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  1. Home
  2. Chemical
  3. Hayashi Pure Chemical Ind., Ltd. Electronic Materials
  4. Semicon Taiwan 2012 Exhibition Information
OTHER
  • Aug 28, 2012
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Aug 28, 2012

Semicon Taiwan 2012 Exhibition Information

Hayashi Pure Chemical Ind., Ltd. Hayashi Pure Chemical Ind., Ltd. Electronic Materials
Our company will be showcasing various etching solutions, including silver nanowire etching solution (for ITO alternative transparent conductive films) and GaN film (N-face) roughening etching solution (for blue LEDs), at the SUMITRONICS TAIWAN booth during SEMICON Taiwan 2012. We cordially invite you to stop by and take a look at this opportunity.
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Related Documents

セミコン台湾_2012_出展のご案内<日本語>.pdf[142387]

Related product

17_AlダメージレスSiエッチング液(異方性)「Pure Etch 160、SI151」.JPG

Al Damage-Free Si Etching Solution (Anisotropic)

Al and Al alloy films are anisotropically etched well without corrosion.

The features of this product are as follows: - It enables the formation of a smooth etching surface. - Etching can be performed regardless of the metal opening ratio on the device surface. - There is minimal degradation of the etching solution. - It is recommended to use Pure Etch ZE series (Al damage-free insulating film etching solution) as a pretreatment solution. Keywords: wet etching, silicon anisotropic etching

  • Chemicals

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02_Alテーパーコントロールエッチング液「Pure Etch NS series」.JPG

Al taper control etching solution

Etch the Al or Al alloy film at the desired taper angle.

The features of this product are as follows: - It forms the desired taper shape (taper angle). - It etches Al and Al alloy films effectively. - The etching speed and the in-plane uniformity of the etching shape are good. Keywords: wet etching, aluminum

  • Chemicals

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23_AlGaInP粗面化エッチング液「Pure Etch F100 series」.JPG

AlGaInP roughening etching solution

The surface of the AlGaInP film can be effectively roughened through etching, which improves the light extraction efficiency.

The features of this product are as follows: - It is possible to form desired unevenness and improve light extraction efficiency. - Processing can be done at low temperatures and in a short time. - The in-plane uniformity of the uneven shape is good. Keywords: frost treatment, unevenness, LED, light-emitting diode, aluminum indium gallium phosphide.

  • Other semiconductor manufacturing equipment

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24_GaP粗面化エッチング液「Pure Etch F200 series」.JPG

GaP roughening etching solution

The surface of the GaP film and the surfaces, slopes, and sides of the GaP substrate can be effectively roughened through etching, improving the light extraction efficiency.

The features of this product are as follows: - It is possible to form desired unevenness and improve light extraction efficiency. - Processing can be done at low temperatures and in a short time. - The in-plane uniformity of the uneven surface shape is good. Keywords: frost treatment, unevenness, LED, light-emitting diode, gallium phosphide, gallium nitride.

  • Chemicals

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25_AlGaAs、GaAs粗面化エッチング液「Pure Etch F300、F400 series」.JPG

AlGaAs/GaAs roughening etching solution

The surfaces of AlGaAs films, GaAs films, and GaAs substrates can be effectively roughened through etching, improving light extraction efficiency.

The features of this product are as follows: - It is possible to form desired unevenness and improve light extraction efficiency. - Processing can be done at low temperatures and in a short time. - The in-plane uniformity of the uneven surface shape is good. Keywords: frost treatment, unevenness, LED, light-emitting diode, aluminum gallium arsenide, gallium arsenide.

  • Chemicals

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16_Alダメージレス絶縁膜エッチング液「Pure Etch ZE series」.JPG

Al Damage-Free Insulating Film Etching Solution

Al and Al alloy films are etched well without corroding the insulating film. We have products for etching processing and for removing Si natural oxide films.

The features of this product are as follows: - It does not corrode Al or Al alloys. - It forms a good tapered profile. - It can be used for the formation of vias and pads through wet etching. - It can also be used as a pretreatment solution for Pure Etch 160 (Al damage-free Si etching solution). Keywords: wet etching, SiO2, SiN, TEOS, silicon oxide film, silicon nitride film.

  • Other semiconductor manufacturing equipment

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26_GaN(N面)粗面化エッチング液「Pure Etch F1000 series」.JPG

GaN (N-face) rough surface etching solution

The surface of the GaN (N-face) film can be effectively roughened through etching, improving the light extraction efficiency.

The features of this product are as follows: - It is possible to form desired unevenness and improve light extraction efficiency. - Processing can be done at room temperature to high temperatures. - The in-plane uniformity of the uneven surface shape is good. Keywords: frost treatment, unevenness, LED, light-emitting diode, gallium nitride.

  • Chemicals

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Related catalog(7)

Al Damage-Free Si Etching Solution (Anisotropic) "Pure Etch 160, SI151"

Al Damage-Free Si Etching Solution (Anisotropic) "Pure Etch 160, SI151"

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Al Taper Control Etching Solution "Pure Etch NS series"

Al Taper Control Etching Solution "Pure Etch NS series"

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AlGaInP roughening etching solution "Pure Etch F100 series"

AlGaInP roughening etching solution "Pure Etch F100 series"

PRODUCT
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GaP rough surface etching solution "Pure Etch F200 series"

GaP rough surface etching solution "Pure Etch F200 series"

PRODUCT
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AlGaAs/GaAs roughening etching solution "Pure Etch F300, F400 series"

AlGaAs/GaAs roughening etching solution "Pure Etch F300, F400 series"

PRODUCT
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Al Damage-Free Insulating Film Etching Solution "Pure Etch ZE Series"

Al Damage-Free Insulating Film Etching Solution "Pure Etch ZE Series"

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GaN (N-face) rough surface etching solution "Pure Etch F1000 series"

GaN (N-face) rough surface etching solution "Pure Etch F1000 series"

PRODUCT
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Hayashi Pure Chemical Ind., Ltd.
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Capacity Management (Medium to Large Scale)

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Pacific Avenue Capital Partners has begun exclusive negotiations to acquire Amcor's European waste container business "ESE World."

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Fukuda's leak test, leak inspection, leak detection, leak test, integrity test.

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  • 展示会出展等の販売促進に必要な費用を助成します! 最大300万円 助成率1/2以内 市場開拓助成事業 展示会等参加費・印刷物制作費・動画制作費 など 申請受付:令和8年 5/15(金)~5/29(金)
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