July 3 (Wed) - July 5 (Fri) [Exhibition Participation] Announcement of ISSP2024 Corporate Exhibition Corner Participation

"Particle-PLUS" is a plasma analysis software suitable for simulations such as plasma reaction furnaces and chemical vapor deposition (CVD).

Particle-PLUS is a plasma and rarefied fluid analysis software that uses the particle method. It is effective for research, development, and manufacturing of devices and materials using plasma. It is also capable of analyzing advanced physical models such as dual-frequency CCP and external circuit models. With comprehensive support, even those new to simulation or busy with experiments can reliably achieve results. The software employs a particle model to analyze plasma, using the PIC/MC (Particle In Cell / Monte Carlo) method to track the motion of particles representing electrons and ions. Additionally, depending on the target plasma density, it efficiently switches between implicit methods for relatively high densities and explicit methods for low densities, allowing for effective solutions even with complex models. It excels in plasma simulations of low-pressure gases, where fluid modeling is particularly challenging. In addition to standard functions for CCP, ICP, and magnetron sputtering calculations, customization to fit the customer's equipment is also available.

• Other analyses

Analysis of gas flow under low pressure conditions; analysis software compatible with rarefied gases (rarefied fluids).

【Features】 ■ Adopts unstructured mesh, allowing for calculations that accurately reflect the complex shapes of actual devices. ■ High parallel efficiency enables quick computation results even for large-scale geometries. ■ Utilizes a particle method, ensuring convergence to a solution even with poor quality computational grids, unlike fluid models. ■ Comprehensive technical support ensures that even those new to simulation or busy with experiments can reliably achieve results. ◆ Supports various cases ◆ - Simulation of rarefied gas flow within a vacuum chamber. - Simulation of thin film generation in semiconductor manufacturing. - Simulation of thin film generation in semiconductor manufacturing processes such as Chemical Vapor Deposition (CVD), Organic Light Emitting Diodes (OLED), and Molecular Beam Epitaxy (MBE). ◆ Outputs various computation results ◆ - Calculation of chemical reactions. - Calculation of chemical reactions from Arrhenius-type reaction data. - Calculation of dissociation, recombination, and molecular (atomic) exchange reactions. - Ability to set multiple reaction equations on the GUI. * For more details, please refer to the catalog or feel free to contact us.

• Contract Analysis
• Other analyses

This software was developed by Professor Raja, an expert in plasma simulation at the University of Texas at Austin.

VizGlow is a general-purpose plasma simulation software developed by Esgee Technologies, Inc., founded by Professor Raja from the University of Texas at Austin, an expert in plasma simulation.

• simulator
• Contract Analysis
• Analysis Services

Nitto Kohki will hold the "2024 Attack Fair in Ichihara" at the "Yume Hall" for two days from December 11 (Wednesday) to December 12 (Thursday), 2024. The Attack Fair is an exhibition where you can actually "see, touch, and operate" Nitto Kohki's products. Additionally, there will be wonderful souvenirs for visitors and many fun activities prepared. We look forward to welcoming everyone!

Nitto Kohki will hold the "2025 Attack Fair in Kurume" at the "Local Production Kurume General Exhibition Hall" for two days from February 13 (Thursday) to February 14 (Friday), 2025. The Attack Fair is an exhibition where you can actually "see, touch, and operate" Nitto Kohki's products. Additionally, there will be wonderful commemorative gifts for visitors and many fun activities prepared. We look forward to welcoming everyone!

**Seminar Overview** The construction industry faces many challenges, including a shortage of personnel, regulations on maximum working hours, and the need for efficiency improvements. Additionally, the transmission of skills due to an aging workforce has become a significant issue, with a high turnover rate among younger employees who are supposed to carry on these skills. In this seminar, we will discuss the causes of turnover based on case studies and explain key points on how to reduce turnover rates by advancing IT integration.

**Seminar Overview** "Generative AI," which is gaining attention as a method for improving business efficiency and utilizing internal digital transformation (DX), can be influenced by the literacy of the employees using it, potentially increasing the burden of work instead. In this seminar, we will discuss the current challenges of generative AI while providing examples of how it can be used to enhance business efficiency. We will also explain how to utilize generative AI in a way that achieves efficiency without being dependent on the user's skills. We hope this will serve as a reference for considering the use of generative AI.

**Seminar Overview** The reality that young members leave their jobs due to miscommunication with their superiors occurs in every industry. This is also true in the construction industry. The long-standing issues of labor shortages, regulations on working hours, and the challenges of passing on skills due to an aging workforce are significant problems. However, the misalignment in communication with young employees, who are supposed to be receiving this knowledge, may actually worsen the situation. In this seminar, we will discuss the causes of communication gaps as seen through case studies, and talk about methods for skill transfer, knowledge accumulation, and smooth internal communication using IT tools.