Due to popular demand, the revised edition is complete! Recommended for those involved in the research and development, formulation, use, manufacturing, and quality control of photosensitive resins and raw materials!
○Publication Date: March 9, 2012 ○Format: B5 size, paperback, 250 pages ○Price: 10,000 yen (excluding tax) → STbook member price: 9,500 yen (excluding tax) ○Jun Sekiguchi, Risotech Japan Co., Ltd.
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basic information
Chapter 1 Overview of Lithography Chapter 2 Coating of Photoresist Chapter 3 Exposure Techniques Chapter 4 Post-Exposure Bake (PEB) and Development Chapter 5 Evaluation Techniques for g-line and i-line Resists (Novolak Resists) Chapter 6 Evaluation Techniques for KrF and ArF Photoresists Chapter 7 Evaluation Techniques for ArF Immersion Resists and Double Patterning (DP) Process Chapter 8 Evaluation Techniques for EUV Resists Chapter 9 Optimization and Evaluation of Nanoimprint Processes
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Main body 10,000 yen + tax → STbook member price: 9,500 yen + tax
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S&T Publishing publishes technical books aimed at researchers and engineers.
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