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  3. NITTA DuPont Incorporated
  4. 【Technical Information】Grooving Process for CMP Polishing Pads
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  • Jan 16, 2019
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Jan 16, 2019

【Technical Information】Grooving Process for CMP Polishing Pads

NITTA DuPont Incorporated NITTA DuPont Incorporated
In selecting CMP pads, I will explain about one of the components, the groove processing. Generally, the surface of CMP pads is often grooved by the manufacturer before shipment. By applying groove processing to the surface of CMP pads, the following effects can be expected: 1. Improved retention and flowability of polishing slurry 2. Enhanced uniformity within the wafer surface and increased polishing rate 3. Prevention of wafer adhesion to the polishing pad surface 4. Discharge of processing debris and reaction byproducts The main specifications for groove processing typically include XY linear grooves, perforation grooves (through holes), and concentric grooves, and in some products, combinations of these may be possible. Various specifications for XY linear grooves, such as groove width and pitch, are available. We will select the optimal groove specifications tailored to your conditions, such as polishing equipment and processes, so please feel free to consult with us.
Examples of groove machining patterns
Examples of groove machining patterns
Comparison table of CMP pad product line and groove specifications.
Comparison table of CMP pad product line and groove specifications.
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IC1000(TM)画像.jpg

Foam Polyurethane Pad "IC1000(TM)"

The de facto standard for polishing pads in the CMP process. World market share No. 1!

There have been numerous successful adoptions to date, and we continue to maintain a high market share. The IC1000(TM) is designed based on special materials, manufacturing, and processing technologies, as well as advanced application evaluation techniques, ensuring optimal performance.

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EXTERION(TM)画像.jpg

Foam Polyurethane Pad "EXTERION(TM)"

Polishing pads optimal for primary polishing in mirror surface finishing.

The EXTERION(TM) series is a polyurethane foam pad created from advanced foam control technology. It is used for primary polishing of silicon wafers and compound substrates, providing a high-quality finish and reliable polishing performance. Additionally, its special processing technology demonstrates excellent thickness precision and startup performance.

  • Other abrasives

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不織布パッド『SUBA』.JPG

Non-woven fabric pad "Suba(TM)"

A non-woven fabric-based polishing pad that responds well to various applications.

"Suba(TM)" is a polishing pad made from polyester fibers, with polyurethane impregnated into a non-woven fabric formed by a dry process. It demonstrates excellent performance primarily for primary and secondary polishing of silicon wafers, sapphire wafers, and oxide wafers. It can also be used for edge polishing and notch polishing, and offers a wide range of products tailored to each process. 【Features】 ■ High polishing rate ■ Low defect rate ■ High flatness *For more details, please refer to the catalog or feel free to contact us.

  • Wafer processing/polishing equipment
  • Hand polishing and filing
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H1000画像.png

Soft Pad "H1000"

Polishing pad for achieving defect-free finishes

The H1000 series pad was developed as a pad for final polishing of silicon wafers. Its unique resin design demonstrates excellent scratch performance, and the straight pore structure achieves high stability and long life.

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Related catalog(1)

Nitta Dupont Co., Ltd. "CMP Polishing Pad" Product Catalog

Nitta Dupont Co., Ltd. "CMP Polishing Pad" Product Catalog

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