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  1. Home
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  3. 奥野製薬工業 大阪・放出、東京、名古屋など
  4. We will exhibit at the 1st [Kyushu] Semiconductor Industry Exhibition.
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  • Sep 04, 2024
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Sep 04, 2024

We will exhibit at the 1st [Kyushu] Semiconductor Industry Exhibition.

奥野製薬工業 奥野製薬工業 大阪・放出、東京、名古屋など
Our company will be exhibiting at the 1st [Kyushu] Semiconductor Industry Exhibition, which will be held at Marine Messe Fukuoka Hall B from September 25 (Wednesday) to 26 (Thursday), 2024. At our booth, we will showcase the latest surface treatment chemicals and process technologies for wafers and package substrates, so please stop by. For more details, please check the related link [We will be exhibiting at the 1st [Kyushu] Semiconductor Industry Exhibition].
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We will exhibit at the 1st [Kyushu] Semiconductor Industry Exhibition
Our company will exhibit at the 1st [Kyushu] Semiconductor Industry Exhibition, which will be held at Marine Messe Fukuoka Hall B from September 25 (Wednesday) to 26 (Thursday), 2024. The booth location is 3-7. At the booth, we will showcase the latest surface treatment chemicals and process technologies for wafers and package substrates. For more details, please visit the official website of the [Kyushu] Semiconductor Industry Exhibition listed below.

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Copper sulfate plating additive for wafers - TORYZA LCN series

Newly developed copper sulfate plating chemicals for wiring of semiconductor wafers.

As the functionality, performance, and miniaturization of semiconductors continue to evolve, new technologies related to three-dimensional integration of semiconductors are being developed one after another. Consequently, addressing the miniaturization of wiring (narrow pitch) and heat dissipation measures has become increasingly important. To meet various demands, our company has newly developed sulfuric acid copper plating chemicals, the TORYZA LCN series, for semiconductor wafer wiring.

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Copper sulfate plating additive for semiconductor wafers - TORYZA LCN SP

TORYZA LCN SP, the optimal electroplating solution for forming copper pillars on semiconductor wafers and package substrates.

Solder balls have been widely used in semiconductor packaging. However, due to the increase in pin count (the number of terminals on the substrate), the increase in the number of chips being packaged, and the reduction in bonding area, solder bumps with a diameter of about 100µm are becoming insufficient for high-density packaging. As an alternative, attention is being drawn to a method that involves forming a redistribution layer (RDL) on the semiconductor and using copper pillars for bonding. Our company has developed the optimal additive for copper pillars, TORYZA LCN SP. TORYZA LCN SP can also be used to form ultra-fine electrodes on the build-up layer of the package substrate.

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Copper sulfate plating additive for semiconductor wafers - TORYZA LCN SV

Supports high aspect ratio filling, copper sulfate plating additive for silicon interposers - TORYZA LCN SV.

With the advancement of semiconductor performance and functionality, packaging technologies related to chiplets that implement multiple chips with different functions on a single substrate and three-dimensional integration are gaining attention. Among these, silicon interposers with wiring formed on silicon are attracting interest because they can miniaturize the length and width of the wiring, thereby enhancing the transmission capability of high-frequency signals. Our company has developed TORYZA LCN SV as an additive for silicon interposers that supports high aspect ratio filling. TORYZA LCN SV excels in embedability into TSVs, achieving void-free and low film thickness high aspect ratio filling.

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Copper sulfate plating additive for semiconductor wafers - TORYZA LCN SD

Copper sulfate plating additive for semiconductor wafers, high heat dissipation and high current applications - TORYZA LCN SD.

Smartphones are widely used not only for calls but also for content viewing such as music and videos, online shopping, and in industries like automobiles, smart home appliances, and robotics. Mobile communication devices like cell phones and tablets have undergone significant evolution approximately every 10 years, with their maximum communication speeds increasing by about 1,000,000 times over the past 30 years. Additionally, semiconductors used in servers and high-performance computers are required to achieve even higher performance and multifunctionality. Our company has recently developed a new copper sulfate plating additive, TORYZA LCN SD, which is optimal for low aspect ratio via filling. TORYZA LCN SD can be widely applied to microbumps that join semiconductor chips and build-up wiring boards, as well as thermal vias used for heat dissipation in trench wiring on wafers and power semiconductors.

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Copper sulfate plating additive for semiconductor wafers - TORYZA LCN FRV

FOWLP, FOPLP, and next-generation semiconductor package substrates, as well as ultra-fine wiring copper sulfate plating additives - TORYZA LCN FRV.

In recent years, semiconductor packaging technology has gained attention with FOWLP and FOPLP, which allow for an increase in the number of terminals relative to chip area by forming a redistribution layer on the wafer and expanding the terminals to the outside of the chip (Fan Out), in contrast to the conventional FC-BGA that is disadvantageous for thinness and cost reduction. Our company has developed a new copper sulfate plating additive for the formation of the redistribution layer in FOWLP and FOPLP. This product excels in film thickness uniformity and rectangularity of pattern shape, and it also accommodates filling of small-diameter vias. Additionally, to support the increase in the number of terminals on the chip side, the formation of ultra-fine wiring layers on the build-up layer of conventional FC-BGA is also being considered. This product is optimal for the formation of ultra-fine wiring in next-generation semiconductor package substrates.

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Aluminum electrode on wafer UBM formation plating process

Plating chemicals, total proposals for surface treatment processes and equipment, aluminum electrodes on wafers, UBM formation, plating process.

UBM (Under Barrier Metal) employs processes such as electroless Ni/Au plating and electroless Ni/Pd/Au plating. However, conventional processes have faced challenges such as localized corrosion of aluminum electrodes, poor appearance of plating, and poor adhesion. Additionally, in recent years, as power semiconductors have progressed towards higher voltage and higher current, there has been a demand for further heat resistance in electroless plating films. In response, we have developed a new UBM formation plating process called "TORYZA EL PROCESS," which suppresses film reduction and localized corrosion of aluminum electrodes while providing excellent uniform deposition, smoothness, and adhesion of electroless Ni plating. Along with the electroless plating equipment for UBM formation, "TORYZA EL SYSTEM," we offer a comprehensive proposal for plating chemicals, surface treatment processes, and equipment for semiconductor back-end processes.

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Electroless plating equipment for UBM formation for wafers

Plating chemicals, total proposals for surface treatment processes and equipment, electroless plating equipment for UBM formation for wafers.

Leveraging the know-how acquired as a surface treatment and plating chemicals manufacturer, we designed and developed the electroless plating system "TORYZA EL SYSTEM" for UBM formation in collaboration with equipment manufacturers. Along with the plating process "TORYZA EL PROCESS" for UBM formation on aluminum electrodes on wafers, we offer a comprehensive proposal for plating chemicals, surface treatment processes, and equipment for semiconductor back-end processes.

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Solving Weak-Micro Vias: High Connection Reliability Electroless Copper Plating Solution

Achieving thin film deposition of non-electrolytic copper plating! It greatly contributes to the formation of fine circuits on semiconductor package substrates and the improvement of via connection reliability!

In recent years, with the miniaturization and high performance of electronic devices, semiconductor devices have also become more refined and functional. There is a growing demand for further miniaturization of wiring and reduction of via diameters in semiconductor package substrates that connect semiconductor devices to the main substrate. Okuno Pharmaceutical Industry has newly developed products to meet the demands for fine wiring. Highest via connection reliability: Electroless copper plating solution: OPC FLET Copper - Achieves crystal continuity at the bottom of the via - Conventional baths see a significant increase in resistance due to a decrease in the thickness of the electroless copper plating film OPC FLET Copper shows good conductivity even at low film thickness - Controls the plating deposition rate - The deposition rate becomes gradual over time, suppressing deposition on copper - Conventional baths tend to have excessive surface film thickness OPC FLET Copper achieves sufficient coverage at low film thickness - Excellent connection reliability for small-diameter vias

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Related catalog(8)

Copper sulfate plating additive for wafers - TORYZA LCN series

Copper sulfate plating additive for wafers - TORYZA LCN series

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Copper sulfate plating additive for semiconductor wafers, high heat dissipation and high current applications - TORYZA LCN SD.

Copper sulfate plating additive for semiconductor wafers, high heat dissipation and high current applications - TORYZA LCN SD.

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FOWLP, FOPLP, and copper sulfate plating additives for ultra-fine wiring such as semiconductor package substrates - TORYZA LCN FRV.

FOWLP, FOPLP, and copper sulfate plating additives for ultra-fine wiring such as semiconductor package substrates - TORYZA LCN FRV.

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TORYZA LCN SP, a plating additive suitable for forming copper pillars on semiconductor wafers and package substrates.

TORYZA LCN SP, a plating additive suitable for forming copper pillars on semiconductor wafers and package substrates.

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Copper sulfate plating additive for semiconductor wafers - TORYZA LCN SV

Copper sulfate plating additive for semiconductor wafers - TORYZA LCN SV

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Aluminum electrode on wafer UBM formation - TORYZA EL PROCESS

Aluminum electrode on wafer UBM formation - TORYZA EL PROCESS

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Electroless plating equipment for UBM formation for wafers - TORYZA EL SYSTEM

Electroless plating equipment for UBM formation for wafers - TORYZA EL SYSTEM

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High connection reliability electroless copper plating process for solving weak micro vias - OPC FLET process.

High connection reliability electroless copper plating process for solving weak micro vias - OPC FLET process.

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奥野製薬工業
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奥野製薬工業 大阪・放出、東京、名古屋など
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[Expert Column] How Long Should You Keep Estimates? The Boundaries of "Obligation to Preserve Estimates"

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Regarding the "quotation" used at the forefront of sales activities: "Do we really need to save everything when we revise it to Ver.1, Ver.2, etc., every time the amount or specifications change?" "Should we also keep the data from other companies that were not selected in competitive quotations?" Have you ever wondered about these questions? The Electronic Bookkeeping Act strictly demands the "authenticity" of data, but saving every process is a significant burden for the field. This time, we will clearly explain the boundaries of the preservation obligation in a case study format, incorporating the latest interpretations from the National Tax Agency's Q&A. *You can read the full text from the note in the "Related Links." [Contents of this article] 1. The boundary of the preservation obligation lies in "sending to external parties." - Items sent externally are "generally required to be preserved." - Items not sent externally have "no preservation obligation." 2. The sender's judgment: "Is it linked to a transaction?" 3. The recipient's judgment: "The perspective of the 'Corporate Tax Act' is important." ■ Note! "Version revisions" and "corrections/deletions" are different things. ■ A smart way to achieve reliable "version management." ■ Summary

Jan 20, 2026

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Please take a look at Fukuda's electric air regulator and regulator!

  • NEW
  • PRODUCT

● What is a pneumatic regulator? It is a self-developed pneumatic regulator with a control reproducibility of ±0.1%. We offer a wide range of products from low flow to high flow. ● What is a regulator? Please use it to adjust the test pressure for leak testing. By supplying a stable test pressure, it enables more accurate measurements.

Jan 19, 2026

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Fukuda's leak test, leak inspection, leak detection, leak test, integrity test.

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  • PRODUCT

Fukuda Co., Ltd. has been pursuing leak detection for 60 years and is committed to advancing the future of leak testing. 【 Supporting Various Leak Tests: Air Leak Test / Gas Leak Test (Hydrogen Gas, Helium Gas) 】 We develop, manufacture, and sell leak testing equipment to inspect airtightness and sealing properties. We will propose the appropriate testers and devices for each inspection target. 【 Target Industries and Examples of Inspection Targets 】 - Automotive Industry: Engines, FC components, valves and piping, various parts - Electronic Components Industry: Smartphones, keyless switches, various small sensors - Pharmaceuticals / Food / Cosmetics Industry: Bottle containers, syringes, vials, eye drop containers, pillow packaging, PTP packaging We will propose the most suitable leak testers for each industry. 【 ISO Certification 】JIS Q 9001:2015 (ISO 9001:2015)

Jan 19, 2026

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■■ Air Leak Tester | FLA-0200 / FLA-0201 series ■■ Fukuda's new flagship model. Equipped with mastering correction function, it enables high-precision measurements in a short time.

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Fukuda's new flagship model. - Masterless type (FLA-0200 series) - General type (FLA-0201 series) Two models of air leak testers. With the mastering correction function, high-precision measurements can be achieved in a short time. Please take a look at the catalog.

Jan 19, 2026

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Please take a look at Fukuda's sealed product air leak testing device!

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  • PRODUCT

What is a sealed product air leak test device? It is an air leak test device that inspects the airtightness, sealing performance, and waterproofness of electrical equipment and packaging containers (cosmetics, food). It tests for leaks in products such as smartphones, tablet devices, keyless switches, wristwatches, bottle containers, and cosmetic containers (eyeliner, mascara).

Jan 19, 2026

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