Easily and affordably achieve heating processes in a low vacuum environment!
The PH222 is a vacuum chamber type hot plate. It has a maximum temperature of 400°C (water cooling is required depending on heating conditions). The chamber structure and size can be customized. The temperature distribution of the hot plate is ±2.0%, and temperature program settings are possible with a programmable temperature controller (sold separately). It allows for vacuum heating processes in a vacuum environment, such as processes, degassing, and baking, using simple methods. For more details, please contact us or refer to the catalog.
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basic information
**Features** - Chamber structure hot plate (maximum temperature 400℃) → Water cooling is required depending on heating conditions - Type that combines a hot plate with a vacuum chamber - Simplifies the heating process in a low vacuum environment - Customizable chamber structure, size, etc. - Hot plate temperature distribution ±2.0% - Programmable temperature controller (sold separately) allows for temperature program settings **Specifications** - Temperature setting range: 50-400℃ - Heater capacity: AC100V, approximately 800W - Hot plate size: φ120mm - Hot plate surface treatment: black anodized - Cable: PCC-0505 (wired on one end to the hot plate) - Vacuum level: approximately 1×10^-1Pa - Compatible temperature controllers: PCC100, PCC107, PCC100co, PCC107Co ● For more details, please contact us or refer to the catalog.
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