Removal of organic pollutants with the double effect of ultraviolet light and ozone from two wavelengths!
The "UV Ozone Cleaner" is a damage-free dry cleaning method that can remove organic contaminants adhering to substrates through a photochemical oxidation decomposition process. It features a reliable sealed structure that can maintain a pressurized state of 0.02 MPa inside the cleaning chamber. Additionally, by connecting to the standard ozone killer (ozone decomposition device) equipped in other models, it prevents ozone leakage to the outside. 【Features】 ■ Easily removes organic contaminants on substrates that could not be removed by ultrasonic cleaning alone ■ Removes organic solvents used in wet cleaning ■ Capable of removing organic contaminants without damaging the substrate surface ■ Facilitates the formation of thin films ■ A dry cleaning device that can be used at atmospheric pressure without the need for a vacuum device *For more details, please refer to the PDF materials or feel free to contact us.
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【Other Features】 ■ Sealed structure that prevents ozone leakage ■ Equipped with an automatic ozone exhaust mechanism through gas replacement ■ Lamps can be selected from dissolved quartz and synthetic quartz ■ UV lamps can be chosen from straight tube type and high-density, high-output grid type *For more details, please refer to the PDF document or feel free to contact us.
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For more details, please refer to the PDF document or feel free to contact us.
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Development, manufacturing, and sales of thin film-related equipment (thin film pre-treatment substrate cleaning equipment, thin film fabrication equipment, thin film evaluation equipment). Contract analysis related to biotechnology.
