It is optimal for the processes of CVD, etching, and surface modification.
The vacuum equipment-related product, EBEP processing device <FAP-EB/2D>, is a high-speed, high-quality surface treatment device using low-pressure high-density plasma, making it ideal for CVD, etching, and surface modification processes. In the low-pressure region, it can efficiently dissociate and ionize process gases using an energy-variable electron beam, enabling the generation of high-density active species. It creates plasma states that cannot be achieved with CCP plasma or ICP plasma, allowing for precise film formation, etching, and surface modification of various materials. It supports film formation and surface modification of oxides, metals, resins, etc., with a diameter of φ100mm. Stage maturation (Max 500℃) and high-speed, high-precision processing through bias application have become easier. For more details, please contact us or refer to the catalog.
Inquire About This Product
basic information
【Features】 ○ High-speed, high-quality surface treatment equipment using low-pressure high-density plasma ○ Ideal for CVD, etching, and surface modification processes ○ In the low-pressure region, energy-variable electron beams can efficiently dissociate and ionize process gases ○ Capable of generating high-density active species ○ Generates plasma states that cannot be achieved with CCP plasma or ICP plasma ○ Enables precise film formation, etching, and surface modification of various materials ○ Compatible with film formation and surface modification of oxides, metals, resins, etc., with a diameter of φ100mm ○ Easy to achieve high-speed, high-precision processing through stage heating (Max 500℃) and bias application ● For more details, please contact us or refer to the catalog.
Price information
Please contact us.
Delivery Time
※Please contact us.
Applications/Examples of results
【Applications】 ○ High-speed nitriding treatment (also applicable to hard nitriding materials) ○ Functional films (BN films, etc.) ○ Oxide film etching ○ Carbon films (DLC, diamond films) ○ Nano carbon films (CNT, CNW) ○ Si films ○ Oxide films, etc. ● For more details, please contact us or refer to the catalog.
catalog(2)
Download All CatalogsCompany information
Since its establishment in 1991, KKE has received your generous support and cooperation, for which we are deeply grateful. Before the founding, I dedicated myself to technical operations. Drawing on what I learned during that time, KKE has grown together with all of you. Particularly, we have focused on "development, design, and manufacturing" in the field of vacuum technology without having standardized products, and we have had the pleasure of collaborating with industry, government, and academia. We have maintained a commitment to thoroughly engage in "development, design, and manufacturing" tailored to the specific requirements of our customers, making progress based on accurate judgments to meet their needs. Aiming to be a development-oriented company capable of responding to cutting-edge science and technology in the 21st century, we strive to contribute to society through "manufacturing" and to achieve happiness together with all of you. We look forward to your continued support for KKE.