Both-side alignment and the ability for proximity and soft contact exposure are possible.
It is a mask aligner that aligns a glass mask and a workpiece in the photolithography process for wafers and glass substrates, transferring a fine mask pattern onto the photoresist coated on the plate.
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basic information
This is a mask aligner used in photolithography processes for wafers and glass substrates, aligning the glass mask with the workpiece to transfer fine mask patterns onto the photoresist coated on the plate. It supports both double-sided alignment and proximity as well as soft contact exposure. *For more details, please download the catalog and contact us.*
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Semiconductor field
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For over half a century, we have continuously refined our technological and product capabilities. By integrating Ushio's unique proposal power with these strengths, we provide solutions that pave the way for the next generation to society and the market. In the business domain of light and industry, where further evolution is anticipated, we will maximize all our capabilities to contribute to the development of our customers and society.
