Fundamentals, Applications, and Latest Trends of Dry/Wet Etching Technology in Semiconductor Manufacturing [Tokyo Venue]

This text systematically explains the etching technology that is essential for semiconductor manufacturing, covering everything from the basics to the latest trends. It details the development trends of advanced semiconductors, the principles of dry etching and wet etching, applications by material type, and cutting-edge atomic layer etching. The target materials include not only silicon-based materials but also compound semiconductors, encompassing a wide range of applications from miniaturization and three-dimensionalization to optical devices.

Date and time | Friday, Dec 05, 2025 10:30 AM ~ 04:30 PM |
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Capital | Conference Room 502, Federation Hall, 3-2-11 Kanda Surugadai, Chiyoda-ku, Tokyo |
Entry fee | Charge 55,000 yen |
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