Analysis Fundamentals Course "Surface Analysis (XPS, TOF-SIMS)" Live Streaming

This course will introduce the principles, characteristics, and application examples of two widely used analytical methods for analyzing surface composition, chemical structure, and functional groups: X-ray photoelectron spectroscopy (XPS / ESCA) and time-of-flight secondary ion mass spectrometry (TOF-SIMS).
[1] X-ray photoelectron spectroscopy (XPS / ESCA): A method for evaluating the composition and chemical bonding states of all elements, except for hydrogen and helium, present in the surfaces of inorganic and organic materials, as well as polymers. By combining etching, it allows for depth profiling analysis of inorganic and organic materials, and by applying gas-phase chemical modification methods, it is also possible to detect and quantify carboxyl groups, hydroxyl groups, and primary amines in organic materials. Additionally, it can analyze electronic states such as work function.
[2] Time-of-flight secondary ion mass spectrometry (TOF-SIMS): A method for qualitative analysis of trace organic and inorganic substances in the microregions (~several μm) of the very surface of materials, effective for analyzing trace surface contaminants and foreign substances. While absolute quantification is difficult, it is possible to compare the amounts of detected compounds between samples. By using a gas cluster ion beam (GCIB), depth profiling can be performed on organic materials while minimizing surface damage.

Date and time | Wednesday, Mar 26, 2025 ~ Tuesday, Jun 24, 2025 01:00 PM ~ 04:00 PM |
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Entry fee | Charge Tuition fee: 44,000 yen (tax included) |
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