
| 会社名 | 代表製品 | ||
|---|---|---|---|
| 製品画像・製品名・価格帯 | 概要 | 用途/実績例 | |
Open Clean System KOACH
Other |
Table Coach: Clean space within 700mm (distance between opening surfaces), with an airflow velocity of approximately 0.4 m/s. Stand Coach: Clean space within 2300mm (when a table is present), 1800mm (when no table is present), with an airflow velocity of approximately 0.5 m/s. Floor Coach: Clean space within 20m (distance between opening surface and collision wall), with an airflow velocity of 0.3 m/s. | - Semiconductors and Electronics: Integrated circuits, etching, deposition, polishing processes, lenses. Quality inspection, printed circuit boards. - Precision Processing: Mold mirror polishing processes, assembly processes, packaging, precision welding. - Food: Cultivation, fermentation, brewing, contamination control during component analysis. Other alternatives for clean rooms and clean benches. | |
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ウエキコーポレーション
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- 代表製品
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Open Clean System KOACH
- 概要
- Table Coach: Clean space within 700mm (distance between opening surfaces), with an airflow velocity of approximately 0.4 m/s. Stand Coach: Clean space within 2300mm (when a table is present), 1800mm (when no table is present), with an airflow velocity of approximately 0.5 m/s. Floor Coach: Clean space within 20m (distance between opening surface and collision wall), with an airflow velocity of 0.3 m/s.
- 用途/実績例
- - Semiconductors and Electronics: Integrated circuits, etching, deposition, polishing processes, lenses. Quality inspection, printed circuit boards. - Precision Processing: Mold mirror polishing processes, assembly processes, packaging, precision welding. - Food: Cultivation, fermentation, brewing, contamination control during component analysis. Other alternatives for clean rooms and clean benches.
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ウエキコーポレーション
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