UV/O3 Cleaner - UV Ozone Cleaner
The UV-300H is a cleaning device developed to efficiently perform complete dry processing of various semiconductor processes such as photoresist ashing, silicon wafer cleaning, and chrome mask cleaning through the interaction of high-concentration ozone and ultraviolet irradiation. This device enables faster processing compared to conventional UV/O3 treatment.
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basic information
【Features】 ○ Enables high-speed processing (200–300nm/min) compared to conventional UV/O3 treatment ○ Built-in ozone removal device with non-precious metal catalyst, eliminating the need for ozone treatment equipment ○ Operates at atmospheric pressure, so a vacuum system is not required ○ One-touch automatic operation available ○ Compact design ● For other functions and details, please contact us.
Price information
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Delivery Time
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Applications/Examples of results
【Applications】 ○ Photoresist ashing ○ Ink removal ○ Removal of solvent residues ○ Cleaning of chrome masks ○ Cleaning of silicon, compound semiconductors, quartz, liquid crystal displays, lenses, various disks, etc. ● For other functions and details, please contact us.
Company information
We excel in the technology of thin film formation and processing at the nano to micro level, and we are well-regarded for providing equipment and technology for both research and development applications as well as production purposes. Additionally, we specialize in the optoelectronics field, particularly in light sources (LEDs and semiconductor lasers), which are expected to see market expansion in the future.
