G8 compatible sheet-type spin large mask cleaning device MSC-1500
WSR-A200CBT WSR-A300CBT
By using a dedicated chamber for rinsing and drying, precise cleaning is possible.
This is a large mask cleaning device compatible with AGVs, featuring chemical treatment, rinsing, and drying. It also allows for dual-side cleaning due to its reversing mechanism.
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basic information
【Features】 ■ Compatible with coating, developing, etching, stripping, and cleaning processes ■ Stripping and cleaning of resist residues / organic residues ■ Particle removal cleaning after metal particles, polishing, and dicing ■ Removal cleaning of adhered fine particles and adsorbed fine particles ■ Acceptance cleaning and cleaning between various processes (before film formation, before exposure, after stripping, after etching, after back grinding, etc.), particle removal, final cleaning ■ Surface modification cleaning ■ Bevel and edge cleaning, etc. □ For more details, please refer to the catalog.
Price information
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Delivery Time
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Applications/Examples of results
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Company information
Kanamex Co., Ltd. has been engaged in the design and manufacturing of wet processing equipment related to photolithography in the semiconductor industry since its establishment. In today's electronics industry, particularly in the semiconductor front-end, advanced packaging technology, and FPD fields, there is an increasing demand for manufacturing processes that accommodate thinner, larger, and more advanced device substrates, as well as devices with higher functionalities, which require innovative manufacturing equipment. To meet the needs of the industry, our company is always alongside our customers, striving to improve customer satisfaction, maintaining a constant research and development mindset, and building innovative technologies to provide products and services that align with industry demands. We aim to conduct vibrant corporate activities as part of our management philosophy and will continue to work towards contributing to the development of society.
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