List of Heating device products
- classification：Heating device
1～45 item / All 1976 items
We provide comprehensive support from design to manufacturing and maintenance!
- Contract manufacturing
It won't break even after 1 million repetitions! A mat switch with reliable operation, high durability, and low price. Suitable for options in machine tools as well. Please consult us about delivery t...
- Sensors
![[Nanofurnace] BWS-NANO Thermal CVD ...](https://image.mono.ipros.com/public/product/image/0d0/2000191194/IPROS99314670218218380543.jpeg?w=280&h=280){kind=small}
Hot Wall Type Thermal CVD Equipment: A compact, high-performance CVD device ideal for fundamental research.
- CVD Equipment
- Annealing furnace
- Heating device
◇◆◇ nanoPVD-S10A Magnetron Sputtering Device ◇◆◇
This is an RF/DC magnetron sputtering device for research and development. Despite its high performance and multifunctionality, it fits into the limited space of a laboratory with its compact size and easy operation via a 7-inch front touch panel. ● Achievable pressure: 5x10^-5 Pa (*fastest 30 minutes up to 1x10^-4 Pa!) ● Film uniformity: ±3% ● Various options: up/down rotation, heater, cathode for magnetic materials, and more ● 3-source cathode + 3 MFC systems, with additional RF/DC power supply, allowing for versatile applications such as multilayer films and simultaneous deposition. - Insulating films - Conductive films - Compounds, etc. 【Main Features】 ◉ Compatible substrates: 2" (up to 3 sources) or 1" (1 source) ◉ 2" cathode x up to 3 sources ◉ Easy operation via touch panel with PLC automatic program control ◉ MFC high-precision APC automatic process pressure control ◉ Up to 3 MFC systems ◉ USB port for Windows PC connection, capable of creating and saving recipes for up to 1000 layers and 50 films. Live data logging on PC. ◉ Vacuum system: TMP + RP (*dry pump option) ◉ Substrate rotation, up/down elevation, heating (Max 500℃) ◉ Quartz crystal film thickness monitor/controller
High-temperature crucible heating heater for vacuum use. A versatile heater unit that can be used as an organic deposition source at 800°C and a metal deposition source at 1500°C.
- Evaporation Equipment
- Heating device
- Electric furnace
◇◆◇ nanoPVD-S10A Magnetron Sputtering Device ◇◆◇
This is an RF/DC magnetron sputtering device for research and development. Despite its high performance and multifunctionality, it fits into the limited space of a laboratory with its compact size and easy operation via a 7-inch front touch panel. ● Achievable pressure: 5x10^-5 Pa (*fastest 30 minutes up to 1x10^-4 Pa!) ● Film uniformity: ±3% ● Various options: up/down rotation, heater, cathode for magnetic materials, and more ● 3-source cathode + 3 MFC systems, with additional RF/DC power supply, allowing for versatile applications such as multilayer films and simultaneous deposition. - Insulating films - Conductive films - Compounds, etc. 【Main Features】 ◉ Compatible substrates: 2" (up to 3 sources) or 1" (1 source) ◉ 2" cathode x up to 3 sources ◉ Easy operation via touch panel with PLC automatic program control ◉ MFC high-precision APC automatic process pressure control ◉ Up to 3 MFC systems ◉ USB port for Windows PC connection, capable of creating and saving recipes for up to 1000 layers and 50 films. Live data logging on PC. ◉ Vacuum system: TMP + RP (*dry pump option) ◉ Substrate rotation, up/down elevation, heating (Max 500℃) ◉ Quartz crystal film thickness monitor/controller
Fundamental to applied technologies using thermal/non-thermal processes.
- Technical and Reference Books
- Other process controls
- Heating device
Introducing the latest lineup of hydrogen gas burners and low-carbon equipment! 【Thermal Technology 2024】 (October 10-11, Grand Front Osaka)
- Heating device
- Industrial Furnace
- Drying Equipment
【Exhibition Information】Coating Japan - High-Performance Materials Week - Paint and Coating Equipment Exhibition
We are pleased to announce that Shoei Seisakusho, a manufacturer of gas burners and industrial furnaces, will be exhibiting at the "Coating and Painting Equipment Exhibition" held at Makuhari Messe. We will showcase a lineup of heat-generating devices for painting drying equipment, as well as deodorization devices (VOC removal devices) in a panel display. We will also introduce examples of energy-saving equipment and decarbonization items using hydrogen gas burners. ---------------------- The Coating and Painting Equipment Exhibition - COATING JAPAN - is a specialized exhibition where functional coatings, painting equipment, and surface treatment technologies are all presented together. ----------------------
A heating solution for mass-producing nanoparticles in a "continuous" manner with uniform particle size.
- Heating device
- Other heating equipment
For those struggling with heat radiation and heat conduction from the furnace! Achieve both extended equipment lifespan and energy savings through proper material selection and precise processing base...
- Industrial Furnace
- Electric furnace
- Heating device
Packing used around furnace equipment, high-performance fiber products requiring tensile strength.
- Heating device
- Industrial Furnace
- Electric furnace
An ideal insulation material that can be used from -190℃ to 1100℃ and exhibits excellent performance.
- Heating device
- Industrial Furnace
- Electric furnace
It has become possible to manufacture high-performance insulation materials flexibly to match costs.
- Industrial Furnace
- Heating device
- Electric furnace
High-temperature heat-resistant shoes with excellent safety and functionality.
- Heating device
- Industrial Furnace
- Safety shoes and sneakers
Experts in high-temperature insulation materials essential for heat treatment! We handle everything from insulation material selection to precision processing. *Free product catalog available (PDF dow...
- Electric furnace
- Heating device
- Industrial Furnace
It is a flexible heater that can meet various needs.
- Industrial Furnace
- Heating device
- Electric furnace
We process all types of insulation boards.
- Industrial Furnace
- Electric furnace
- Heating device
If you have any issues with the near-infrared lamp heater, please consult us first.
- Heating device
- Other heaters
Maximum operating temperature 2000℃ Semi-automatic control Ultra-high temperature experimental furnace (carbon furnace, tungsten metal furnace) Compact and space-saving experimental furnace
- Heating device
- Annealing furnace
- Electric furnace
【MiniLab-125】 Multi-target sputtering system (compatible with Φ8") equipped with a 1000℃ heater stage (SiC coating)! Compact size!
Multifunctional Multi-Sputtering Device (Compatible with Φ8inch Substrates) - Triple-source simultaneous deposition + Single-source Pulse DC sputtering - Flexible arrangement of RF500W and DC850W power supplies to the three-source cathodes (Source 1, 2, 3) - Equipped with a 5KW Pulse DC power supply → Used with dedicated cathode (4) - Substrate heating stage Max 800℃ (SiC-coated heater can achieve Max 1000℃) - MFC x 3 systems (Ar, O2, N2) for reactive sputtering - Main chamber RIE etching stage RF300W - LL chamber <30W low-power controlled soft etching - Unique "Soft-Etching" technology reduces substrate damage through substrate bias - Touch panel or Windows PC operation: All operations can be performed via touch panel/PC without dispersing control. - Equipment installation dimensions: 1,960(W) x 1,100(D) x 1,700(H) mm - Multi-chamber configurations are also possible. ● Mixed specifications for resistance heating deposition, organic material deposition, EB deposition, PECVD, etc., can also be configured.
Tabletop small-sized experimental furnace - space-saving, with a maximum operating temperature of 2000°C! We also manufacture metal furnaces for reducing atmospheres.
- Heating device
- Electric furnace
- Other heaters
◇◆◇ nanoPVD-S10A Magnetron Sputtering Device ◇◆◇
This is an RF/DC magnetron sputtering device for research and development. Despite its high performance and multifunctionality, it fits into the limited space of a laboratory with its compact size and easy operation via a 7-inch front touch panel. ● Achievable pressure: 5x10^-5 Pa (*fastest 30 minutes up to 1x10^-4 Pa!) ● Film uniformity: ±3% ● Various options: up/down rotation, heater, cathode for magnetic materials, and more ● 3-source cathode + 3 MFC systems, with additional RF/DC power supply, allowing for versatile applications such as multilayer films and simultaneous deposition. - Insulating films - Conductive films - Compounds, etc. 【Main Features】 ◉ Compatible substrates: 2" (up to 3 sources) or 1" (1 source) ◉ 2" cathode x up to 3 sources ◉ Easy operation via touch panel with PLC automatic program control ◉ MFC high-precision APC automatic process pressure control ◉ Up to 3 MFC systems ◉ USB port for Windows PC connection, capable of creating and saving recipes for up to 1000 layers and 50 films. Live data logging on PC. ◉ Vacuum system: TMP + RP (*dry pump option) ◉ Substrate rotation, up/down elevation, heating (Max 500℃) ◉ Quartz crystal film thickness monitor/controller
Tabletop small-sized experimental furnace - space-saving with a maximum operating temperature of 2000℃! We also manufacture metal furnaces for reducing atmospheres.
- Heating device
- Electric furnace
- Annealing furnace
【MiniLab-125】 Multi-target sputtering system (compatible with Φ8") equipped with a 1000℃ heater stage (SiC coating)! Compact size!
Multifunctional Multi-Sputtering Device (Compatible with Φ8inch Substrates) - Triple-source simultaneous deposition + Single-source Pulse DC sputtering - Flexible arrangement of RF500W and DC850W power supplies to the three-source cathodes (Source 1, 2, 3) - Equipped with a 5KW Pulse DC power supply → Used with dedicated cathode (4) - Substrate heating stage Max 800℃ (SiC-coated heater can achieve Max 1000℃) - MFC x 3 systems (Ar, O2, N2) for reactive sputtering - Main chamber RIE etching stage RF300W - LL chamber <30W low-power controlled soft etching - Unique "Soft-Etching" technology reduces substrate damage through substrate bias - Touch panel or Windows PC operation: All operations can be performed via touch panel/PC without dispersing control. - Equipment installation dimensions: 1,960(W) x 1,100(D) x 1,700(H) mm - Multi-chamber configurations are also possible. ● Mixed specifications for resistance heating deposition, organic material deposition, EB deposition, PECVD, etc., can also be configured.
Maximum operating temperature 2000℃ Semi-automatic control Ultra-high temperature experimental furnace (carbon furnace, tungsten metal furnace) Compact and space-saving experimental furnace
- Heating device
- Annealing furnace
- Electric furnace
Multi-functional Sputtering System 【MiniLab-S060】
4 cathodes with Φ2 inch mounted Simultaneous film formation: 3-component simultaneous film formation (RF 500W or DC 850W) + HiPIMS (PulseDC 5KW) x 1 Power distribution and configuration settings for 4 cathodes can be freely changed from the HMI screen using the plasma relay switch 3 MFC systems (Ar, O2, N2) for reactive sputtering RIE etching stage RF 300W (main chamber) + <30W soft etching (LL chamber) Substrate heating: Max 500℃, 800℃, or 1000℃ (C/C or SiC coat) Substrate rotation and vertical movement (automatically controlled by stepping motor) APC automatic control: Upstream (MFC flow adjustment) or downstream (automatic valve opening adjustment on the exhaust side) Dimensions: 1,120(W) x 800(D) ● Mixed specifications for resistance heating deposition, organic material deposition, EB deposition, PECVD, etc. are also possible.
6 to 8 inch ultra-high temperature wafer annealing equipment, a high-performance machine that widely supports various purposes from research and development to small-scale production.
- Annealing furnace
- Heating device
- Electric furnace
【MiniLab-125】 Multi-target sputtering system (compatible with Φ8") equipped with a 1000℃ heater stage (SiC coating)! Compact size!
Multifunctional Multi-Sputtering Device (Compatible with Φ8inch Substrates) - Triple-source simultaneous deposition + Single-source Pulse DC sputtering - Flexible arrangement of RF500W and DC850W power supplies to the three-source cathodes (Source 1, 2, 3) - Equipped with a 5KW Pulse DC power supply → Used with dedicated cathode (4) - Substrate heating stage Max 800℃ (SiC-coated heater can achieve Max 1000℃) - MFC x 3 systems (Ar, O2, N2) for reactive sputtering - Main chamber RIE etching stage RF300W - LL chamber <30W low-power controlled soft etching - Unique "Soft-Etching" technology reduces substrate damage through substrate bias - Touch panel or Windows PC operation: All operations can be performed via touch panel/PC without dispersing control. - Equipment installation dimensions: 1,960(W) x 1,100(D) x 1,700(H) mm - Multi-chamber configurations are also possible. ● Mixed specifications for resistance heating deposition, organic material deposition, EB deposition, PECVD, etc., can also be configured.
Maximum operating temperature 2000℃ Semi-automatic control Ultra-high temperature experimental furnace (carbon furnace, tungsten metal furnace) Compact and space-saving experimental furnace
- Heating device
◇◆◇ nanoPVD-S10A Magnetron Sputtering Device ◇◆◇
This is an RF/DC magnetron sputtering device for research and development. Despite its high performance and multifunctionality, it fits into the limited space of a laboratory with its compact size and easy operation via a 7-inch front touch panel. ● Achievable pressure: 5x10^-5 Pa (*fastest 30 minutes up to 1x10^-4 Pa!) ● Film uniformity: ±3% ● Various options: up/down rotation, heater, cathode for magnetic materials, and more ● 3-source cathode + 3 MFC systems, with additional RF/DC power supply, allowing for versatile applications such as multilayer films and simultaneous deposition. - Insulating films - Conductive films - Compounds, etc. 【Main Features】 ◉ Compatible substrates: 2" (up to 3 sources) or 1" (1 source) ◉ 2" cathode x up to 3 sources ◉ Easy operation via touch panel with PLC automatic program control ◉ MFC high-precision APC automatic process pressure control ◉ Up to 3 MFC systems ◉ USB port for Windows PC connection, capable of creating and saving recipes for up to 1000 layers and 50 films. Live data logging on PC. ◉ Vacuum system: TMP + RP (*dry pump option) ◉ Substrate rotation, up/down elevation, heating (Max 500℃) ◉ Quartz crystal film thickness monitor/controller
This is a heater for thin film experiments such as PVD and CVD, featuring excellent uniformity, heating characteristics, and controllability. RF/DC bias specifications are also available.
- Heating device
◇◆◇ nanoPVD-S10A Magnetron Sputtering Device ◇◆◇
This is an RF/DC magnetron sputtering device for research and development. Despite its high performance and multifunctionality, it fits into the limited space of a laboratory with its compact size and easy operation via a 7-inch front touch panel. ● Achievable pressure: 5x10^-5 Pa (*fastest 30 minutes up to 1x10^-4 Pa!) ● Film uniformity: ±3% ● Various options: up/down rotation, heater, cathode for magnetic materials, and more ● 3-source cathode + 3 MFC systems, with additional RF/DC power supply, allowing for versatile applications such as multilayer films and simultaneous deposition. - Insulating films - Conductive films - Compounds, etc. 【Main Features】 ◉ Compatible substrates: 2" (up to 3 sources) or 1" (1 source) ◉ 2" cathode x up to 3 sources ◉ Easy operation via touch panel with PLC automatic program control ◉ MFC high-precision APC automatic process pressure control ◉ Up to 3 MFC systems ◉ USB port for Windows PC connection, capable of creating and saving recipes for up to 1000 layers and 50 films. Live data logging on PC. ◉ Vacuum system: TMP + RP (*dry pump option) ◉ Substrate rotation, up/down elevation, heating (Max 500℃) ◉ Quartz crystal film thickness monitor/controller
Max 1000℃, MFC maximum 3 systems, APC pressure control, compatible with 4" or 6" substrates, high vacuum annealing equipment (<5 × 10^-7 mbar)
- Annealing furnace
- Heating device
- Electric furnace
【MiniLab-125】 Multi-target sputtering system (compatible with Φ8") equipped with a 1000℃ heater stage (SiC coating)! Compact size!
Multifunctional Multi-Sputtering Device (Compatible with Φ8inch Substrates) - Triple-source simultaneous deposition + Single-source Pulse DC sputtering - Flexible arrangement of RF500W and DC850W power supplies to the three-source cathodes (Source 1, 2, 3) - Equipped with a 5KW Pulse DC power supply → Used with dedicated cathode (4) - Substrate heating stage Max 800℃ (SiC-coated heater can achieve Max 1000℃) - MFC x 3 systems (Ar, O2, N2) for reactive sputtering - Main chamber RIE etching stage RF300W - LL chamber <30W low-power controlled soft etching - Unique "Soft-Etching" technology reduces substrate damage through substrate bias - Touch panel or Windows PC operation: All operations can be performed via touch panel/PC without dispersing control. - Equipment installation dimensions: 1,960(W) x 1,100(D) x 1,700(H) mm - Multi-chamber configurations are also possible. ● Mixed specifications for resistance heating deposition, organic material deposition, EB deposition, PECVD, etc., can also be configured.
It is a high-performance vacuum deposition source that can be used as a high-temperature heating cell for vacuum applications, with an organic deposition source up to 800°C and a metal deposition sour...
- Evaporation Equipment
- Heating device
- Electric furnace
◇◆◇ nanoPVD-S10A Magnetron Sputtering Device ◇◆◇
This is an RF/DC magnetron sputtering device for research and development. Despite its high performance and multifunctionality, it fits into the limited space of a laboratory with its compact size and easy operation via a 7-inch front touch panel. ● Achievable pressure: 5x10^-5 Pa (*fastest 30 minutes up to 1x10^-4 Pa!) ● Film uniformity: ±3% ● Various options: up/down rotation, heater, cathode for magnetic materials, and more ● 3-source cathode + 3 MFC systems, with additional RF/DC power supply, allowing for versatile applications such as multilayer films and simultaneous deposition. - Insulating films - Conductive films - Compounds, etc. 【Main Features】 ◉ Compatible substrates: 2" (up to 3 sources) or 1" (1 source) ◉ 2" cathode x up to 3 sources ◉ Easy operation via touch panel with PLC automatic program control ◉ MFC high-precision APC automatic process pressure control ◉ Up to 3 MFC systems ◉ USB port for Windows PC connection, capable of creating and saving recipes for up to 1000 layers and 50 films. Live data logging on PC. ◉ Vacuum system: TMP + RP (*dry pump option) ◉ Substrate rotation, up/down elevation, heating (Max 500℃) ◉ Quartz crystal film thickness monitor/controller
It is possible to defrost while still in boxes such as cardboard and Styrofoam! High-frequency defroster "Tempatron"!
- Food Processing Equipment
- Other food machinery
- Heating device
Notice of Participation in the 36th West Japan Food Industry Creation Exhibition '26 (May 20, 2026 (Wed) - May 22 (Fri))
Yamamoto Vinita will be exhibiting at the "36th Western Japan Food Industry Creation Exhibition '26" held at Tokyo Big Sight. Booth Number: West 4 Hall, Booth No. W4-39-05 *Exhibited Equipment: High-Frequency Rapid Thawing Device TEMPERTRON-VI Type - Thawing of beef, pork, chicken, vegetables, seafood, etc. - Heating and melting of dairy products such as butter, margarine, and chocolate - Achieves automation and labor-saving through rapid thawing. - This device can effectively heat even thick raw materials to the center. On the day of the event, we will also have a consultation desk for specific inquiries regarding thawing, heating, drying, and sterilization using radio waves (high frequency and microwaves). [Reasons for Improvement with High-Frequency Thawing] - Automation and line integration from raw material thawing to product completion on the day. - Thawing and heating in a short time frame of 20 to 30 minutes. - Reduction of personnel through automation of thawing and continuous thawing processes. - Ensuring thorough thawing of the center (uniform thawing quality) (elimination of surface drip loss). - Thawing without using water (reduction of water usage) (improvement of hygiene) (improvement of labor environment). - Elimination of excessive thawing (eradication of refreezing: reduction of food waste: thawing the necessary amount at the necessary time). Various companies have achieved improvements in their issues.
A heating device that is compact and heats quickly.
- Heating device
![[Heating Device] Secondary steriliz...](https://image.mono.ipros.com/public/product/image/b1f/2000603428/IPROS00291506596891138127.jpeg?w=280&h=280){kind=small}
A compact and time-efficient sterilization device. It contributes to food waste reduction.
- Heating device
![[Case Study] What are the results o...](https://image.mono.ipros.com/public/product/image/3f9/2000605712/IPROS10088947698618592946.jpeg?w=280&h=280){kind=small}
No need for temperature adjustment since the day before, improved yield even with thawing on the day!
- Heating device
Notice of Participation in the 36th West Japan Food Industry Creation Exhibition '26 (May 20, 2026 (Wed) - May 22 (Fri))
Yamamoto Vinita will be exhibiting at the "36th Western Japan Food Industry Creation Exhibition '26" held at Tokyo Big Sight. Booth Number: West 4 Hall, Booth No. W4-39-05 *Exhibited Equipment: High-Frequency Rapid Thawing Device TEMPERTRON-VI Type - Thawing of beef, pork, chicken, vegetables, seafood, etc. - Heating and melting of dairy products such as butter, margarine, and chocolate - Achieves automation and labor-saving through rapid thawing. - This device can effectively heat even thick raw materials to the center. On the day of the event, we will also have a consultation desk for specific inquiries regarding thawing, heating, drying, and sterilization using radio waves (high frequency and microwaves). [Reasons for Improvement with High-Frequency Thawing] - Automation and line integration from raw material thawing to product completion on the day. - Thawing and heating in a short time frame of 20 to 30 minutes. - Reduction of personnel through automation of thawing and continuous thawing processes. - Ensuring thorough thawing of the center (uniform thawing quality) (elimination of surface drip loss). - Thawing without using water (reduction of water usage) (improvement of hygiene) (improvement of labor environment). - Elimination of excessive thawing (eradication of refreezing: reduction of food waste: thawing the necessary amount at the necessary time). Various companies have achieved improvements in their issues.
![[Case Study] You can melt candies a...](https://image.mono.ipros.com/public/product/image/d3f/2000605714/IPROS55231550774228731234.jpeg?w=280&h=280){kind=small}
Even poorly formed candies can be melted down without compromising quality. Achieve zero waste!
- Heating device
![[Technical Data Presentation] Micro...](https://image.mono.ipros.com/public/product/image/37438/IPROS7696124350927171022.png?w=280&h=280){kind=small}
Introducing a microwave heating device systematized to accommodate various forms, particularly a mass production system powered by high power!
- Heating device
We will organize the differences in heating methods between microwave and high-frequency dielectric heating, and introduce specific practical examples of processes where these technologies are applied...
- High frequency/microwave parts
- Heating device
Thaw while still in the box! Contributing to improved productivity in food manufacturing.
- Food Processing Equipment
- Other food machinery
- Heating device
![[Defrosting Device] High-Frequency ...](https://image.mono.ipros.com/public/product/image/676/37438001/IPROS01307346816784414808.png?w=280&h=280){kind=small}
Quality preservation of frozen food ingredients! Continuous and high-speed processing of large quantities of frozen products. Automation of the entire process from thawing to processing has been achie...
- Heating device
![[Drying Example] Are there drying a...](https://image.mono.ipros.com/public/product/image/fc8/2000605036/IPROS46076670522744260421.jpeg?w=280&h=280){kind=small}
A drying device that is compact and dries in a short time. It does not compromise flavor or quality after drying.
- Heating device
![[Case Study] What is a defrosting d...](https://image.mono.ipros.com/public/product/image/e26/2000605715/IPROS64840494604985502791.jpeg?w=280&h=280){kind=small}
High-frequency waves allow for the defrosting of food while still in cardboard. Add value with delivery after defrosting!
- Heating device
![[Case Study] Can frozen fish be tha...](https://image.mono.ipros.com/public/product/image/d52/2000605717/IPROS62465583042188273581.jpeg?w=280&h=280){kind=small}
By introducing a high-frequency thawing device, we can achieve a reduction in the processes of "breaking down raw materials and loosening in running water"! Here are examples of frozen raw materials (...
- Heating device
![[Case Study] Can a thawing device b...](https://image.mono.ipros.com/public/product/image/d2e/2000607219/IPROS63628543762016022339.png?w=280&h=280){kind=small}
Enable thawing or dissolving only as needed, when needed! The final state can also be adjusted by changing the time!
- Heating device
![[Heating Example] How is the heatin...](https://image.mono.ipros.com/public/product/image/64b/2000624144/IPROS54845729874797877279.jpeg?w=280&h=280){kind=small}
By using internal heating with radio waves, we achieve high-quality heating and drying without compromising the flavor of the breadcrumbs.
- Heating device
Achieving automation technology for high-frequency thawing "Level 2.5"! Contributing to complete unmanned manufacturing processes while performing high-quality thawing! Information on FOOMA 2025 exhib...
- Food Processing Equipment
- Other food machinery
- Heating device
Notice of participation in "FOOMA JAPAN 2026" from June 2 (Tuesday) to June 5 (Friday), 2026.
Yamamoto Vinitar will be exhibiting at 'FOOMA JAPAN 2026' held at Tokyo Big Sight. Booth Number: West Hall 4, Booth No. W4-39-05 *Exhibited Equipment: High-Frequency Rapid Thawing Device TEMPERTRON-VI Type* - Thawing of beef, pork, chicken, vegetables, seafood, etc. - Heating and melting of dairy products such as butter, margarine, and chocolate. - Achieves automation and labor-saving through rapid thawing. - The device is also used for thick materials, ensuring thorough heating to the center. On the day of the event, we will also have a consultation desk for specific inquiries regarding thawing, heating, drying, and sterilization using radio waves (high frequency and microwaves). 【Reasons for Improvement with High-Frequency Thawing】 - Automation and line integration from raw material thawing to product. - Thawing and heating in a short time of 20 to 30 minutes. - Reduction of personnel through automation of thawing and continuous thawing processing. - Ensuring thorough thawing of the center (uniform thawing quality) (elimination of surface drip loss). - Thawing without using water (reduction of water usage) (improvement of hygiene) (improvement of labor environment). - Resolution of excessive thawing (elimination of refreezing: reduction of food loss: thawing the necessary amount at the necessary time). Companies are achieving improvements in their issues.
Defrost while still in the box! A high-frequency defroster that contributes to maintaining the quality of meat.
- Food Processing Equipment
- Other food machinery
- Heating device