Al Damage-Free Si Etching Solution (Anisotropic)

Our company will be showcasing various etching solutions, including silver nanowire etching solution (for ITO alternative transparent conductive films) and GaN film (N-face) roughening etching solution (for blue LEDs), at the SUMITRONICS TAIWAN booth during SEMICON Taiwan 2012. We cordially invite you to stop by and take a look at this opportunity.

Lin Jun Pharmaceutical Industry Co., Ltd. has recently developed a damage-free aluminum (Al) etching solution for silicon oxide and silicon nitride (insulation film) etching. By using this etching solution, it becomes possible to etch insulation films without corroding Al or Al alloys, eliminating the need for processes to protect Al or Al alloys, which can improve the overall throughput of the manufacturing process. Our company will continue to propose functional chemical solutions that emphasize energy savings and cost reduction through process shortening to many companies.