PSS (Patterned Sapphire Substrate) through wet etching is changing the LED industry!!

About Patterned Sapphire Substrates (PSS) Using Wet Etching
Currently, LED manufacturers have two completely different processes as options for their manufacturing processes. The dry etching method allows for the production of high-brightness, high-efficiency LEDs, but it requires a long time for manufacturing and has limitations on throughput. The wet etching method has a shorter manufacturing time and is highly scalable, but it cannot produce LEDs that are efficient or effective. However, in the case of the wet etching method, even when polishing and improving the wafer to enhance light extraction efficiency, significant cost reductions can be achieved compared to the dry etching method. Additionally, because it can scale up very efficiently, the cost reduction rate dramatically increases multiple times as throughput is increased and wafer sizes are expanded.

Inquiry about this news
Contact Us OnlineMore Details & Registration
Details & Registration
Related Documents
Related Links
Quartz bath for wet etching of sapphire substrates, high-temperature type "Xe-Series"
・Chemical temperature: up to 300℃
・Liquid contact parts: all quartz
・Equipped with quartz aspirator for liquid discharge
・Equipped with recovery tank and emergency tank