Al Damage-Free Si Etching Solution (Anisotropic)
Al and Al alloy films are anisotropically etched well without corrosion.
The features of this product are as follows: - It enables the formation of a smooth etching surface. - Etching can be performed regardless of the metal opening ratio on the device surface. - There is minimal degradation of the etching solution. - It is recommended to use Pure Etch ZE series (Al damage-free insulating film etching solution) as a pretreatment solution. Keywords: wet etching, silicon anisotropic etching
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We offer a wide range of standard samples, including pesticide standard samples and environmental hormone-related substance standard samples, totaling around three thousand types, to various research institutes and survey organizations nationwide. In addition to reagents, we are also engaged in research and development of chemicals for the electronics industry, and in recent years, we have established a collaborative development system with users to propose new functions and conduct performance evaluations, supporting the development of the electronics industry.