A simple method for vacuum heating processes is possible!
The vacuum chamber hot plate "PH221" is a chamber-structured hot plate (maximum temperature 200°C). It is a type that combines a hot plate with a vacuum chamber, making it easy to carry out heating processes in a low vacuum environment. The chamber structure and size can be customized. The temperature distribution of the hot plate is ±2.0%. With a programmable temperature controller (sold separately), temperature program settings are possible. It allows for vacuum heating processes, such as processes in a vacuum environment, degassing processes, and baking, in a simple manner. For more details, please contact us or refer to the catalog.
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basic information
【Features】 ○ Chamber structure hot plate (maximum temperature 200℃) ○ Type that combines a hot plate with a vacuum chamber ○ Easily achieves heating processes in a low vacuum environment ○ Customizable chamber structure, size, etc. ○ Hot plate temperature distribution ±2.0% ○ Programmable temperature controller (sold separately) allows for temperature program settings ○ Enables vacuum heating processes in a simple manner → Processes in a vacuum environment, degassing processes, baking, etc. 【Standard Specifications】 ○ Temperature setting range: 50–200℃ ○ Heater capacity: AC100V, approximately 400W (□200mm size) ○ Hot plate size: □150–□250mm ○ Hot plate surface treatment: Anodized (to prevent plate scratches) ○ Cable: PCC-0505 (wiring on one end for the hot plate) ○ Compatible temperature controllers: PCC100, PCC107, PCC100co, PCC107Co ● For more details, please contact us or refer to the catalog.
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Applications/Examples of results
【Usage】 ○ Processes in a vacuum environment, degassing processes, baking, etc. ● For more details, please contact us or refer to the catalog.
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Company information
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