Al and Al alloy films are etched well without corroding the insulating film. We have products for etching processing and for removing Si natural oxide films.
The features of this product are as follows: - It does not corrode Al or Al alloys. - It forms a good tapered profile. - It can be used for the formation of vias and pads through wet etching. - It can also be used as a pretreatment solution for Pure Etch 160 (Al damage-free Si etching solution). Keywords: wet etching, SiO2, SiN, TEOS, silicon oxide film, silicon nitride film.
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We offer a wide range of standard samples, including pesticide standard samples and environmental hormone-related substance standard samples, totaling around three thousand types, to various research institutes and survey organizations nationwide. In addition to reagents, we are also engaged in research and development of chemicals for the electronics industry, and in recent years, we have established a collaborative development system with users to propose new functions and conduct performance evaluations, supporting the development of the electronics industry.