★How to prevent re-adhesion of dirt? What are the cleaning levels required for semiconductor cleaning, LCD glass substrates, and mounted substrates? ★How to wash a large number of small parts at once?★
【Instructor】Mr. Yutaka Hiratsuka, Senior Advisor, Japan Industrial Cleaning Association 【Venue】Kawasaki City Industrial Promotion Hall, Room 2 【Kanagawa, Kawasaki Station】 【Date and Time】November 26, 2010 (Friday) 11:00 AM – 4:30 PM 【Capacity】30 people *Registration will close once full. Please apply early. 【Participation Fee】45,150 yen per person (including tax, text materials, and tea costs) New members applying for the first time by November 16 will receive an early bird discount price of 39,900 yen ◆For two applicants from the same organization, the fee is 69,300 yen ◆Lunch will be charged separately at 1,050 yen For more details or to consider applying, please visit the URL below ▼ http://ec.techzone.jp/products/detail.php?product_id=1172
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basic information
【Course Objective】 The advancement of electronics devices towards higher functionality and performance has led to a demand for miniaturization, high integration, and high reliability of their components. As a result, the importance of cleaning technologies that remove surface contamination of components, which can be a cause of defects in the manufacturing process, is increasing.
Price information
New members who apply for the first time by November 16 will receive an early bird discount price of 39,900 yen.
Price range
P2
Delivery Time
P2
※Delivery schedule for the course ticket.
Applications/Examples of results
【Program】 1. Basic Edition 2. Materials Edition 3. Cleaning Equipment and Methods Edition Q1. What is the role of cleaning equipment? Q2. How is the number of cleaning tanks for immersion cleaning determined? Q3. The role of ultrasound in enhancing the cleaning effect of immersion cleaning Q4. What equipment is suitable for cleaning a large number of small parts at once? Q5. Why did the cleaning machine for 300mm silicon wafers become single-wafer? 4. Cleaning Evaluation Technology Edition Q1. What are some simple methods for conducting cleaning evaluations? Q2. What methods are available for quantitatively measuring residual oily contaminants? Q3. How can samples be taken for analysis of trace residual contaminants from cleaned items? Q4. How can the removal of metal contaminants from silicon wafers be quantitatively verified? Q5. What methods are available for directly evaluating surface contamination? 5. Cleaning Technology in Industrial Fields Edition 6. Key Points of Cleaning Technology and Troubleshooting Edition Q1. What should be considered to avoid drying stains? Q2. How can rinsing be performed efficiently? Q3. How to address cleaning issues that arise during wet cleaning? 7. Environmental Technology and Regulations Edition Q1. What regulations exist for cleaning with organic solvents? Q2. What measures can be taken to reduce environmental impact in cleaning? 【Q&A】
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Our company has developed its business from "seminar planning" to various forms such as "lecturer dispatch," "publishing planning," "technical consultant dispatch," "trend research," "business matching," and "business development consulting," in order to support clients in a wide range of fields including chemistry, electronics, automotive, energy, medical devices, food, and building materials. By doing so, we have advanced our company and opened up new markets. AndTech promises to continue listening to our clients' voices, entering the business areas and markets they desire, and to remain a company that is loved by our clients, as we share their challenges, think together, and forge new paths.
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