Equipped with MAX10V-150A power and a large-capacity LN2 trap, it enables rapid sample preparation. Its compact size makes it space-saving and reasonably priced.
Container dimensions: φ150×200H, exhaust system: 2-inch diffusion pump (with LN2) + rotary pump 20L/min. A 2-inch size is used for the main valve to effectively utilize the pump's exhaust capacity. The metal parts of the vacuum container, main valve, three-way valve, and leak valve are made of stainless steel.
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basic information
The power supply is separate. The exhaust system can also be changed to a turbo molecular pump. Custom orders are also available. Multi-source deposition systems and large equipment can also be manufactured.
Price range
P5
Delivery Time
Applications/Examples of results
Development of metal films for electron microscopy observation, electrode films, and electronic components.
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Company information
The necessity of thin film production in next-generation technologies is increasing more and more. In thin film production, there is a demand for technology that is low-temperature, dense, and also highly productive. Our company has made it possible to implement arc discharge measures that were not achievable with conventional opposing target sputtering methods, and we manufacture and sell uniform plasma sputtering devices that meet the above conditions.
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